JPS6138851B2 - - Google Patents
Info
- Publication number
- JPS6138851B2 JPS6138851B2 JP16245278A JP16245278A JPS6138851B2 JP S6138851 B2 JPS6138851 B2 JP S6138851B2 JP 16245278 A JP16245278 A JP 16245278A JP 16245278 A JP16245278 A JP 16245278A JP S6138851 B2 JPS6138851 B2 JP S6138851B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- rectangular
- particles
- image
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 78
- 238000000034 method Methods 0.000 claims description 21
- 239000002245 particle Substances 0.000 claims description 12
- 239000000758 substrate Substances 0.000 description 18
- 239000011859 microparticle Substances 0.000 description 13
- 238000007493 shaping process Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 5
- 238000001514 detection method Methods 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012806 monitoring device Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16245278A JPS5588329A (en) | 1978-12-27 | 1978-12-27 | Exposing method for electron beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16245278A JPS5588329A (en) | 1978-12-27 | 1978-12-27 | Exposing method for electron beam |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5588329A JPS5588329A (en) | 1980-07-04 |
JPS6138851B2 true JPS6138851B2 (zh) | 1986-09-01 |
Family
ID=15754872
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16245278A Granted JPS5588329A (en) | 1978-12-27 | 1978-12-27 | Exposing method for electron beam |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5588329A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1293532C (zh) * | 2003-02-28 | 2007-01-03 | 夏普株式会社 | 显示装置及其驱动方法 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5766637A (en) * | 1980-10-14 | 1982-04-22 | Toshiba Corp | Exposure device for electron beam |
-
1978
- 1978-12-27 JP JP16245278A patent/JPS5588329A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1293532C (zh) * | 2003-02-28 | 2007-01-03 | 夏普株式会社 | 显示装置及其驱动方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS5588329A (en) | 1980-07-04 |
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