JPS6129494B2 - - Google Patents
Info
- Publication number
- JPS6129494B2 JPS6129494B2 JP53073883A JP7388378A JPS6129494B2 JP S6129494 B2 JPS6129494 B2 JP S6129494B2 JP 53073883 A JP53073883 A JP 53073883A JP 7388378 A JP7388378 A JP 7388378A JP S6129494 B2 JPS6129494 B2 JP S6129494B2
- Authority
- JP
- Japan
- Prior art keywords
- developer
- temperature
- radiation
- substrate
- developing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 29
- 230000005855 radiation Effects 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 15
- 238000010438 heat treatment Methods 0.000 description 10
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Natural products CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 5
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 5
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 4
- 230000005865 ionizing radiation Effects 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000001125 extrusion Methods 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- IIEWJVIFRVWJOD-UHFFFAOYSA-N ethyl cyclohexane Natural products CCC1CCCCC1 IIEWJVIFRVWJOD-UHFFFAOYSA-N 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- -1 trichlene Chemical compound 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7388378A JPS552213A (en) | 1978-06-19 | 1978-06-19 | Developing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7388378A JPS552213A (en) | 1978-06-19 | 1978-06-19 | Developing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS552213A JPS552213A (en) | 1980-01-09 |
| JPS6129494B2 true JPS6129494B2 (da) | 1986-07-07 |
Family
ID=13531043
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7388378A Granted JPS552213A (en) | 1978-06-19 | 1978-06-19 | Developing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS552213A (da) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4429983A (en) * | 1982-03-22 | 1984-02-07 | International Business Machines Corporation | Developing apparatus for exposed photoresist coated wafers |
| JPS5972136A (ja) * | 1982-10-19 | 1984-04-24 | Toshiba Corp | レジスト・パタ−ン形成方法 |
| JPS59144220U (ja) * | 1983-03-18 | 1984-09-27 | トキコ株式会社 | 圧縮機の連接棒 |
| JPS60117733A (ja) * | 1983-11-30 | 1985-06-25 | Canon Hanbai Kk | ウエハ現像装置 |
| US4827867A (en) * | 1985-11-28 | 1989-05-09 | Daikin Industries, Ltd. | Resist developing apparatus |
| JPS62276827A (ja) * | 1985-11-28 | 1987-12-01 | Daikin Ind Ltd | レジスト現像装置 |
| JPS63170935U (da) * | 1987-04-27 | 1988-11-07 | ||
| JPH0210824A (ja) * | 1988-06-29 | 1990-01-16 | Matsushita Electric Ind Co Ltd | 電子線レジスト現像方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50108005A (da) * | 1974-01-31 | 1975-08-26 | ||
| JPS5159504A (en) * | 1974-11-21 | 1976-05-24 | Fuji Photo Film Co Ltd | Kankoseiheiban insatsubanno genzohoho |
| JPS5180228A (ja) * | 1975-01-10 | 1976-07-13 | Fuji Photo Film Co Ltd | Genzoekisoseibutsu |
-
1978
- 1978-06-19 JP JP7388378A patent/JPS552213A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50108005A (da) * | 1974-01-31 | 1975-08-26 | ||
| JPS5159504A (en) * | 1974-11-21 | 1976-05-24 | Fuji Photo Film Co Ltd | Kankoseiheiban insatsubanno genzohoho |
| JPS5180228A (ja) * | 1975-01-10 | 1976-07-13 | Fuji Photo Film Co Ltd | Genzoekisoseibutsu |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS552213A (en) | 1980-01-09 |
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