JPS5771132A - Exposure controlling system - Google Patents

Exposure controlling system

Info

Publication number
JPS5771132A
JPS5771132A JP55147090A JP14709080A JPS5771132A JP S5771132 A JPS5771132 A JP S5771132A JP 55147090 A JP55147090 A JP 55147090A JP 14709080 A JP14709080 A JP 14709080A JP S5771132 A JPS5771132 A JP S5771132A
Authority
JP
Japan
Prior art keywords
shutter
output
delay time
counter
action delay
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP55147090A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6134252B2 (enrdf_load_stackoverflow
Inventor
Mitsugi Yamamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP55147090A priority Critical patent/JPS5771132A/ja
Publication of JPS5771132A publication Critical patent/JPS5771132A/ja
Publication of JPS6134252B2 publication Critical patent/JPS6134252B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B7/00—Control of exposure by setting shutters, diaphragms or filters, separately or conjointly
    • G03B7/08—Control effected solely on the basis of the response, to the intensity of the light received by the camera, of a built-in light-sensitive device
    • G03B7/081—Analogue circuits
    • G03B7/083—Analogue circuits for control of exposure time

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Exposure In Printing And Copying (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP55147090A 1980-10-21 1980-10-21 Exposure controlling system Granted JPS5771132A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55147090A JPS5771132A (en) 1980-10-21 1980-10-21 Exposure controlling system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55147090A JPS5771132A (en) 1980-10-21 1980-10-21 Exposure controlling system

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP62146377A Division JPS6323316A (ja) 1987-06-12 1987-06-12 露光量制御方法

Publications (2)

Publication Number Publication Date
JPS5771132A true JPS5771132A (en) 1982-05-01
JPS6134252B2 JPS6134252B2 (enrdf_load_stackoverflow) 1986-08-06

Family

ID=15422241

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55147090A Granted JPS5771132A (en) 1980-10-21 1980-10-21 Exposure controlling system

Country Status (1)

Country Link
JP (1) JPS5771132A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4512657A (en) * 1982-09-20 1985-04-23 Nippon Kogaku K.K. Exposure control system
JPS60198726A (ja) * 1984-03-23 1985-10-08 Hitachi Ltd Ｘ線露光装置の露光量調整方法と装置
JPS61154128A (ja) * 1984-12-27 1986-07-12 Canon Inc 露光装置
JPH01132124A (ja) * 1987-08-28 1989-05-24 Teru Kyushu Kk 露光方法及びその装置
JPH02125420A (ja) * 1988-11-04 1990-05-14 Ushio Inc ウエハ周辺露光における露光量制御装置
US8223317B2 (en) 2006-12-15 2012-07-17 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method controlling shutter based on intensity of reflected light

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5100088B2 (ja) * 2006-11-07 2012-12-19 キヤノン株式会社 露光装置及びデバイス製造方法
JP5173650B2 (ja) 2008-07-29 2013-04-03 キヤノン株式会社 露光装置およびデバイス製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3200723A (en) * 1963-03-29 1965-08-17 Polaroid Corp Shutter timing apparatus
US4021822A (en) * 1972-12-30 1977-05-03 Minolta Camera Kabushiki Kaisha Electrically controlled shutter

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3200723A (en) * 1963-03-29 1965-08-17 Polaroid Corp Shutter timing apparatus
US4021822A (en) * 1972-12-30 1977-05-03 Minolta Camera Kabushiki Kaisha Electrically controlled shutter

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4512657A (en) * 1982-09-20 1985-04-23 Nippon Kogaku K.K. Exposure control system
JPS60198726A (ja) * 1984-03-23 1985-10-08 Hitachi Ltd Ｘ線露光装置の露光量調整方法と装置
JPS61154128A (ja) * 1984-12-27 1986-07-12 Canon Inc 露光装置
JPH01132124A (ja) * 1987-08-28 1989-05-24 Teru Kyushu Kk 露光方法及びその装置
JPH02125420A (ja) * 1988-11-04 1990-05-14 Ushio Inc ウエハ周辺露光における露光量制御装置
US8223317B2 (en) 2006-12-15 2012-07-17 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method controlling shutter based on intensity of reflected light

Also Published As

Publication number Publication date
JPS6134252B2 (enrdf_load_stackoverflow) 1986-08-06

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