JPS61296521A - Multitrack magnetic head and its production - Google Patents

Multitrack magnetic head and its production

Info

Publication number
JPS61296521A
JPS61296521A JP13813685A JP13813685A JPS61296521A JP S61296521 A JPS61296521 A JP S61296521A JP 13813685 A JP13813685 A JP 13813685A JP 13813685 A JP13813685 A JP 13813685A JP S61296521 A JPS61296521 A JP S61296521A
Authority
JP
Japan
Prior art keywords
film
magnetic
lower magnetic
nonmagnetic
magnetic film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13813685A
Other languages
Japanese (ja)
Inventor
Toru Inage
稲毛 透
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba TEC Corp
Original Assignee
Tokyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electric Co Ltd filed Critical Tokyo Electric Co Ltd
Priority to JP13813685A priority Critical patent/JPS61296521A/en
Publication of JPS61296521A publication Critical patent/JPS61296521A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To eliminate a crosstalk by forming plural lower magnetic layers and a nonmagnetic metallic film to embed the circumference of these lower magnetic layers on a nonmagnetic substrate by making flushes the surface with each other and successively forming a nonmagnetic insulating layer, winding wire film and an upper magnetic layer thereon. CONSTITUTION:The space around the winding wire film 5 is coated with an insulating material 6 and the upper magnetic film 7 is formed thereon by magnet ically coupling part thereto to the lower magnetic film 2. A surface 2a to face a recording medium in contact therewith is formed on the end face of the film 2 and the end faces of the nonmagnetic substrate 1, the nonmagnetic metallic film 3, the nonmagnetic insulating layer 4 and the upper magnetic film 7 are so formed as to be flush with the surface 2a. Since the films 2 are cir cumferentially enclosed with the film 3, there is no magnetic flux leakage be tween the adjacent films 2 and the exact recording and reproduction are execut ed. Since the surfaces of the films 2 and the film 3 are flush with each other, the winding wire film 5 is formed to a uniform thickness over the same plane. The disconnection of the winding wire film 5 is thereby prevented and the efficiency of current conduction is improved as well.

Description

【発明の詳細な説明】 産業上の利用分野 この発明は、マルチトラック磁気ヘッド及びその製造方
法に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention This invention relates to a multi-track magnetic head and a method for manufacturing the same.

従来の技術 第5図、第6図に示すように、非磁性基板5゜の表面に
複数本の下層磁性膜51を形成し、これらの下層磁性膜
51にギャップを空けて対向する渦巻状の巻線膜52を
非磁性基板5o上に形成し、その上に一部が下層磁性膜
51に磁気結合された上層磁性H(図示せず)を形成し
たマルチトラック磁気ヘッドが存する。
BACKGROUND ART As shown in FIGS. 5 and 6, a plurality of lower magnetic films 51 are formed on the surface of a non-magnetic substrate 5°. There is a multi-track magnetic head in which a winding film 52 is formed on a non-magnetic substrate 5o, and an upper magnetic layer H (not shown), a part of which is magnetically coupled to the lower magnetic film 51, is formed thereon.

つぎに、非磁性基板5oに下層磁性膜51を形成する手
段を第8図に工程順に示す、(a)はスパッタリング法
、蒸着法等の手段により非磁性基板5oに電極53を形
成する工程、(b)は形成したい下層磁性膜51の両側
に位置させてレジストによりパターンフレーム54を形
成する工程、(C)は電極53上に磁性膜55を鍍金す
る工程、(d)は残すべき磁性膜55上をレジスト56
により覆う工程、(e)はケミカルエツチングにより磁
性膜55を除去する工程、(f)はレジスト56を除去
する工程、(g)ははみ出す電極53を除去する工程、
この残した磁性膜55が下層磁性膜51である。
Next, the steps for forming the lower magnetic film 51 on the non-magnetic substrate 5o are shown in the order of steps in FIG. (b) is a step of forming a pattern frame 54 with resist on both sides of the lower magnetic film 51 to be formed, (C) is a step of plating a magnetic film 55 on the electrode 53, and (d) is a magnetic film to be left. Resist 56 above 55
(e) is a step of removing the magnetic film 55 by chemical etching, (f) is a step of removing the resist 56, (g) is a step of removing the protruding electrode 53,
This remaining magnetic film 55 is the lower magnetic film 51.

発明が解決しようとする問題点 しかし、下層磁性膜51間のクロストークが問題になり
、正確な記録、再生が行い難い。下層磁性膜51の間隔
を広げれば装置が大型化する。第7図に示すように、下
層磁性膜51を互いに内側に傾けたものがあるが、これ
はクロストークの問題が極めて大きい。また、非磁性基
板50から下層磁性膜51のみが突出するため段差が生
じ、巻線膜52の段差部に断線が発生し、製造工程の歩
留が悪い。段差部では巻線膜52の膜厚が薄くなるため
、同一平面上で形成された巻線膜に比較すると記録電流
を小さくしなければならない。これにともない、再生出
力が小さくなる。
Problems to be Solved by the Invention However, crosstalk between the lower magnetic films 51 becomes a problem, making accurate recording and reproduction difficult. If the interval between the lower magnetic films 51 is widened, the device becomes larger. As shown in FIG. 7, there is a structure in which the lower magnetic films 51 are tilted inward from each other, but this causes an extremely serious problem of crosstalk. Further, since only the lower magnetic film 51 protrudes from the non-magnetic substrate 50, a step is created, and a disconnection occurs at the step portion of the winding film 52, resulting in a poor yield in the manufacturing process. Since the thickness of the winding film 52 is thinner at the step portion, the recording current must be smaller than that for the winding film formed on the same plane. Along with this, the playback output becomes smaller.

さらに、非磁性基板5oに下層磁性膜51を形成するま
での過程を見ても工程が複雑で製造工数が増加する。
Furthermore, the steps up to the formation of the lower magnetic film 51 on the nonmagnetic substrate 5o are complicated and the number of manufacturing steps increases.

この発明はこのような点に鑑みなされたもので、クロス
トークの問題を解消し、しかも製造工程を短縮しうるマ
ルチトラック磁気ヘッド及びその製造方法を提供するこ
とを目的とする。
The present invention has been made in view of these points, and it is an object of the present invention to provide a multi-track magnetic head and its manufacturing method that can eliminate the problem of crosstalk and shorten the manufacturing process.

問題点を解決するための手段 第一の発明は、第1図に示すように、非磁性基板1に複
数本の下層磁性膜2とこれらの下層磁性膜2の周囲を埋
める非磁性金属膜3とを表面を一致させて形成する。そ
の上に非磁性絶縁層4と巻線膜5と上層磁性膜7とを順
次形成する。
Means for Solving the Problems The first invention, as shown in FIG. and are formed by matching the surfaces. A nonmagnetic insulating layer 4, a winding film 5, and an upper magnetic film 7 are sequentially formed thereon.

第二の発明は製造方法の発明で、第4図(a)なしい(
h)に示す。
The second invention is an invention of a manufacturing method, and Fig. 4 (a) without (
Shown in h).

(a)は非磁性基板1に非磁性金属膜3を形成する非磁
性金属膜形成工程。
(a) shows a non-magnetic metal film forming step of forming a non-magnetic metal film 3 on a non-magnetic substrate 1.

(b)は非磁性金属膜3の一部8を残してレジスト9で
覆うレジスト処理工程。
(b) is a resist processing step in which a part 8 of the nonmagnetic metal film 3 is left and covered with a resist 9.

(c)は非磁性金属膜3の一部8をエツチングして溝1
0を形成するエツチング工程。
(c) is a groove 1 formed by etching a part 8 of the non-magnetic metal film 3.
Etching process to form 0.

(d)は溝10に下層磁性膜2を鍍金する下層磁性膜形
成工程。
(d) is a lower magnetic film forming step in which the groove 10 is plated with the lower magnetic film 2.

(e)はレジスト9を除去するレジスト除去工程。(e) is a resist removal step in which the resist 9 is removed.

(f)は非磁性金属膜3と下層磁性膜2との同一平面上
に非磁性絶縁層4を形成する非磁性絶縁層形成工程。
(f) is a nonmagnetic insulating layer forming step in which a nonmagnetic insulating layer 4 is formed on the same plane of the nonmagnetic metal film 3 and the lower magnetic film 2.

(g)は非磁性絶縁層4上に巻線膜5を形成する巻線膜
形成工程。
(g) is a winding film forming step in which a winding film 5 is formed on the nonmagnetic insulating layer 4.

(h)は一部を下層磁性膜2に磁気結合させて上層磁性
膜7を形成する上層磁性膜形成工程。
(h) is an upper magnetic film forming step in which a portion of the upper magnetic film 7 is magnetically coupled to the lower magnetic film 2.

作用 第一の発明は、隣接する下層磁性膜2間の磁束の漏れを
非磁性金属膜3により防止する。巻線膜5は同一平面上
に形成することが可能となり、通電効率が向上するとと
もに断線の発生を防止することが可能となる。
In the first aspect of the invention, leakage of magnetic flux between adjacent lower magnetic films 2 is prevented by the nonmagnetic metal film 3. The winding film 5 can be formed on the same plane, improving current conduction efficiency and preventing wire breakage.

第二の発明は、第4図(a)ないしくe)に示すように
、下層磁性膜2を形成する工程数を第8図に示す従来技
術に比して少なくすることになる。
In the second invention, as shown in FIGS. 4(a) to 4(e), the number of steps for forming the lower magnetic film 2 is reduced compared to the conventional technique shown in FIG. 8.

実施例 この発明の一実施例を第1図ないし第4図に基づいて説
明する。第4図に示す製造工程順に説明すると、 まず、第4図(a)に示すように、非磁性基板1の表面
に下層磁性膜3をスパッタリング法等の薄膜技術により
形成する。
Embodiment An embodiment of the present invention will be described with reference to FIGS. 1 to 4. To explain the manufacturing steps in the order shown in FIG. 4, first, as shown in FIG. 4(a), the lower magnetic film 3 is formed on the surface of the nonmagnetic substrate 1 by a thin film technique such as sputtering.

つぎに、第4図(b)に示すように、非磁性金属膜3上
にレジスト9の膜を形成しフォトエツチングによりレジ
スト9の一部を除去し、非磁性金属膜3の一部8を複数
箇所にわたり露出する。
Next, as shown in FIG. 4(b), a resist 9 film is formed on the non-magnetic metal film 3, and a part of the resist 9 is removed by photo-etching, and a part 8 of the non-magnetic metal film 3 is removed. Exposure in multiple locations.

つぎに、第4図(c)に示すように、レジスト9が存在
しない部分において、非磁性金属膜3に複数の溝1oを
化学エツチングにより形成する。
Next, as shown in FIG. 4(c), a plurality of grooves 1o are formed in the nonmagnetic metal film 3 by chemical etching in areas where the resist 9 is not present.

つぎに、第4図(d)に示すように、これらの溝10に
下層磁性膜2を鍍金する。このとき、非磁性金属膜3と
下層磁性膜3との表面を一致させる。
Next, as shown in FIG. 4(d), these grooves 10 are plated with the lower magnetic film 2. At this time, the surfaces of the nonmagnetic metal film 3 and the lower magnetic film 3 are made to coincide with each other.

つぎに、第4図(e)に示すように、レジスト9を除去
する。
Next, as shown in FIG. 4(e), the resist 9 is removed.

つぎに、第4図(f)に示すように、下層磁性膜2と磁
性金属膜3との表面に非磁性絶縁層4を形成する。
Next, as shown in FIG. 4(f), a nonmagnetic insulating layer 4 is formed on the surfaces of the lower magnetic film 2 and the magnetic metal film 3.

つぎに、第4図(g)に示すように、同一平面上で渦を
まく導電性の複数の巻線膜5を薄膜技術等により形成す
る。この状態は第2図に示す通りである。下層磁性膜2
と非磁性金属膜3との膜厚は等しいが、第3図に示すよ
うに、非磁性金属膜3の膜厚は表面さえ下層磁性膜2と
一致させれば下層磁性膜2より厚くてもよい。
Next, as shown in FIG. 4(g), a plurality of conductive winding films 5 swirling on the same plane are formed by thin film technology or the like. This state is as shown in FIG. Lower magnetic film 2
The thickness of the non-magnetic metal film 3 is the same as that of the lower magnetic film 2, but as shown in FIG. good.

つぎに、第4図(h)に示すように1巻線膜5の周囲の
空間を絶縁材6で覆いその上に上層磁性膜7をその一部
を下層磁性膜2に磁気結合(接合)させて形成する。下
層磁性膜2の端面には記録媒体に接触する媒体対接面2
aが形成され、非磁性基板1、非磁性金属膜3、非磁性
絶縁層4.上層磁性膜7の端面も媒体対接面2aに一致
するように仕上られている。
Next, as shown in FIG. 4(h), the space around the first winding film 5 is covered with an insulating material 6, and a portion of the upper magnetic film 7 is magnetically coupled (bonded) to the lower magnetic film 2. Let it form. A medium contacting surface 2 that contacts the recording medium is provided on the end surface of the lower magnetic film 2.
a, a nonmagnetic substrate 1, a nonmagnetic metal film 3, a nonmagnetic insulating layer 4. The end surface of the upper magnetic film 7 is also finished to match the medium contacting surface 2a.

このような構成において、媒体対接面2aを接触させ、
巻線膜5に記録信号に基づく電流を流して走行する記録
媒体に記録し、或いは記録媒体の情報に基づき変化する
巻線膜5の電流を取り出して再生が行われる。各下層磁
性膜2は周囲が非磁性金属膜3に囲まれているため、隣
接する下層磁性膜2間の磁束漏れがなく、正確な記録又
は再生が行われる。また、下層磁性膜2と非磁性金属膜
3との表面が同一のため、巻線膜5を同一平面上1こ均
一な膜厚で形成することができ、したがって、巻線膜5
の断線を防止することができ、通電効率も向上する。こ
れにともない、再生電圧、再生出力を高めることができ
、同一の再生出力を得るには電流を小さくすることがで
きる。
In such a configuration, the medium contacting surface 2a is brought into contact with the
Recording is performed on a running recording medium by passing a current based on a recording signal through the winding film 5, or reproduction is performed by extracting a current in the winding film 5 that changes based on information on the recording medium. Since each lower magnetic film 2 is surrounded by a nonmagnetic metal film 3, there is no magnetic flux leakage between adjacent lower magnetic films 2, and accurate recording or reproduction is performed. Furthermore, since the surfaces of the lower magnetic film 2 and the non-magnetic metal film 3 are the same, the winding film 5 can be formed with a uniform thickness on the same plane.
It is possible to prevent disconnection of the wire, and the current conduction efficiency is also improved. Accordingly, the reproduction voltage and reproduction output can be increased, and the current can be reduced to obtain the same reproduction output.

また、第8図(a)ないしくg)と第4図(a)ないし
くe)を比較すれば分かるように、非磁性基板1上に下
層磁性膜2を形成する工程数を短縮することができる。
Furthermore, as can be seen by comparing FIGS. 8(a) to 8(g) with FIGS. 4(a) to e), the number of steps for forming the lower magnetic film 2 on the nonmagnetic substrate 1 can be reduced. I can do it.

しかも、この過程で下層磁性膜2の周囲を非磁性金属膜
3により覆うこともできる。
Moreover, in this process, the periphery of the lower magnetic film 2 can be covered with the non-magnetic metal film 3.

発明の効果 この発明は上述のように構成したので、隣接する下層磁
性膜間の磁束の漏れを非磁性金属膜により防止すること
ができ、巻線膜は同一平面上に形成することが可能とな
り、これにより通電効率を向上させるとともに断線の発
生を防止することができ、さらに、非磁性基板に下層磁
性膜を形成するまでの工程数を短縮することができる等
の効果を有する。
Effects of the Invention Since the present invention is configured as described above, leakage of magnetic flux between adjacent lower magnetic films can be prevented by the non-magnetic metal film, and the winding films can be formed on the same plane. As a result, it is possible to improve the current conduction efficiency and prevent the occurrence of wire breakage, and furthermore, it has effects such as being able to shorten the number of steps required to form the lower magnetic film on the nonmagnetic substrate.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図ないし第4図はこの発明の一実施例を示すもので
、第1図は縦断側面図、第2図は非磁性基板に非磁性金
属膜と下層磁性膜と非磁性絶縁層と巻線膜とを形成した
半製品を示す一部切欠の斜視図、第3図はその半製品の
変形例を示す一部切欠の斜視図、第4図(a)〜(h)
は製造工程を順に示す縦断正面図、第5図ないし第8図
は従来例を示すもので、第5図は非磁性基板に下層磁性
膜と巻線膜とを形成した半製品の状態を示す一部切欠の
斜視図、第6図及び第7図はその平面図、第8図(a)
〜(g)は非磁性基板に下層磁性膜を形成するまでの過
程を示す縦断正面図である。 1・・・非磁性基板、2・・・下層磁性膜、2a・・・
媒体対接面、3・・・非磁性金属膜、4・・・非磁性絶
縁層、5・・・巻線膜、7・・・上層磁性膜、9・・・
レジスト、10・・・溝
1 to 4 show an embodiment of the present invention, in which FIG. 1 is a vertical side view, and FIG. 2 is a non-magnetic substrate with a non-magnetic metal film, a lower magnetic film, and a non-magnetic insulating layer. FIG. 3 is a partially cutaway perspective view showing a modified example of the semifinished product, and FIGS. 4(a) to (h)
Figures 5 to 8 show a conventional example, and Figure 5 shows a semi-finished product in which a lower magnetic film and a winding film are formed on a non-magnetic substrate. Partially cutaway perspective view, Figures 6 and 7 are plan views, Figure 8(a)
- (g) are longitudinal sectional front views showing the process up to forming a lower magnetic film on a nonmagnetic substrate. DESCRIPTION OF SYMBOLS 1...Nonmagnetic substrate, 2...Lower magnetic film, 2a...
Medium contact surface, 3... Nonmagnetic metal film, 4... Nonmagnetic insulating layer, 5... Winding film, 7... Upper layer magnetic film, 9...
Resist, 10... groove

Claims (1)

【特許請求の範囲】 1、非磁性基板の表面に一端が媒体対接面となる複数本
の下層磁性膜を記録媒体のトラックに対応させて形成す
るとともにこれらの下層磁性膜の周囲を埋める非磁性金
属膜をその表面を前記下層磁性膜の表面と同一面上に定
めて形成し、前記下層磁性膜及び前記非磁性金属膜の表
面に、非磁性絶縁層と、前記下層磁性膜と対向する平面
上で渦をまく導電性の巻線膜と、一部が前記下層磁性膜
に磁気結合された上層磁性膜とを順次積層して形成した
ことを特徴とするマルチトラック磁気ヘッド。 2、非磁性基板の表面に非磁性金属膜を形成する非磁性
金属膜形成工程と、前記非磁性金属膜の表面の一部を残
してレジストにより覆うレジスト処理工程と、前記レジ
ストが存在しない部分において前記非磁性金属膜の表面
に溝を形成するエッチング工程と、前記溝に下層磁性膜
を鍍金する下層磁性膜形成工程と、前記レジストを除去
するレジスト除去工程と、前記非磁性金属膜及び前記下
層磁性膜の表面に非磁性絶縁層を積層する非磁性絶縁層
形成工程と、前記下層磁性膜と対向する平面上で渦をま
く導電性の巻線膜を前記非磁性絶縁層の表面に積層する
巻線膜形成工程と、前記巻線膜を覆う上層磁性膜をその
一部を前記下層磁性膜に磁気結合させて形成する上層磁
性膜形成工程とよりなることを特徴とするマルチトラッ
ク磁気ヘッドの製造方法。
[Scope of Claims] 1. A plurality of lower magnetic films are formed on the surface of a non-magnetic substrate, one end of which is a medium-contacting surface, corresponding to the tracks of the recording medium, and a non-magnetic film is formed to fill the periphery of these lower magnetic films. A magnetic metal film is formed with its surface flush with the surface of the lower magnetic film, and a nonmagnetic insulating layer is provided on the surfaces of the lower magnetic film and the non-magnetic metal film, facing the lower magnetic film. A multi-track magnetic head characterized in that it is formed by sequentially laminating a conductive winding film swirling on a plane and an upper magnetic film partially magnetically coupled to the lower magnetic film. 2. A non-magnetic metal film forming step of forming a non-magnetic metal film on the surface of a non-magnetic substrate, a resist treatment step of covering a portion of the surface of the non-magnetic metal film with a resist, and a portion where the resist does not exist. an etching step for forming grooves on the surface of the non-magnetic metal film; a lower magnetic film forming step for plating a lower magnetic film in the grooves; a resist removal step for removing the resist; A non-magnetic insulating layer forming step of laminating a non-magnetic insulating layer on the surface of the lower magnetic film, and laminating a conductive winding film swirling on a plane facing the lower magnetic film on the surface of the non-magnetic insulating layer. a winding film forming step, and an upper magnetic film forming step of forming an upper magnetic film covering the winding film by magnetically coupling a portion of the upper magnetic film to the lower magnetic film. manufacturing method.
JP13813685A 1985-06-25 1985-06-25 Multitrack magnetic head and its production Pending JPS61296521A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13813685A JPS61296521A (en) 1985-06-25 1985-06-25 Multitrack magnetic head and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13813685A JPS61296521A (en) 1985-06-25 1985-06-25 Multitrack magnetic head and its production

Publications (1)

Publication Number Publication Date
JPS61296521A true JPS61296521A (en) 1986-12-27

Family

ID=15214833

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13813685A Pending JPS61296521A (en) 1985-06-25 1985-06-25 Multitrack magnetic head and its production

Country Status (1)

Country Link
JP (1) JPS61296521A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62173611A (en) * 1986-01-28 1987-07-30 Sony Corp Production for thin film magnetic head

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62173611A (en) * 1986-01-28 1987-07-30 Sony Corp Production for thin film magnetic head
JPH0814886B2 (en) * 1986-01-28 1996-02-14 ソニー株式会社 Manufacturing method of thin film magnetic head

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