JPS6134252B2 - - Google Patents
Info
- Publication number
- JPS6134252B2 JPS6134252B2 JP55147090A JP14709080A JPS6134252B2 JP S6134252 B2 JPS6134252 B2 JP S6134252B2 JP 55147090 A JP55147090 A JP 55147090A JP 14709080 A JP14709080 A JP 14709080A JP S6134252 B2 JPS6134252 B2 JP S6134252B2
- Authority
- JP
- Japan
- Prior art keywords
- shutter
- light
- amount
- command signal
- light source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B7/00—Control of exposure by setting shutters, diaphragms or filters, separately or conjointly
- G03B7/08—Control effected solely on the basis of the response, to the intensity of the light received by the camera, of a built-in light-sensitive device
- G03B7/081—Analogue circuits
- G03B7/083—Analogue circuits for control of exposure time
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Control Of Exposure In Printing And Copying (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55147090A JPS5771132A (en) | 1980-10-21 | 1980-10-21 | Exposure controlling system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55147090A JPS5771132A (en) | 1980-10-21 | 1980-10-21 | Exposure controlling system |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62146377A Division JPS6323316A (ja) | 1987-06-12 | 1987-06-12 | 露光量制御方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5771132A JPS5771132A (en) | 1982-05-01 |
JPS6134252B2 true JPS6134252B2 (enrdf_load_stackoverflow) | 1986-08-06 |
Family
ID=15422241
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55147090A Granted JPS5771132A (en) | 1980-10-21 | 1980-10-21 | Exposure controlling system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5771132A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008118062A (ja) * | 2006-11-07 | 2008-05-22 | Canon Inc | 露光装置及びデバイス製造方法 |
US8125614B2 (en) | 2008-07-29 | 2012-02-28 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5952246A (ja) * | 1982-09-20 | 1984-03-26 | Nippon Kogaku Kk <Nikon> | 露光制御装置 |
JPH0715875B2 (ja) * | 1984-12-27 | 1995-02-22 | キヤノン株式会社 | 露光装置及び方法 |
JPS60198726A (ja) * | 1984-03-23 | 1985-10-08 | Hitachi Ltd | X線露光装置の露光量調整方法と装置 |
JPH0797549B2 (ja) * | 1987-08-28 | 1995-10-18 | 東京エレクトロン九州株式会社 | 露光方法及びその装置 |
JPH0795519B2 (ja) * | 1988-11-04 | 1995-10-11 | ウシオ電機株式会社 | ウエハ周辺露光における露光量制御装置 |
JP5025250B2 (ja) | 2006-12-15 | 2012-09-12 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3200723A (en) * | 1963-03-29 | 1965-08-17 | Polaroid Corp | Shutter timing apparatus |
US4021822A (en) * | 1972-12-30 | 1977-05-03 | Minolta Camera Kabushiki Kaisha | Electrically controlled shutter |
-
1980
- 1980-10-21 JP JP55147090A patent/JPS5771132A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008118062A (ja) * | 2006-11-07 | 2008-05-22 | Canon Inc | 露光装置及びデバイス製造方法 |
US8125614B2 (en) | 2008-07-29 | 2012-02-28 | Canon Kabushiki Kaisha | Exposure apparatus and device manufacturing method |
Also Published As
Publication number | Publication date |
---|---|
JPS5771132A (en) | 1982-05-01 |
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