JPS6142241B2 - - Google Patents
Info
- Publication number
- JPS6142241B2 JPS6142241B2 JP56013482A JP1348281A JPS6142241B2 JP S6142241 B2 JPS6142241 B2 JP S6142241B2 JP 56013482 A JP56013482 A JP 56013482A JP 1348281 A JP1348281 A JP 1348281A JP S6142241 B2 JPS6142241 B2 JP S6142241B2
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- substrate
- monomer
- refractive index
- photomask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 24
- 239000000178 monomer Substances 0.000 claims description 23
- 239000007788 liquid Substances 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 15
- 229920000642 polymer Polymers 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000003504 photosensitizing agent Substances 0.000 claims description 3
- 230000000379 polymerizing effect Effects 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000000835 fiber Substances 0.000 description 14
- 238000009826 distribution Methods 0.000 description 9
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical group COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical group C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- -1 fluorinated alkyl methacrylate Chemical compound 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56013482A JPS57128301A (en) | 1981-01-31 | 1981-01-31 | Manufacture for light conducting array |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56013482A JPS57128301A (en) | 1981-01-31 | 1981-01-31 | Manufacture for light conducting array |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57128301A JPS57128301A (en) | 1982-08-09 |
| JPS6142241B2 true JPS6142241B2 (enrdf_load_stackoverflow) | 1986-09-19 |
Family
ID=11834331
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56013482A Granted JPS57128301A (en) | 1981-01-31 | 1981-01-31 | Manufacture for light conducting array |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57128301A (enrdf_load_stackoverflow) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2820682B2 (ja) * | 1986-07-08 | 1998-11-05 | ルーミナイト インターナショナル コーポレイション | プラスチック光伝送体 |
| US5462700A (en) * | 1993-11-08 | 1995-10-31 | Alliedsignal Inc. | Process for making an array of tapered photopolymerized waveguides |
| US6703188B1 (en) | 1999-03-29 | 2004-03-09 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Method of fabricating optical waveguide structure |
| JP3444352B2 (ja) * | 1999-03-29 | 2003-09-08 | 株式会社豊田中央研究所 | 光伝送路の製造方法 |
| JP4169238B2 (ja) * | 2000-06-30 | 2008-10-22 | 株式会社リコー | 二次元拡大縮小光学デバイスおよびその製造方法 |
| JP2002048924A (ja) * | 2000-08-02 | 2002-02-15 | Ricoh Co Ltd | 画像拡大縮小用光学デバイス、その作製方法、画像拡大表示装置及び画像縮小読取装置 |
| JP2002328247A (ja) * | 2001-05-01 | 2002-11-15 | Ibiden Co Ltd | 光導波路の形成方法 |
| JP4480307B2 (ja) * | 2001-09-21 | 2010-06-16 | イビデン株式会社 | 光導波路および光導波路の形成方法 |
| JP4142568B2 (ja) * | 2003-12-19 | 2008-09-03 | インターナショナル・ビジネス・マシーンズ・コーポレーション | 光学素子および該光学素子を用いるカラー表示装置 |
-
1981
- 1981-01-31 JP JP56013482A patent/JPS57128301A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57128301A (en) | 1982-08-09 |
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