JPS614576A - スプレ−方法 - Google Patents
スプレ−方法Info
- Publication number
- JPS614576A JPS614576A JP59123275A JP12327584A JPS614576A JP S614576 A JPS614576 A JP S614576A JP 59123275 A JP59123275 A JP 59123275A JP 12327584 A JP12327584 A JP 12327584A JP S614576 A JPS614576 A JP S614576A
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- valve
- substrate
- system pipe
- exhaust system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Weting (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59123275A JPS614576A (ja) | 1984-06-15 | 1984-06-15 | スプレ−方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59123275A JPS614576A (ja) | 1984-06-15 | 1984-06-15 | スプレ−方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS614576A true JPS614576A (ja) | 1986-01-10 |
| JPH0428431B2 JPH0428431B2 (cg-RX-API-DMAC10.html) | 1992-05-14 |
Family
ID=14856531
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59123275A Granted JPS614576A (ja) | 1984-06-15 | 1984-06-15 | スプレ−方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS614576A (cg-RX-API-DMAC10.html) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61160933A (ja) * | 1985-01-08 | 1986-07-21 | Nec Corp | 現像処理装置 |
| JPS6314434A (ja) * | 1986-07-04 | 1988-01-21 | Dainippon Screen Mfg Co Ltd | 基板表面処理方法および装置 |
| JPS6333824A (ja) * | 1986-07-28 | 1988-02-13 | Dainippon Screen Mfg Co Ltd | 表面洗浄方法 |
| JPS63168025A (ja) * | 1986-12-29 | 1988-07-12 | Tokyo Electron Ltd | 現像方法 |
| JPH04288832A (ja) * | 1991-03-18 | 1992-10-13 | Nec Yamagata Ltd | 半導体装置の製造装置 |
| US6037270A (en) * | 1994-06-30 | 2000-03-14 | Kabushiki Kaisha Toshiba | Method of manufacturing semiconductor device and methods of processing, analyzing and manufacturing its substrate |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56146467U (cg-RX-API-DMAC10.html) * | 1980-03-28 | 1981-11-05 |
-
1984
- 1984-06-15 JP JP59123275A patent/JPS614576A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56146467U (cg-RX-API-DMAC10.html) * | 1980-03-28 | 1981-11-05 |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61160933A (ja) * | 1985-01-08 | 1986-07-21 | Nec Corp | 現像処理装置 |
| JPS6314434A (ja) * | 1986-07-04 | 1988-01-21 | Dainippon Screen Mfg Co Ltd | 基板表面処理方法および装置 |
| JPS6333824A (ja) * | 1986-07-28 | 1988-02-13 | Dainippon Screen Mfg Co Ltd | 表面洗浄方法 |
| JPS63168025A (ja) * | 1986-12-29 | 1988-07-12 | Tokyo Electron Ltd | 現像方法 |
| JPH04288832A (ja) * | 1991-03-18 | 1992-10-13 | Nec Yamagata Ltd | 半導体装置の製造装置 |
| US6037270A (en) * | 1994-06-30 | 2000-03-14 | Kabushiki Kaisha Toshiba | Method of manufacturing semiconductor device and methods of processing, analyzing and manufacturing its substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0428431B2 (cg-RX-API-DMAC10.html) | 1992-05-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |