JPS6148774B2 - - Google Patents
Info
- Publication number
- JPS6148774B2 JPS6148774B2 JP10259578A JP10259578A JPS6148774B2 JP S6148774 B2 JPS6148774 B2 JP S6148774B2 JP 10259578 A JP10259578 A JP 10259578A JP 10259578 A JP10259578 A JP 10259578A JP S6148774 B2 JPS6148774 B2 JP S6148774B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- melting point
- low melting
- filler
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 59
- 239000004065 semiconductor Substances 0.000 claims description 21
- 238000002844 melting Methods 0.000 claims description 15
- 230000008018 melting Effects 0.000 claims description 15
- 239000000945 filler Substances 0.000 claims description 11
- 239000000843 powder Substances 0.000 claims description 8
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 6
- 229910000505 Al2TiO5 Inorganic materials 0.000 claims description 5
- 238000004806 packaging method and process Methods 0.000 claims description 5
- AABBHSMFGKYLKE-SNAWJCMRSA-N propan-2-yl (e)-but-2-enoate Chemical compound C\C=C\C(=O)OC(C)C AABBHSMFGKYLKE-SNAWJCMRSA-N 0.000 claims description 5
- 229910000166 zirconium phosphate Inorganic materials 0.000 claims description 4
- LEHFSLREWWMLPU-UHFFFAOYSA-B zirconium(4+);tetraphosphate Chemical compound [Zr+4].[Zr+4].[Zr+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LEHFSLREWWMLPU-UHFFFAOYSA-B 0.000 claims description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 12
- 229910052710 silicon Inorganic materials 0.000 description 12
- 239000010703 silicon Substances 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000002161 passivation Methods 0.000 description 4
- 238000005275 alloying Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000006063 cullet Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001962 electrophoresis Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000005355 lead glass Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10259578A JPS5529161A (en) | 1978-08-22 | 1978-08-22 | Glass for semiconductor passivation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10259578A JPS5529161A (en) | 1978-08-22 | 1978-08-22 | Glass for semiconductor passivation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5529161A JPS5529161A (en) | 1980-03-01 |
| JPS6148774B2 true JPS6148774B2 (enrdf_load_stackoverflow) | 1986-10-25 |
Family
ID=14331580
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10259578A Granted JPS5529161A (en) | 1978-08-22 | 1978-08-22 | Glass for semiconductor passivation |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5529161A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0713381U (ja) * | 1993-08-10 | 1995-03-07 | 悦郎 手塚 | ゴルフ用グローブ |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6630702B2 (en) * | 2001-03-27 | 2003-10-07 | Sharp Laboratories Of America, Inc. | Method of using titanium doped aluminum oxide for passivation of ferroelectric materials and devices including the same |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2517743C3 (de) * | 1975-04-22 | 1980-03-06 | Jenaer Glaswerk Schott & Gen., 6500 Mainz | Passivierender Schutzüberzug für Siliziumhalbleiterbauelemente |
-
1978
- 1978-08-22 JP JP10259578A patent/JPS5529161A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0713381U (ja) * | 1993-08-10 | 1995-03-07 | 悦郎 手塚 | ゴルフ用グローブ |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5529161A (en) | 1980-03-01 |