JPS56130755A - Manufacture of printing plate for planograph - Google Patents
Manufacture of printing plate for planographInfo
- Publication number
- JPS56130755A JPS56130755A JP7103680A JP7103680A JPS56130755A JP S56130755 A JPS56130755 A JP S56130755A JP 7103680 A JP7103680 A JP 7103680A JP 7103680 A JP7103680 A JP 7103680A JP S56130755 A JPS56130755 A JP S56130755A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- color
- plasma
- printing plate
- film layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000000126 substance Substances 0.000 abstract 4
- 229920001296 polysiloxane Polymers 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 238000004040 coloring Methods 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- 239000000975 dye Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000009832 plasma treatment Methods 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
- 238000009736 wetting Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7103680A JPS56130755A (en) | 1980-05-28 | 1980-05-28 | Manufacture of printing plate for planograph |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7103680A JPS56130755A (en) | 1980-05-28 | 1980-05-28 | Manufacture of printing plate for planograph |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3360080A Division JPS56130752A (en) | 1980-03-17 | 1980-03-17 | Printing plate for lithographic printing and its manufacture |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56130755A true JPS56130755A (en) | 1981-10-13 |
JPS6155671B2 JPS6155671B2 (enrdf_load_stackoverflow) | 1986-11-28 |
Family
ID=13448888
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7103680A Granted JPS56130755A (en) | 1980-05-28 | 1980-05-28 | Manufacture of printing plate for planograph |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56130755A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112853778A (zh) * | 2021-01-06 | 2021-05-28 | 绍兴博利豪家纺有限公司 | 一种湿变色印花浆料及其制备工艺及湿变色印花工艺 |
-
1980
- 1980-05-28 JP JP7103680A patent/JPS56130755A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112853778A (zh) * | 2021-01-06 | 2021-05-28 | 绍兴博利豪家纺有限公司 | 一种湿变色印花浆料及其制备工艺及湿变色印花工艺 |
Also Published As
Publication number | Publication date |
---|---|
JPS6155671B2 (enrdf_load_stackoverflow) | 1986-11-28 |
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