JPS6139641B2 - - Google Patents
Info
- Publication number
- JPS6139641B2 JPS6139641B2 JP57209482A JP20948282A JPS6139641B2 JP S6139641 B2 JPS6139641 B2 JP S6139641B2 JP 57209482 A JP57209482 A JP 57209482A JP 20948282 A JP20948282 A JP 20948282A JP S6139641 B2 JPS6139641 B2 JP S6139641B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- support
- layers
- multilayer
- absorbing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims abstract description 9
- 239000004922 lacquer Substances 0.000 claims description 64
- 229910010272 inorganic material Inorganic materials 0.000 claims description 46
- 239000011147 inorganic material Substances 0.000 claims description 46
- 238000000059 patterning Methods 0.000 claims description 15
- 230000005540 biological transmission Effects 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 230000003287 optical effect Effects 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 4
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 4
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 4
- PLDDOISOJJCEMH-UHFFFAOYSA-N neodymium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Nd+3].[Nd+3] PLDDOISOJJCEMH-UHFFFAOYSA-N 0.000 claims description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 4
- NDLPOXTZKUMGOV-UHFFFAOYSA-N oxo(oxoferriooxy)iron hydrate Chemical compound O.O=[Fe]O[Fe]=O NDLPOXTZKUMGOV-UHFFFAOYSA-N 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 239000011651 chromium Substances 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 2
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- 239000004408 titanium dioxide Substances 0.000 claims description 2
- 239000012780 transparent material Substances 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 claims description 2
- 229910052845 zircon Inorganic materials 0.000 claims description 2
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 claims description 2
- 238000000206 photolithography Methods 0.000 claims 1
- 238000000053 physical method Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract 4
- 229920002120 photoresistant polymer Polymers 0.000 abstract 3
- 229910052751 metal Inorganic materials 0.000 description 28
- 239000002184 metal Substances 0.000 description 28
- 230000018109 developmental process Effects 0.000 description 9
- 230000003595 spectral effect Effects 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 230000002745 absorbent Effects 0.000 description 2
- 239000002250 absorbent Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000007261 regionalization Effects 0.000 description 2
- 206010057040 Temperature intolerance Diseases 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000008543 heat sensitivity Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C7/00—Multicolour photographic processes or agents therefor; Regeneration of such processing agents; Photosensitive materials for multicolour processes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/913—Material designed to be responsive to temperature, light, moisture
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Optical Filters (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Instructional Devices (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Developing Agents For Electrophotography (AREA)
- Paper (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Laminated Bodies (AREA)
- Credit Cards Or The Like (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3147985A DE3147985C2 (de) | 1981-12-04 | 1981-12-04 | Verfahren zur Herstellung eines Aufzeichnungsträgers mit einer mehrfarbigen Feinstruktur |
| DE3147985.5 | 1981-12-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58144804A JPS58144804A (ja) | 1983-08-29 |
| JPS6139641B2 true JPS6139641B2 (enExample) | 1986-09-04 |
Family
ID=6147857
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57209482A Granted JPS58144804A (ja) | 1981-12-04 | 1982-12-01 | 多色の微細構造を有する、特に微細地図の形式の記録支持体とその製法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4522862A (enExample) |
| EP (1) | EP0081055B1 (enExample) |
| JP (1) | JPS58144804A (enExample) |
| AT (1) | ATE14484T1 (enExample) |
| BR (1) | BR8207025A (enExample) |
| DE (1) | DE3147985C2 (enExample) |
| IL (1) | IL67365A (enExample) |
| ZA (1) | ZA828896B (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60186804A (ja) * | 1984-03-06 | 1985-09-24 | Hisanori Bando | 光記録媒体 |
| JPH0672298B2 (ja) * | 1984-03-09 | 1994-09-14 | 京都大学 | 周期性を有する酸化物多層膜 |
| JPH0797216B2 (ja) * | 1986-10-29 | 1995-10-18 | インタ−ナショナル・ビジネス・マシ−ンズ・コ−ポレ−ション | マスクの製造方法 |
| US4923772A (en) * | 1986-10-29 | 1990-05-08 | Kirch Steven J | High energy laser mask and method of making same |
| US4713315A (en) * | 1986-12-09 | 1987-12-15 | Smith David V | Wire tag etching system |
| US4979803A (en) * | 1989-02-02 | 1990-12-25 | Eastman Kodak Company | Color filter array for area image sensors |
| US4956555A (en) * | 1989-06-30 | 1990-09-11 | Rockwell International Corporation | Multicolor focal plane arrays |
| JP2599513B2 (ja) * | 1990-06-25 | 1997-04-09 | インターナショナル・ビジネス・マシーンズ・コーポレイション | アブレーション・マスク |
| US5217832A (en) * | 1992-01-23 | 1993-06-08 | The Walt Disney Company | Permanent color transparencies on single substrates and methods for making the same |
| DE10150099A1 (de) * | 2001-10-11 | 2003-04-17 | Heidenhain Gmbh Dr Johannes | Verfahren zur Herstellung eines Maßstabes, sowie derart hergestellter Maßstab und eine Positionsmesseinrichtung |
| JP4125158B2 (ja) * | 2003-02-28 | 2008-07-30 | キヤノン株式会社 | 反射鏡及びそれを用いた光学機器 |
| WO2008146409A1 (ja) | 2007-06-01 | 2008-12-04 | Mitutoyo Corporation | 反射型エンコーダ、そのスケール、及び、スケールの製造方法 |
| RU2012101436A (ru) | 2009-06-17 | 2013-07-27 | Конинклейке Филипс Электроникс Н.В. | Интерференционные фильтры с высоким пропусканием и широким диапазоном подавления для мини-спектрометра |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1621762B1 (de) * | 1967-02-02 | 1976-07-08 | Nautschno Inssledowatelskij | Verfahren zur herstellung eines dekorativen gegenstandes mit einem aufgrund des interferenzeffektes mehrfarbig erscheinenden bild auf seiner oberflaeche |
| US3727233A (en) * | 1969-11-06 | 1973-04-10 | Gijutsuin K Int Trade Ind | Method of recording an electronic image |
| GB1545048A (en) * | 1976-05-27 | 1979-05-02 | Rca Corp | Simplified diffractive colour filtering technique |
| US4155627A (en) * | 1976-02-02 | 1979-05-22 | Rca Corporation | Color diffractive subtractive filter master recording comprising a plurality of superposed two-level relief patterns on the surface of a substrate |
| DE2658623C2 (de) * | 1976-12-23 | 1982-07-29 | Dr. Johannes Heidenhain Gmbh, 8225 Traunreut | Aufzeichnungsträger und Verfahren zu seiner Herstellung |
| US4124473A (en) * | 1977-06-17 | 1978-11-07 | Rca Corporation | Fabrication of multi-level relief patterns in a substrate |
| DE2903641C2 (de) * | 1979-01-31 | 1982-11-11 | Dr. Johannes Heidenhain Gmbh, 8225 Traunreut | Verfahren zur Herstellung eines Aufzeichnungsträgers mit einem bei Bestrahlung mit Licht in wenigstens zwei unterschiedlichen Farben erscheinenden Muster |
| DE2952230C2 (de) * | 1979-12-22 | 1984-02-02 | Dr. Johannes Heidenhain Gmbh, 8225 Traunreut | Verfahren zur Herstellung eines Aufzeichnungsträgers mit einem bei Bestrahlung mit Licht in wenigstens zwei unterschiedlichen Farben erscheinenden Muster |
| DE3040489A1 (de) * | 1980-10-28 | 1982-05-27 | Dr. Johannes Heidenhain Gmbh, 8225 Traunreut | Aufzeichnungstraeger mit einer aufzeichnung hoher informationsdichte |
-
1981
- 1981-12-04 DE DE3147985A patent/DE3147985C2/de not_active Expired
-
1982
- 1982-10-05 EP EP82109176A patent/EP0081055B1/de not_active Expired
- 1982-10-05 AT AT82109176T patent/ATE14484T1/de active
- 1982-11-30 IL IL67365A patent/IL67365A/xx unknown
- 1982-11-30 US US06/445,557 patent/US4522862A/en not_active Expired - Fee Related
- 1982-12-01 JP JP57209482A patent/JPS58144804A/ja active Granted
- 1982-12-03 BR BR8207025A patent/BR8207025A/pt not_active IP Right Cessation
- 1982-12-03 ZA ZA828896A patent/ZA828896B/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58144804A (ja) | 1983-08-29 |
| ATE14484T1 (de) | 1985-08-15 |
| DE3147985A1 (de) | 1983-06-16 |
| IL67365A (en) | 1986-02-28 |
| IL67365A0 (en) | 1983-03-31 |
| ZA828896B (en) | 1983-10-26 |
| US4522862A (en) | 1985-06-11 |
| BR8207025A (pt) | 1983-10-11 |
| DE3147985C2 (de) | 1986-03-13 |
| EP0081055B1 (de) | 1985-07-24 |
| EP0081055A1 (de) | 1983-06-15 |
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