JPS5588329A - Exposing method for electron beam - Google Patents
Exposing method for electron beamInfo
- Publication number
- JPS5588329A JPS5588329A JP16245278A JP16245278A JPS5588329A JP S5588329 A JPS5588329 A JP S5588329A JP 16245278 A JP16245278 A JP 16245278A JP 16245278 A JP16245278 A JP 16245278A JP S5588329 A JPS5588329 A JP S5588329A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- rectangular
- scanning
- shape
- latticelike
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Analytical Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Measurement Of Radiation (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16245278A JPS5588329A (en) | 1978-12-27 | 1978-12-27 | Exposing method for electron beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16245278A JPS5588329A (en) | 1978-12-27 | 1978-12-27 | Exposing method for electron beam |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5588329A true JPS5588329A (en) | 1980-07-04 |
JPS6138851B2 JPS6138851B2 (ja) | 1986-09-01 |
Family
ID=15754872
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16245278A Granted JPS5588329A (en) | 1978-12-27 | 1978-12-27 | Exposing method for electron beam |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5588329A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5766637A (en) * | 1980-10-14 | 1982-04-22 | Toshiba Corp | Exposure device for electron beam |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004264476A (ja) * | 2003-02-28 | 2004-09-24 | Sharp Corp | 表示装置およびその駆動方法 |
-
1978
- 1978-12-27 JP JP16245278A patent/JPS5588329A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5766637A (en) * | 1980-10-14 | 1982-04-22 | Toshiba Corp | Exposure device for electron beam |
Also Published As
Publication number | Publication date |
---|---|
JPS6138851B2 (ja) | 1986-09-01 |
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