JP2528860B2 - Manufacturing method of thin film magnetic head - Google Patents

Manufacturing method of thin film magnetic head

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Publication number
JP2528860B2
JP2528860B2 JP62044998A JP4499887A JP2528860B2 JP 2528860 B2 JP2528860 B2 JP 2528860B2 JP 62044998 A JP62044998 A JP 62044998A JP 4499887 A JP4499887 A JP 4499887A JP 2528860 B2 JP2528860 B2 JP 2528860B2
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JP
Japan
Prior art keywords
thin film
magnetic
magnetic head
core
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62044998A
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Japanese (ja)
Other versions
JPS63211112A (en
Inventor
正男 清水
Original Assignee
関西日本電気株式会社
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Application filed by 関西日本電気株式会社 filed Critical 関西日本電気株式会社
Priority to JP62044998A priority Critical patent/JP2528860B2/en
Publication of JPS63211112A publication Critical patent/JPS63211112A/en
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Publication of JP2528860B2 publication Critical patent/JP2528860B2/en
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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3176—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps
    • G11B5/3179—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes
    • G11B5/3183—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes intersecting the gap plane, e.g. "horizontal head structure"
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は例えばVTR装置等に使用される薄膜磁気ヘッ
ドの製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a thin film magnetic head used in, for example, a VTR device.

従来の技術 磁気テープ等の磁気記録媒体への情報の記録及び磁気
記録媒体からの情報の再生に使用される電磁誘導型の薄
膜磁気ヘッドは、非磁性体基板上に強磁性体薄膜コアや
薄膜コイル等のパターンを含む複数の薄膜パターンを部
分的に重ねて積層形成し、その後上記基板上に薄膜パタ
ーンを保護する非磁性体の保護板を固着した構造のもの
が一般的である。2. Description of the Related Art An electromagnetic induction type thin film magnetic head used for recording information on a magnetic recording medium such as a magnetic tape and reproducing information from the magnetic recording medium is a ferromagnetic thin film core or thin film on a non-magnetic substrate. A general structure is one in which a plurality of thin film patterns including patterns such as coils are partially overlapped and laminated, and then a non-magnetic protective plate for protecting the thin film patterns is fixed on the substrate.

この薄膜磁気ヘッドの製造方法の従来例を第14図
（ａ）（ｂ）乃至第18図（ａ）（ｂ）を参照しながら説
明する。A conventional example of the method for manufacturing the thin film magnetic head will be described with reference to FIGS. 14 (a) and (b) to FIGS. 18 (a) and 18 (b).

まず第14図（ａ）（ｂ）に示すようにガラスやセラミ
ック等の非磁性体基板（１）上に、フェライトやセンダ
スト等の強磁性体からなる下層薄膜コア（２）をスパッ
タリング等により部分的に形成し、この下層薄膜コア
（２）の周りにガラス等の非磁性体からなる絶縁性薄膜
（３）を形成して平坦化する。次に第15図（ａ）（ｂ）
に示すようにギャップスペーサとなるSiO2等の非磁性体
薄膜（４）を上記基板（１）上に積層形成し、この非磁
性体薄膜（４）上にスパイラル状の薄膜コイルパターン
（５）を形成する。そして第16図（ａ）（ｂ）に示すよ
うに上記薄膜コイルパターン（５）上にガラス等の絶縁
性薄膜パターン（６）を形成すると共に、後述の上層薄
膜コアと下層薄膜コア（２）とを磁気的に接続するた
め、非磁性体薄膜（４）の一部（ｍ）をエッチングによ
り窓明けする。次に第17図（ａ）（ｂ）に示すように上
記非磁性体薄膜（４）の窓明け部分（ｍ）を含む絶縁性
薄膜パターン（６）上に強磁性体からなる上層薄膜コア
（７）を被着形成すると共に、絶縁性薄膜パターン
（６）上に外部引き出し用の薄膜コイルパターン（８）
を積層形成する。更に第18図（ａ）（ｂ）に示すように
低融点ガラス等の接着材（９）を介して保護板（10）を
加熱溶着する。First, as shown in FIGS. 14 (a) and (b), a lower layer thin film core (2) made of a ferromagnetic material such as ferrite or sendust is partially formed on the non-magnetic substrate (1) such as glass or ceramic by sputtering or the like. Of the non-magnetic material such as glass is formed around the lower thin film core (2) to flatten it. Next, Fig. 15 (a) (b)
As shown in FIG. 5, a non-magnetic thin film (4) such as SiO 2 which becomes a gap spacer is laminated on the substrate (1), and a spiral thin film coil pattern (5) is formed on the non-magnetic thin film (4). To form. Then, as shown in FIGS. 16 (a) and 16 (b), an insulating thin film pattern (6) such as glass is formed on the thin film coil pattern (5), and an upper thin film core and a lower thin film core (2) described later are formed. In order to magnetically connect with, a part (m) of the non-magnetic thin film (4) is opened by etching. Next, as shown in FIGS. 17 (a) and (b), an upper layer thin film core (of a ferromagnetic material) is formed on the insulating thin film pattern (6) including the window opening (m) of the non-magnetic thin film (4). 7) is deposited and the thin film coil pattern (8) for external extraction is formed on the insulating thin film pattern (6).
Are laminated. Further, as shown in FIGS. 18 (a) and 18 (b), the protective plate (10) is heat-welded through an adhesive material (9) such as low melting point glass.

上述のようにして製造された薄膜磁気ヘッド（11）
は、第19図に示すように磁気ギャップ（ｇ）を有する先
端面を曲面研磨してテープ摺接面（12）を形成し、この
テープ摺接面（12）に沿って磁気テープ（13）を走行さ
せることにより、電磁誘導を行わせて、磁気テープ（1
3）への情報の記録及び磁気テープ（13）からの情報の
再生を行う。Thin-film magnetic head manufactured as described above (11)
As shown in FIG. 19, the front end surface having the magnetic gap (g) is curved to form a tape sliding contact surface (12), and the magnetic tape (13) is formed along the tape sliding contact surface (12). The magnetic tape (1
3) Recording of information on the magnetic tape (13) and reproduction of information from the magnetic tape (13).

発明が解決しようとする問題点 ところで、上述した従来方法により製造された薄膜磁
気ヘッド（11）では、基板（１）の上面に対して平行に
薄膜コア（２）（７）や非磁性体薄膜（４）等の各薄膜
パターンを積層形成し、この薄膜パターン形成面に対し
て略直交する方向に磁気テープ（13）を基板（１）の端
面、即ち磁気ギャップが断層露出するテープ摺接面（1
2）で摺動させている。そのため、第14図（ａ）（ｂ）
乃至第18図（ａ）（ｂ）で説明した製造工程では、薄膜
磁気ヘッド（11）の積層形成中に、磁気ギャップｇにア
ジマス角度を設けることが困難であり、特にトリックプ
レー機能を持っているVTR装置等で使用するダブルアジ
マスヘッドを、上記製造工程を経て作製することが極め
て困難であった。また、上記薄膜磁気ヘッド（11）で
は、下層薄膜コア（２）の膜厚によって、この下層薄膜
コア（２）が疑似ギャップとなる虞があり適正な磁気記
録が行えないという問題点があった。DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention In the thin film magnetic head (11) manufactured by the above-mentioned conventional method, the thin film cores (2) (7) and the non-magnetic thin film are parallel to the upper surface of the substrate (1). Each thin film pattern such as (4) is laminated, and the magnetic tape (13) is attached to the end surface of the substrate (1) in the direction substantially orthogonal to the thin film pattern forming surface, that is, the tape sliding contact surface where the magnetic gap is tomographically exposed. (1
Sliding in 2). Therefore, Figure 14 (a) (b)
In the manufacturing process described with reference to FIGS. 18 (a) and 18 (b), it is difficult to provide an azimuth angle in the magnetic gap g during the formation of the laminated thin film magnetic head (11). It was extremely difficult to manufacture the double azimuth head used in the existing VTR device or the like through the above manufacturing process. Further, in the above-mentioned thin film magnetic head (11), there is a problem that the lower layer thin film core (2) may become a pseudo gap due to the film thickness of the lower layer thin film core (2) and proper magnetic recording cannot be performed. .

そこで本発明の目的とするところは、VTR装置等で使
用するダブルアジマスヘッドの作製を実現容易ならしめ
た薄膜磁気ヘッドの製造方法を提供するにある。Therefore, it is an object of the present invention to provide a method for manufacturing a thin film magnetic head that facilitates the manufacture of a double azimuth head used in a VTR device or the like.

問題点を解決するための手段 本発明は前記問題点に鑑みて提案されたもので、強磁
性体からなる下層薄膜コアを形成した非磁性体基板上に
第１の絶縁性薄膜を形成し、この第１の絶縁性薄膜上に
スパイラル状の薄膜コイルパターンを形成する工程と、
上記第１の絶縁性薄膜の一部を窓明けすると共に、その
窓明け部分を除くコイルパターン上に第２の絶縁性薄膜
を形成し、窓明け部分を含む第２の絶縁性薄膜上に強磁
性体からなる上層薄膜コアを積層形成する工程と、この
上層薄膜コアに、窓明けして、この上層薄膜コアを分断
する溝を設けて磁気ギャップを形成する工程とを具備し
たことにより前述した目的を達成しようとする薄膜磁気
ヘッドの製造方法である。Means for Solving the Problems The present invention has been proposed in view of the above problems, in which a first insulating thin film is formed on a non-magnetic substrate on which a lower thin film core made of a ferromagnetic material is formed, A step of forming a spiral thin film coil pattern on the first insulating thin film;
A part of the first insulating thin film is opened, a second insulating thin film is formed on the coil pattern excluding the opening part, and the second insulating thin film including the opening part is strengthened. As described above, the method includes a step of forming an upper layer thin film core made of a magnetic material in a laminated manner, and a step of forming a window in the upper layer thin film core to form a groove for dividing the upper layer thin film core to form a magnetic gap. A method of manufacturing a thin-film magnetic head, which aims to achieve the object.

作用 本発明方法によれば、非磁性体基板上に上下層薄膜コ
ア等の薄膜パターンを積層形成し、上層薄膜コア上面に
非磁性体薄膜の磁気ギャップを形成することにより、上
層薄膜コアの上面が薄膜パターン形成面に沿って略平行
状態のテープ摺接面をなし、上記磁気ギャップにアジマ
ス角度を容易に設けることができ、ダブルアジマスヘッ
ドの作製が実現化される。Effect According to the method of the present invention, by forming thin film patterns such as upper and lower thin film cores on a non-magnetic substrate and forming a magnetic gap of the non-magnetic thin film on the upper surface of the upper thin film core, the upper surface of the upper thin film core is formed. Form a tape sliding contact surface in a substantially parallel state along the thin film pattern forming surface, and the azimuth angle can be easily provided in the magnetic gap, and the production of the double azimuth head is realized.

実施例 本発明に係る薄膜磁気ヘッドの製造方法の実施例を第
１図（ａ）（ｂ）乃至第13図を参照しながら説明する。EXAMPLE An example of a method of manufacturing a thin film magnetic head according to the present invention will be described with reference to FIGS. 1 (a) and (b) to FIG.

まず第１図（ａ）（ｂ）に示すようにガラスやセラミ
ック等の非磁性体基板（20）の上面の下層コア形成領域
部分である略中央部分に、フェライトやセンダスト等の
強磁性体からなる下層薄膜コア（21）をスパッタリング
等により形成し、その下層薄膜コア（21）の周辺部分の
基板（20）上にガラス等の非磁性体薄膜（22）を上記下
層薄膜コア（21）と略同一膜厚で形成して平坦化する。
このように平坦化するに際しては、上記以外にも基板
（20）の上面の略中央部分に凹部を予め形成しておき、
この凹部内に下層薄膜コアを埋設するようにしてもよ
い。次に第２図（ａ）（ｂ）に示すように上記下層薄膜
コア（21）及び非磁性体薄膜（22）上にSiO2等の第１の
絶縁性薄膜（23）をスパッタリング等により形成した
後、第１の絶縁性薄膜（23）上に、例えば銅製の薄膜コ
イルパターン（24）をスパイラル状に形成する。尚、こ
の薄膜コイルパターン（24）の両端を基板（20）の両側
へ延設して電極部（25）（25）を形成し、特に図示破線
で示すように上記薄膜コイルパターン（24）の両端を基
板（20）の一側に延設して電極部（25）（25′）を形成
すれば、薄膜コイルパターン（24）の外部引き出しが基
板（20）の一側方からできるという利点がある。その
後、第３図（ａ）（ｂ）に示すように薄膜コイルパター
ン（24）のスパイラル中心部分（ｎ）（ｎ）を除く部分
にガラス等の第２の絶縁性薄膜（26）を被着形成すると
共に、上記薄膜コイルパターン（24）のスパイラル中心
部分（ｎ）（ｎ）の第１の絶縁性薄膜（23）をエッチン
グ等により窓明けする。そしてこの窓明け部分（ｎ）
（ｎ）を含む第２の絶縁性薄膜（26）上にフェライトや
センダスト等の強磁性体からなる上層薄膜コア（27）を
スパッタリング等により形成する。このようにして、下
層薄膜コア（21）と上層薄膜コア（27）とは前述した第
１の絶縁性薄膜（23）の窓明け部分（ｎ）（ｎ）で磁気
的に接続されて閉磁路を形成する。尚、上層薄膜コア
（27）は第３図（ａ）に示すように薄膜コイルパターン
（24）の電極部（25）（25）が露呈するように基板（2
0）よりも幅狭に形成する方が好ましい。First, as shown in FIGS. 1 (a) and 1 (b), a ferromagnetic material such as ferrite or sendust is applied to a substantially central portion which is a lower core forming region portion of an upper surface of a non-magnetic substrate (20) such as glass or ceramic. The lower thin film core (21) is formed by sputtering or the like, and a non-magnetic thin film (22) such as glass is formed on the substrate (20) around the lower thin film core (21) as the lower thin film core (21). The films are formed to have substantially the same film thickness and are flattened.
When flattening in this manner, in addition to the above, a recess is formed in advance in the substantially central portion of the upper surface of the substrate (20),
The lower layer thin film core may be embedded in this recess. Next, as shown in FIGS. 2A and 2B, a first insulating thin film (23) such as SiO 2 is formed on the lower thin film core (21) and the non-magnetic thin film (22) by sputtering or the like. After that, a thin film coil pattern (24) made of, for example, copper is spirally formed on the first insulating thin film (23). Both ends of the thin film coil pattern (24) are extended to both sides of the substrate (20) to form electrode parts (25) (25). Particularly, as shown by broken lines in the figure, the thin film coil pattern (24) is formed. If both ends are extended to one side of the substrate (20) to form the electrode parts (25) (25 '), the thin film coil pattern (24) can be pulled out from one side of the substrate (20). There is. Then, as shown in FIGS. 3 (a) and 3 (b), a second insulating thin film (26) such as glass is deposited on the thin film coil pattern (24) except for the spiral central portions (n) and (n). At the same time as the formation, the first insulating thin film (23) in the spiral central portion (n) (n) of the thin film coil pattern (24) is opened by etching or the like. And this window opening part (n)
An upper layer thin film core (27) made of a ferromagnetic material such as ferrite or sendust is formed on the second insulating thin film (26) containing (n) by sputtering or the like. In this way, the lower layer thin film core (21) and the upper layer thin film core (27) are magnetically connected to each other at the window opening portions (n) and (n) of the first insulating thin film (23) to form a closed magnetic circuit. To form. The upper thin film core (27) is formed on the substrate (2) so that the electrode parts (25) (25) of the thin film coil pattern (24) are exposed as shown in FIG. 3 (a).
It is preferable to form the width narrower than 0).

次に上層薄膜コア（27）のアジマス角度Θ傾斜させさ
てギャップ長に相当する幅寸法で溝（31）をエッチング
等により形成し、この溝（31）にギャップスペーサとな
るSiO2等の非磁性体薄膜（32）を充填する。その後、上
層薄膜コア（27）（27′）の両側部分をエッチング等に
より除去して磁気ギャップｇを所定のトラック幅Ｔに設
定する。そして最後に第８図（ａ）（ｂ）に示すように
トラック幅Ｔを有する上層薄膜コア（27）（27′）の両
側にガラス等の非磁性体からなる磁気ギャップ保護薄膜
（29）（29）を被着形成して平坦化し、更に上層薄膜コ
ア（27）（27′）及び保護薄膜（29）（29）の上面を曲
面研磨してテープ摺接面（30）を形成する。Then, the azimuth angle Θ of the upper layer thin film core (27) is tilted to form a groove (31) with a width dimension corresponding to the gap length by etching or the like, and a non-magnetic material such as SiO 2 to be a gap spacer is formed in the groove (31). The body thin film (32) is filled. After that, both side portions of the upper thin film cores (27) and (27 ') are removed by etching or the like to set the magnetic gap g to a predetermined track width T. Finally, as shown in FIGS. 8 (a) and 8 (b), a magnetic gap protection thin film (29) (29) (which is made of a non-magnetic material such as glass is provided on both sides of an upper thin film core (27) (27 ') having a track width T. 29) is deposited and flattened, and the upper surfaces of the upper layer thin film cores (27) (27 ') and the protective thin films (29) (29) are curved to form a tape sliding contact surface (30).

但し、エッチングによりギャップ長の100倍程度もあ
るギャップデプス（深さ）を有する溝（31）を形成する
ことは非常に難しい場合が多い。この場合には、例えば
第10図に示すように所要の深さで精度良く溝を形成する
ことが可能な膜厚の上層薄膜コア（27a）に上記溝（31
a）を形成し、この膜厚の上層薄膜コア（27a）の積層形
成と溝（31a）の形成とを、必要なギャップデプスが得
られるまで繰り返すようにしてもよい。いずれもしても
その後は第７図（ａ）（ｂ）及び第８図（ａ）（ｂ）に
示す前述の各製造工程を経て上層薄膜コア（27）の上面
を曲面研磨してテープ摺接面（30）を形成し、所定のト
ラック幅、ギャップデプスの磁気ギャップｇを有する薄
膜磁気ヘッドを得る。本発明の薄膜磁気ヘッド（33）で
は、第11図に示すように基板（20）上の薄膜パターン形
成面と略平行なテープ摺接面（30）に沿って磁気テープ
（34）を走行させて磁気記録を行う。However, it is often very difficult to form the groove (31) having a gap depth (depth) of about 100 times the gap length by etching. In this case, for example, as shown in FIG. 10, the groove (31) is formed in the upper thin film core (27a) having a film thickness capable of accurately forming the groove at a required depth.
A) may be formed, and the formation of the upper thin film core (27a) having this thickness and the formation of the groove (31a) may be repeated until the required gap depth is obtained. In either case, after that, the upper surface of the upper thin film core (27) is curved and tape-slipped through the above-described manufacturing steps shown in FIGS. 7 (a) and (b) and FIGS. 8 (a) and (b). The surface (30) is formed to obtain a thin film magnetic head having a predetermined track width and a magnetic gap g having a gap depth. In the thin film magnetic head (33) of the present invention, as shown in FIG. 11, the magnetic tape (34) is run along the tape sliding contact surface (30) which is substantially parallel to the thin film pattern forming surface on the substrate (20). Magnetic recording.

尚、上記実施例では１つの薄膜磁気ヘッドの製造方法
について説明したが、第12図に示すように大きな非磁性
体基板（35）を共通にしてこの基板（35）上に多数個の
薄膜磁気ヘッド（36）（36）…を一括して作製し、図示
鎖線に沿って各単位（Ｐ）（Ｐ）…毎に分割するように
してもよいのは勿論である。Although the method of manufacturing one thin film magnetic head has been described in the above embodiment, as shown in FIG. 12, a large non-magnetic substrate (35) is shared and a large number of thin film magnetic heads are formed on this substrate (35). It is needless to say that the heads (36) (36) ... Can be collectively manufactured and divided into units (P) (P) ... along the chain line shown in the figure.

また、前述した実施例では１つのアジマス角度θの磁
気ギャップｇを有する薄膜磁気ヘッドの製造方法につい
て説明したが、ダブルアジマスヘッドを作製する場合に
は、前述した製造方法と同様にしてアジマス角度−θの
磁気ギャップｇを有するもう一つの薄膜磁気ヘッドを製
造し、アジマス角度θの薄膜磁気ヘッドとベアリングす
る。或いは第13図に示すように大きな非磁性体基板（3
7）上にアジマス角度がθと−θの薄膜磁気ヘッド（3
8）（39）…を交互に多数個作製し、このアジマス角度
θ、−θの薄膜磁気ヘッド（38）（39）を組として図示
鎖線に沿って単位（Ｑ）（Ｑ）…毎に分割することによ
りベアリングしてもよく、このようにすれば対をなす薄
膜磁気ヘッド同士のアジマス調整等の位置合わせが不要
となってベアリングが容易になる。またこのようなダブ
ルアジマスヘッドでは、アジマス角度θと−θの磁気ギ
ャップ同士を近接配置することも可能となり、磁気記録
時での磁気ギャップ間隔により生ずる遅延を可及的に少
なくすることが実現できる。Further, in the above-described embodiment, the method of manufacturing the thin film magnetic head having the magnetic gap g of one azimuth angle θ has been described. However, in the case of manufacturing the double azimuth head, the azimuth angle- Another thin film magnetic head having a magnetic gap g of θ is manufactured, and the thin film magnetic head having an azimuth angle θ is bearing. Alternatively, as shown in FIG. 13, a large non-magnetic substrate (3
7) on top of a thin film magnetic head with azimuth angles of θ and −θ (3
8) A large number of (39) ... are alternately manufactured, and the thin film magnetic heads (38) and (39) having azimuth angles θ and −θ are set as a group and divided into units (Q) (Q) ... By doing so, the bearing may be used, and in this way, the bearing becomes easy because the alignment such as azimuth adjustment between the thin film magnetic heads forming a pair is unnecessary. Further, in such a double azimuth head, it is possible to dispose the magnetic gaps of the azimuth angles θ and −θ close to each other, and it is possible to reduce the delay caused by the magnetic gap interval during magnetic recording as much as possible. .

発明の効果 本発明に係る薄膜磁気ヘッドの製造方法によれば、薄
膜磁気ヘッドの磁気ギャップにアジマス角度を設定する
ことが容易となり、一体化したダブルアジマスヘッドの
作製が実現化される。また薄膜パターン形成面と平行に
テープ摺接面を形成するため、従来方法の場合と異なっ
て疑似ギャップが生じることもないので適正な磁気記録
が実現できる。EFFECTS OF THE INVENTION According to the method of manufacturing a thin-film magnetic head of the present invention, it becomes easy to set the azimuth angle in the magnetic gap of the thin-film magnetic head, and an integrated double azimuth head can be manufactured. Further, since the tape sliding contact surface is formed in parallel with the thin film pattern forming surface, a pseudo gap is not generated unlike the conventional method, so that proper magnetic recording can be realized.

【図面の簡単な説明】[Brief description of drawings]

第１図（ａ）（ｂ）乃至第３図（ａ）（ｂ）及び第８図
（ａ）（ｂ）乃至第10図は、本発明の実施例を示す平面
図及び断面図である。は本発明方法の一実施例を説明す
るための各製造工程を示す基板の各平面図及び断面図、
第11図は本発明方法により製造された薄膜磁気ヘッド及
び磁気テープを示す断面図、第12図は本発明方法により
多数個の薄膜磁気ヘッドを作製した１つの基板を示す平
面図、第13図は一体化したアジマスヘッド用として多数
個の薄膜磁気ヘッドを作製した１つの基板を示す平面図
である。 第14図（ａ）（ｂ）乃至第18図（ａ）（ｂ）は薄膜磁気
ヘッドの製造方法の従来例を説明するための各製造工程
を示す基板の各平面図及び断面図、第19図は従来方法に
より製造された薄膜磁気ヘッド及び磁気テープを示す断
面図である。 （20）…非磁性体基板、（21）…下層薄膜コア、（23）
…第１の絶縁性薄膜、（24）…薄膜コイルパターン、
（26）…第２の絶縁性薄膜、（27）（27′）…上層薄膜
コア、（28）…非磁性体薄膜、（30）…テープ摺接面、
（ｎ）…窓明け部分、（ｇ）…磁気ギャップ。1 (a) (b) to 3 (a) (b) and 8 (a) (b) to 10 are a plan view and a sectional view showing an embodiment of the present invention. Is a plan view and a cross-sectional view of a substrate showing respective manufacturing steps for explaining one embodiment of the method of the present invention,
FIG. 11 is a sectional view showing a thin film magnetic head and a magnetic tape manufactured by the method of the present invention, FIG. 12 is a plan view showing one substrate on which a large number of thin film magnetic heads are manufactured by the method of the present invention, and FIG. FIG. 3 is a plan view showing one substrate on which a large number of thin film magnetic heads are manufactured for an integrated azimuth head. 14 (a), (b) to 18 (a), (b) are plan views and cross-sectional views of a substrate showing respective manufacturing steps for explaining a conventional example of a method for manufacturing a thin film magnetic head, and FIG. The figure is a cross-sectional view showing a thin film magnetic head and a magnetic tape manufactured by a conventional method. (20): Non-magnetic substrate, (21): Lower layer thin film core, (23)
... 1st insulating thin film, (24) ... thin film coil pattern,
(26) ... second insulating thin film, (27) (27 ') ... upper layer thin film core, (28) ... nonmagnetic thin film, (30) ... tape sliding surface,
(N) ... Window opening part, (g) ... Magnetic gap.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項１】強磁性体からなる下層薄膜コアを形成した
非磁性体基板上に第１の絶縁性薄膜を形成し、この第１
の絶縁性薄膜上にスパイラル状の薄膜コイルパターンを
形成する工程と、 上記第１の絶縁性薄膜の一部を窓明けすると共に、その
窓明け部分を除くコイルパターン上に第２の絶縁性薄膜
を形成し、窓明け部分を含む第２の絶縁性薄膜上に、強
磁性体からなる上層薄膜コアを積層形成する工程と、 この上層薄膜コアにギャップ長に相当する幅寸法で溝を
エッチングにより形成し、磁気ギャップを形成する工程
と、を含むことを特徴とする薄膜磁気ヘッドの製造方
法。1. A first insulating thin film is formed on a non-magnetic substrate on which a lower thin film core made of a ferromagnetic material is formed.
Forming a spiral thin film coil pattern on the insulating thin film, and opening a part of the first insulating thin film, and forming a second insulating thin film on the coil pattern excluding the opening. And a step of forming an upper layer thin film core made of a ferromagnetic material on the second insulating thin film including the window opening, and etching a groove in the upper layer thin film core with a width dimension corresponding to the gap length. Forming and forming a magnetic gap, and a method of manufacturing a thin-film magnetic head.
JP62044998A 1987-02-26 1987-02-26 Manufacturing method of thin film magnetic head Expired - Lifetime JP2528860B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62044998A JP2528860B2 (en) 1987-02-26 1987-02-26 Manufacturing method of thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62044998A JP2528860B2 (en) 1987-02-26 1987-02-26 Manufacturing method of thin film magnetic head

Publications (2)

Publication Number Publication Date
JPS63211112A JPS63211112A (en) 1988-09-02
JP2528860B2 true JP2528860B2 (en) 1996-08-28

Family

ID=12707092

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62044998A Expired - Lifetime JP2528860B2 (en) 1987-02-26 1987-02-26 Manufacturing method of thin film magnetic head

Country Status (1)

Country Link
JP (1) JP2528860B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0411314A (en) * 1990-04-27 1992-01-16 Sanyo Electric Co Ltd Thin-film magnetic head and production thereof

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55132519A (en) * 1979-04-03 1980-10-15 Fujitsu Ltd Manufacture for thin film magnetic head
JPS5683823A (en) * 1979-12-11 1981-07-08 Fujitsu Ltd Production for horizontal thin film magnetic head
FR2604021B1 (en) * 1986-09-17 1988-10-28 Commissariat Energie Atomique METHOD FOR PRODUCING MAGNETIC HEADS IN THIN FILMS AND WITH A PLANAR STRUCTURE AND HEAD OBTAINED BY THIS PROCESS

Also Published As

Publication number Publication date
JPS63211112A (en) 1988-09-02

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