JPS6155671B2 - - Google Patents

Info

Publication number
JPS6155671B2
JPS6155671B2 JP7103680A JP7103680A JPS6155671B2 JP S6155671 B2 JPS6155671 B2 JP S6155671B2 JP 7103680 A JP7103680 A JP 7103680A JP 7103680 A JP7103680 A JP 7103680A JP S6155671 B2 JPS6155671 B2 JP S6155671B2
Authority
JP
Japan
Prior art keywords
layer
organopolysiloxane
cured film
plasma
film layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7103680A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56130755A (en
Inventor
Satoshi Takeuchi
Masanori Akata
Hitoshi Fujii
Takashi Toida
Minoru Takamizawa
Yoshio Inoe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Dai Nippon Printing Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd, Dai Nippon Printing Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP7103680A priority Critical patent/JPS56130755A/ja
Publication of JPS56130755A publication Critical patent/JPS56130755A/ja
Publication of JPS6155671B2 publication Critical patent/JPS6155671B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0752Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP7103680A 1980-05-28 1980-05-28 Manufacture of printing plate for planograph Granted JPS56130755A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7103680A JPS56130755A (en) 1980-05-28 1980-05-28 Manufacture of printing plate for planograph

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7103680A JPS56130755A (en) 1980-05-28 1980-05-28 Manufacture of printing plate for planograph

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP3360080A Division JPS56130752A (en) 1980-03-17 1980-03-17 Printing plate for lithographic printing and its manufacture

Publications (2)

Publication Number Publication Date
JPS56130755A JPS56130755A (en) 1981-10-13
JPS6155671B2 true JPS6155671B2 (enrdf_load_stackoverflow) 1986-11-28

Family

ID=13448888

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7103680A Granted JPS56130755A (en) 1980-05-28 1980-05-28 Manufacture of printing plate for planograph

Country Status (1)

Country Link
JP (1) JPS56130755A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112853778B (zh) * 2021-01-06 2022-02-01 绍兴博利豪家纺有限公司 一种湿变色印花浆料及其制备工艺及湿变色印花工艺

Also Published As

Publication number Publication date
JPS56130755A (en) 1981-10-13

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