JPS6139935U - スピン法用シリコン溶融炉におけるタ−ンテ−ブルの回転昇降装置 - Google Patents

スピン法用シリコン溶融炉におけるタ−ンテ−ブルの回転昇降装置

Info

Publication number
JPS6139935U
JPS6139935U JP12505184U JP12505184U JPS6139935U JP S6139935 U JPS6139935 U JP S6139935U JP 12505184 U JP12505184 U JP 12505184U JP 12505184 U JP12505184 U JP 12505184U JP S6139935 U JPS6139935 U JP S6139935U
Authority
JP
Japan
Prior art keywords
shaft
rotating
turntable
melting furnace
silicon melting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12505184U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0246051Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
岳之 松山
敬志 横山
一郎 秀
敬司 沢谷
Original Assignee
株式会社ほくさん
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社ほくさん filed Critical 株式会社ほくさん
Priority to JP12505184U priority Critical patent/JPS6139935U/ja
Publication of JPS6139935U publication Critical patent/JPS6139935U/ja
Application granted granted Critical
Publication of JPH0246051Y2 publication Critical patent/JPH0246051Y2/ja
Granted legal-status Critical Current

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Silicon Compounds (AREA)
JP12505184U 1984-08-17 1984-08-17 スピン法用シリコン溶融炉におけるタ−ンテ−ブルの回転昇降装置 Granted JPS6139935U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12505184U JPS6139935U (ja) 1984-08-17 1984-08-17 スピン法用シリコン溶融炉におけるタ−ンテ−ブルの回転昇降装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12505184U JPS6139935U (ja) 1984-08-17 1984-08-17 スピン法用シリコン溶融炉におけるタ−ンテ−ブルの回転昇降装置

Publications (2)

Publication Number Publication Date
JPS6139935U true JPS6139935U (ja) 1986-03-13
JPH0246051Y2 JPH0246051Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-12-05

Family

ID=30683736

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12505184U Granted JPS6139935U (ja) 1984-08-17 1984-08-17 スピン法用シリコン溶融炉におけるタ−ンテ−ブルの回転昇降装置

Country Status (1)

Country Link
JP (1) JPS6139935U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06168898A (ja) * 1991-01-08 1994-06-14 Sematech Inc シリコンの再成長を伴うシリコンウェハーのスピン鋳造

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06168898A (ja) * 1991-01-08 1994-06-14 Sematech Inc シリコンの再成長を伴うシリコンウェハーのスピン鋳造

Also Published As

Publication number Publication date
JPH0246051Y2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-12-05

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