JPS6320341B2 - - Google Patents

Info

Publication number
JPS6320341B2
JPS6320341B2 JP55052695A JP5269580A JPS6320341B2 JP S6320341 B2 JPS6320341 B2 JP S6320341B2 JP 55052695 A JP55052695 A JP 55052695A JP 5269580 A JP5269580 A JP 5269580A JP S6320341 B2 JPS6320341 B2 JP S6320341B2
Authority
JP
Japan
Prior art keywords
layer
photosensitive
organopolysiloxane
film layer
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55052695A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56149040A (en
Inventor
Hideki Takematsu
Minoru Takamizawa
Yoshio Inoe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Dai Nippon Printing Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd, Dai Nippon Printing Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP5269580A priority Critical patent/JPS56149040A/ja
Publication of JPS56149040A publication Critical patent/JPS56149040A/ja
Publication of JPS6320341B2 publication Critical patent/JPS6320341B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP5269580A 1980-04-21 1980-04-21 Manufacture of printing plate for lithography Granted JPS56149040A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5269580A JPS56149040A (en) 1980-04-21 1980-04-21 Manufacture of printing plate for lithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5269580A JPS56149040A (en) 1980-04-21 1980-04-21 Manufacture of printing plate for lithography

Publications (2)

Publication Number Publication Date
JPS56149040A JPS56149040A (en) 1981-11-18
JPS6320341B2 true JPS6320341B2 (enrdf_load_stackoverflow) 1988-04-27

Family

ID=12922014

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5269580A Granted JPS56149040A (en) 1980-04-21 1980-04-21 Manufacture of printing plate for lithography

Country Status (1)

Country Link
JP (1) JPS56149040A (enrdf_load_stackoverflow)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55142348A (en) * 1979-04-23 1980-11-06 Dainippon Printing Co Ltd Manufacture of printing plate for lithography

Also Published As

Publication number Publication date
JPS56149040A (en) 1981-11-18

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