JPS58108017A - Thin-film magnetic head - Google Patents

Thin-film magnetic head

Info

Publication number
JPS58108017A
JPS58108017A JP20373481A JP20373481A JPS58108017A JP S58108017 A JPS58108017 A JP S58108017A JP 20373481 A JP20373481 A JP 20373481A JP 20373481 A JP20373481 A JP 20373481A JP S58108017 A JPS58108017 A JP S58108017A
Authority
JP
Japan
Prior art keywords
resist
magnetic
thin film
magnetic head
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20373481A
Other languages
Japanese (ja)
Inventor
Yoshihiro Shiroishi
芳博 城石
Kazuo Shiiki
椎木 一夫
Isamu Yuhito
勇 由比藤
Atsushi Saiki
斉木 篤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP20373481A priority Critical patent/JPS58108017A/en
Publication of JPS58108017A publication Critical patent/JPS58108017A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/313Disposition of layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To facilitate minute work and to increase a reproduction output by using polyimide resin for patterning the insulating layer of a magnetic head which has an upper magnetic body formed of a thin film on a lower magnetic material with an insulating layer between. CONSTITUTION:In resist 32 provided over an Mn-Zn ferrite substrate 31 as the lower magnetic body, a groove is formed by an etching solution of phosphoric acid and polyimide resin 33 as a nonmagnetic insulating material is applied therein to an about 10mum thickness; and resist 34 is formed over the groove. After the resin is etched by, for example, a hydrogen etching solution, the resist 34 is removed and a winding conductor 34 is vapor-deposited. After resist 35 in the same pattern as a wiring pattern is formed on the conductor 34, the conductor 34 is patterned by reactive sputter etching. Further, polyimide resin is applied to flatten the conductive wiring part and excessive resin is removed by resist 37. Then, an insulating film 38 for gap formation and permalloy 39 for an upper magnetic core are formed.

Description

【発明の詳細な説明】 本発明は、VTR,磁気ディスク装置などに用いられる
、記録再生特性に優れた薄膜磁気ヘッドに関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a thin film magnetic head with excellent recording and reproducing characteristics used in VTRs, magnetic disk drives, and the like.

薄膜磁気ヘッドの記録再生効率を向上せしめるためには
、磁気ヘッド巻線部での磁束の漏れを少なくする必要が
ある。このためには、巻線部において上下の磁気コアの
間隔を大きくとれば良く、従来の磁気ヘッドにおいては
、第1図に示す構成としてい友。該ヘッドは、フェライ
トなどの強磁性基板11 K#1st−形成し、ガラス
のような非磁性絶縁物質12t−充填した後、表面を平
らに研摩し、ALI Cu、Auなどの巻線導体13.
13’。
In order to improve the recording and reproducing efficiency of a thin film magnetic head, it is necessary to reduce leakage of magnetic flux in the magnetic head winding. To achieve this, it is sufficient to increase the distance between the upper and lower magnetic cores in the winding section, and in the conventional magnetic head, the configuration shown in FIG. 1 is used. The head is formed by forming a ferromagnetic substrate 11K#1st such as ferrite, filling it with a non-magnetic insulating material 12t such as glass, polishing the surface flat, and forming a wire-wound conductor 13.K#1st such as ALI Cu or Au.
13'.

・ さらにS轟0. 、 At、 O,などの絶縁層14、
パーマロイなどの磁性薄膜15を設けることで作製され
る(41!F開昭54−118214  )。ところが
、半導体分野におけるリソグラフィ技術を応用して、大
基板上に多数の該薄膜磁気ヘッドを製造しようと、非磁
性絶縁層を充填した後研摩する工程において、各ヘッド
のS深さをそれぞれ±5μmの精度内で均一に加工する
ことは惚めて困難であシ、#III深さのばらつきが多
いためにヘッド特性も同一なものが得られず、また、#
11図に示した様に上部磁性コア15が平担でないため
、ヘッド特性自身−低いという欠点があった。さらに、
該非磁性絶縁層として有機系樹脂を用い九場合には、樹
脂とフェライトとの(11!度の差が著しいために、フ
ェライト部が研摩だれを起し、5μm程度に厳密に規制
する必要のめるギャップ深さく第1図のga)を制御す
ることが出来ず、該非磁性絶縁層としてはガラスなどの
無機系絶縁物t−500r程度の高温で溶融充填するし
かなく、ヘッド作製工程もあta効軍的ではなかった。
・Further S Todoroki 0. , At, O, etc., insulating layer 14,
It is manufactured by providing a magnetic thin film 15 of permalloy or the like (41!F 1982-118214). However, in an attempt to manufacture a large number of thin film magnetic heads on a large substrate by applying lithography technology in the semiconductor field, in the polishing process after filling the nonmagnetic insulating layer, the S depth of each head was adjusted to ±5 μm. It is extremely difficult to process uniformly within the accuracy of
As shown in FIG. 11, since the upper magnetic core 15 is not flat, there is a drawback that the head characteristics themselves are poor. moreover,
When an organic resin is used as the non-magnetic insulating layer, the difference in degree between the resin and the ferrite (11 degrees) is significant, and the ferrite part may sag due to polishing, making it necessary to strictly control the gap to about 5 μm. It is not possible to control the depth ga) in Figure 1, and the nonmagnetic insulating layer has no choice but to be filled with an inorganic insulator such as glass at a high temperature of about t-500R, and the head manufacturing process is also ineffective. It wasn't on point.

不発明は、非磁性充填材をポリイミド系などの有機系樹
脂とし、リングラフィ技術のみで微細素子化することに
よシ上記問題点を解決し、特性のばらつきが少ない高性
能の磁気ヘッドを歩留シ良く提供するものである。すな
わち、本発明によシ成る磁気ヘッドは、非磁性もしくは
強磁性基板に溝を作製し、そのat励起用配線導体を包
んだポリイミド系樹脂などの有機系樹脂で充填すること
を特徴とするものである。
The invention is to solve the above problems by using organic resin such as polyimide as the non-magnetic filler and fabricating fine elements using only phosphorography technology, and to create a high-performance magnetic head with less variation in characteristics. This is something that is well provided. That is, the magnetic head according to the present invention is characterized in that a groove is formed in a nonmagnetic or ferromagnetic substrate, and the groove is filled with an organic resin such as a polyimide resin that wraps the AT excitation wiring conductor. It is.

以下実施例に基づき、本発明の詳細な説明する。The present invention will be described in detail below based on Examples.

第2図に、Mn−7,nフェライト基板21(下部磁性
体となる)上に形成せしめた本発明によシ成る薄膜磁気
ヘッドを示す。ここで24は非磁性ギャップ形成層、2
5はパーマロイ磁性層(上部磁性体となる)である。本
磁気ヘッドは、その工程の一例を第3図に示すような方
法で作製した。まず、フェライト基板31上にレジスト
32を作製し、リン酸系エツチング液で深さ10μm1
長さ100μmの溝を形成(第3図(a))した後、ポ
リイミド系樹脂33を略10μm厚さ塗布し、御上にレ
ジスト34を作製する(同図Φ))。ヒドラジy系エツ
チング液で樹脂をエツチングした後レジストを除去しく
同図(C))、At34t−略2μm厚さ蒸着する。A
t上に配線パターンと同じパターンのレジス)35t−
形成した後、Atを反応性スバツタエ、ツチシグでパタ
ーニングする(同図(d))。
FIG. 2 shows a thin film magnetic head according to the present invention formed on a Mn-7,n ferrite substrate 21 (which serves as the lower magnetic material). Here, 24 is a nonmagnetic gap forming layer, 2
5 is a permalloy magnetic layer (which becomes the upper magnetic body). The present magnetic head was manufactured by a method as shown in FIG. 3, an example of the process. First, a resist 32 is prepared on a ferrite substrate 31 and etched to a depth of 10 μm1 using a phosphoric acid etching solution.
After forming a groove with a length of 100 μm (FIG. 3(a)), a polyimide resin 33 is applied to a thickness of approximately 10 μm to form a resist 34 thereon (FIG. 3(a))). After etching the resin with a hydrazine etching solution, the resist is removed (FIG. 3(C)), and At34t is deposited to a thickness of approximately 2 μm. A
35t-
After the formation, At is patterned using reactive substrates and twigs (FIG. 4(d)).

さらにポリイミド系樹脂を塗布して導体配線部を平担化
(同図(e) ) した後、レジスト37により余分の
樹脂を除去する。同様にギャップ形成用絶縁1138、
上WilWB性コア用パーマc+(39t−形成すれば
良い。(同図(f)、(g))。
Further, after applying a polyimide resin to flatten the conductor wiring portion (FIG. 3(e)), excess resin is removed using a resist 37. Similarly, gap forming insulation 1138,
Perm c+ (39t-) for the upper WilWB core can be formed ((f) and (g) in the same figure).

別の実施例を第4図に示す。41はフェライト基板、4
2は5iotギャップ形成層、43はポリイミド系樹脂
、44.44’はAL配線コイル、45はパーマディ上
部磁性層である。本ヘッドの作製法は以下による。
Another embodiment is shown in FIG. 41 is a ferrite substrate, 4
2 is a 5-iot gap forming layer, 43 is a polyimide resin, 44.44' is an AL wiring coil, and 45 is a permadi upper magnetic layer. The method for manufacturing this head is as follows.

第3図(C)の状態の基板上に、第5図(a)に示すよ
うにMOマスク層511に形成した後、反応性スパッタ
エツチング法によシボリイξド系樹脂52を略5μmエ
ツチングし、次いでAt53t−略5μm蒸着する(同
図(b))e M O上のAtを電界エツチング法でM
Oごと除去した後、第3図(e)〜(g)と同様に順次
平担化用ボ刀イミド系樹脂層、ギャップ形成用5102
層、上部磁性コア用パーマロイ層を形成した。
After forming an MO mask layer 511 as shown in FIG. 5(a) on the substrate in the state shown in FIG. 3(C), a silicone resin 52 is etched approximately 5 μm by reactive sputter etching. Then, At53t-approximately 5 μm thick is deposited ((b) in the same figure).
After removing O together with O, as in FIGS. 3(e) to 3(g), a flat imide resin layer for flattening and a layer 5102 for gap formation are sequentially applied.
A permalloy layer for the upper magnetic core was formed.

第6図に、第1図に示した従来型ヘッドと、第2、第4
図に示した本発明により成るヘッドの特性を示す。61
,62.63はそれぞれ従来型ヘッド、第2.第4図に
示した本発明のヘッドの自己録再特性である。ただしい
ずれのヘッドも、巻線数、ギャップ長、トラック幅はそ
れぞれ8゜0.5μm、30μmであり、記録波長は1
.4μmである。従来型ヘッドに比べ、本発明によるヘ
ッドはその記録再生特性が優れていることが明らかであ
る。また、第4図に示したヘッドは、第2図に示したヘ
ッドに比べ、ギャップ近傍部にコイルを形成できるため
その特性がより優れている。
Figure 6 shows the conventional head shown in Figure 1 and the second and fourth heads.
1 shows the characteristics of the head according to the invention shown in the figure. 61
, 62 and 63 are respectively the conventional head and the second . This is the self-recording/reproducing characteristic of the head of the present invention shown in FIG. However, for both heads, the number of windings, gap length, and track width are 8°0.5 μm and 30 μm, respectively, and the recording wavelength is 1
.. It is 4 μm. It is clear that the head according to the invention has better recording and reproducing characteristics than the conventional head. Further, the head shown in FIG. 4 has better characteristics than the head shown in FIG. 2 because the coil can be formed near the gap.

以上、基板に強磁性体を用いた実施例を示したが、溝を
入れた非磁性基板を用い、パーマロイ、re−ht−s
i系合金、アモルファス磁性合金などの磁性薄膜を下部
磁性層として形成することで、前記実施例と同様に特性
の優れたヘッドを作製することもできる。しかしながら
、第3図(1)に示した工程などにより基板にSt−入
れると、溝の宍面には微細な凹凸が生じ、この上に直接
磁性膜を付着せしめるとその磁気特性が著しく劣化して
いるためにヘッド特性は極めて悪い事が確認され次。
The above examples have shown examples in which a ferromagnetic material is used for the substrate, but permalloy, re-ht-s
By forming a magnetic thin film of i-based alloy, amorphous magnetic alloy, or the like as the lower magnetic layer, a head with excellent characteristics can be manufactured as in the above embodiment. However, when St- is introduced into the substrate through the process shown in FIG. 3 (1), fine irregularities occur on the surface of the grooves, and if a magnetic film is directly attached thereon, the magnetic properties will deteriorate significantly. It has been confirmed that the head characteristics are extremely poor due to the following.

この欠点を改善した、本発明により成る実施例を第7図
に示す。本ヘッドは、磁性基板71上に形成された篩を
まず略5μm厚さのポリイミド系樹脂t−11布、成形
し、次いで下部磁性層として略2μm厚さのパーマロイ
薄膜をスパッタリング法で付着、成形せしめ、以後、第
3図もしくは第5図に示した方法と同様にして作製した
屯のである。
FIG. 7 shows an embodiment according to the present invention that improves this drawback. In this head, a sieve formed on a magnetic substrate 71 is first molded with polyimide resin T-11 cloth approximately 5 μm thick, and then a permalloy thin film approximately 2 μm thick is deposited and molded as the lower magnetic layer by sputtering. Hereafter, the tubes were manufactured in the same manner as shown in FIG. 3 or 5.

該ヘッドの記録再生特性は、第6図62.63に示した
ものと同様であった。
The recording and reproducing characteristics of the head were similar to those shown in FIG. 6, 62 and 63.

以上のヘッドにおいて、有機系樹脂はボリイ2ド系のも
のに限らず、Si系などでも良いことは明らかである。
In the above-mentioned head, it is clear that the organic resin is not limited to a bolide-based resin, but may also be a Si-based resin.

また、本実施例では一層巻線構造のヘッドを示したが、
多層の場合は従来ヘッドに比べてその性能の改善度はよ
シ顕著である。
Furthermore, although this example shows a head with a single-layer winding structure,
In the case of a multi-layer head, the degree of improvement in performance compared to conventional heads is quite remarkable.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来技術の一例による薄膜磁気ヘッドの構造を
示す断面図(後部配線、保映層等は省略しである、以下
−」様)、第2図は本発明の一実施例における薄膜磁気
ヘッドを示す断面図、第3図(a)〜(g)は第2図に
示される磁気ヘッドの製造工程を示す断面図、第4図は
本発明の他の実施例における簿膜磁気ヘッドを示す断面
図、第5図(a)、Φ)は第4図に示される磁気ヘッド
の製造工程を示す概略説明断面図、第6図は従来の薄膜
磁気ヘッド、本発明の実施例における薄膜磁気ヘッドの
記録再生特性を示す図、第7図はさらに別の実施例にお
ける薄膜磁気ヘッドを示す断面図である。 21・・・M n −7,nフェライト基板、22・・
・ポリイミド系樹脂、23.23’・・・巻線導体、2
4・・・非磁性ギャップ形成層、25・・・パーマロイ
磁性層、61・・・従来の薄膜磁気ヘッドの場合、62
.63・・・本発明の実施例における薄膜磁気ヘッドの
場合、72・・・ポリイミド系樹脂、73・・・下部磁
性層。 代理人 弁理士 薄田利幸 41 目 Y z 図 (L
FIG. 1 is a sectional view showing the structure of a thin film magnetic head according to an example of the prior art (rear wiring, image retention layer, etc. are omitted, hereinafter referred to as "-"), and FIG. 2 is a thin film magnetic head according to an embodiment of the present invention. 3(a) to 3(g) are sectional views showing the manufacturing process of the magnetic head shown in FIG. 2, and FIG. 4 is a cross-sectional view showing a magnetic head according to another embodiment of the present invention. 5(a) and Φ) are schematic cross-sectional views showing the manufacturing process of the magnetic head shown in FIG. 4, and FIG. FIG. 7 is a cross-sectional view showing a thin film magnetic head in yet another embodiment. 21...M n -7, n ferrite substrate, 22...
・Polyimide resin, 23.23'...Wound conductor, 2
4...Nonmagnetic gap forming layer, 25...Permalloy magnetic layer, 61...For conventional thin film magnetic head, 62
.. 63... In the case of the thin film magnetic head in the embodiment of the present invention, 72... Polyimide resin, 73... Lower magnetic layer. Agent Patent Attorney Toshiyuki Usuda 41 Yz Diagram (L

Claims (1)

【特許請求の範囲】 1、下部磁性体上に絶縁層を介して薄膜からなる上部磁
性体が設けられ、該絶縁層内には巻線導体層を具備し、
且つ該下部磁性体と該上部磁性体とが磁気記録媒体対向
面と反対側の部分において磁気的に導通している磁気ヘ
ッドにおいて、該絶縁層が有機系樹脂からなり、且つ該
絶縁層の少なくとも下部は基板に設けられ九溝に充填さ
れてなること′kIIIl黴とする薄膜磁気ヘッド。 2、上記有機系樹脂がポリイきド系樹脂であることを特
徴とする特許請求の範囲第1項記載の薄膜磁気ヘッド。 3、上記基板が強磁性体材料からなることを特徴とする
特許請求の範囲第1項もしくは第2項記載の薄膜磁気ヘ
ッド。 4、上記基板が有機系樹脂を耐着せしめた溝を有する非
磁性基板であることt−特徴とする特許請求の範囲第1
項もしくは第2項記載の薄膜磁気ヘッド。
[Claims] 1. An upper magnetic body made of a thin film is provided on the lower magnetic body via an insulating layer, and a winding conductor layer is provided within the insulating layer,
In the magnetic head in which the lower magnetic body and the upper magnetic body are magnetically conductive at a portion opposite to the surface facing the magnetic recording medium, the insulating layer is made of an organic resin, and at least The lower part is a thin film magnetic head formed by filling nine grooves on the substrate. 2. The thin film magnetic head according to claim 1, wherein the organic resin is a polyide resin. 3. A thin film magnetic head according to claim 1 or 2, wherein the substrate is made of a ferromagnetic material. 4. Claim 1, characterized in that the substrate is a non-magnetic substrate having grooves to which an organic resin is adhered.
The thin film magnetic head according to item 1 or 2.
JP20373481A 1981-12-18 1981-12-18 Thin-film magnetic head Pending JPS58108017A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20373481A JPS58108017A (en) 1981-12-18 1981-12-18 Thin-film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20373481A JPS58108017A (en) 1981-12-18 1981-12-18 Thin-film magnetic head

Publications (1)

Publication Number Publication Date
JPS58108017A true JPS58108017A (en) 1983-06-28

Family

ID=16478968

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20373481A Pending JPS58108017A (en) 1981-12-18 1981-12-18 Thin-film magnetic head

Country Status (1)

Country Link
JP (1) JPS58108017A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6194211A (en) * 1984-10-16 1986-05-13 Sanyo Electric Co Ltd Thin film magnetic head
JPS61220113A (en) * 1985-03-26 1986-09-30 Victor Co Of Japan Ltd Thin film magnetic head and its production
JPS61284814A (en) * 1985-06-11 1986-12-15 Canon Inc Thin film magnetic head
JPS61292216A (en) * 1985-06-20 1986-12-23 Matsushita Electric Ind Co Ltd Thin film magnetic head and its manufacture
JPS6278711A (en) * 1985-10-01 1987-04-11 Sony Corp Thin film magnetic head
JPS6376105A (en) * 1986-09-19 1988-04-06 Hitachi Ltd Thin film magnetic head

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6194211A (en) * 1984-10-16 1986-05-13 Sanyo Electric Co Ltd Thin film magnetic head
JPH0618055B2 (en) * 1984-10-16 1994-03-09 三洋電機株式会社 Thin film magnetic head
JPS61220113A (en) * 1985-03-26 1986-09-30 Victor Co Of Japan Ltd Thin film magnetic head and its production
JPS61284814A (en) * 1985-06-11 1986-12-15 Canon Inc Thin film magnetic head
JPS61292216A (en) * 1985-06-20 1986-12-23 Matsushita Electric Ind Co Ltd Thin film magnetic head and its manufacture
JPS6278711A (en) * 1985-10-01 1987-04-11 Sony Corp Thin film magnetic head
JPS6376105A (en) * 1986-09-19 1988-04-06 Hitachi Ltd Thin film magnetic head

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