JPH0439664B2 - - Google Patents

Info

Publication number
JPH0439664B2
JPH0439664B2 JP59105434A JP10543484A JPH0439664B2 JP H0439664 B2 JPH0439664 B2 JP H0439664B2 JP 59105434 A JP59105434 A JP 59105434A JP 10543484 A JP10543484 A JP 10543484A JP H0439664 B2 JPH0439664 B2 JP H0439664B2
Authority
JP
Japan
Prior art keywords
time
solenoid valve
pump
substrate
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59105434A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60247642A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP59105434A priority Critical patent/JPS60247642A/ja
Publication of JPS60247642A publication Critical patent/JPS60247642A/ja
Publication of JPH0439664B2 publication Critical patent/JPH0439664B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59105434A 1984-05-24 1984-05-24 スプレ−方法 Granted JPS60247642A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59105434A JPS60247642A (ja) 1984-05-24 1984-05-24 スプレ−方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59105434A JPS60247642A (ja) 1984-05-24 1984-05-24 スプレ−方法

Publications (2)

Publication Number Publication Date
JPS60247642A JPS60247642A (ja) 1985-12-07
JPH0439664B2 true JPH0439664B2 (cg-RX-API-DMAC10.html) 1992-06-30

Family

ID=14407482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59105434A Granted JPS60247642A (ja) 1984-05-24 1984-05-24 スプレ−方法

Country Status (1)

Country Link
JP (1) JPS60247642A (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010041419A1 (ja) 2008-10-10 2010-04-15 東洋紡績株式会社 新規なフルクトシルバリルヒスチジンオキシダーゼ活性を有するタンパク質及びその改変体、並びにその利用

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0752710B2 (ja) * 1988-03-25 1995-06-05 東京エレクトロン株式会社 処理液供給方法
JPH02253264A (ja) * 1989-03-27 1990-10-12 Konica Corp 感光材料の処理装置
JP2626573B2 (ja) * 1994-09-01 1997-07-02 富士通株式会社 基板処理方法及び基板処理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010041419A1 (ja) 2008-10-10 2010-04-15 東洋紡績株式会社 新規なフルクトシルバリルヒスチジンオキシダーゼ活性を有するタンパク質及びその改変体、並びにその利用

Also Published As

Publication number Publication date
JPS60247642A (ja) 1985-12-07

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term