JPS61289623A - 気相反応装置 - Google Patents

気相反応装置

Info

Publication number
JPS61289623A
JPS61289623A JP60132216A JP13221685A JPS61289623A JP S61289623 A JPS61289623 A JP S61289623A JP 60132216 A JP60132216 A JP 60132216A JP 13221685 A JP13221685 A JP 13221685A JP S61289623 A JPS61289623 A JP S61289623A
Authority
JP
Japan
Prior art keywords
semiconductor substrate
reaction chamber
support plate
gas
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60132216A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0544825B2 (enrdf_load_stackoverflow
Inventor
Naoki Suzuki
直樹 鈴木
Junichi Nozaki
野崎　順一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP60132216A priority Critical patent/JPS61289623A/ja
Publication of JPS61289623A publication Critical patent/JPS61289623A/ja
Publication of JPH0544825B2 publication Critical patent/JPH0544825B2/ja
Granted legal-status Critical Current

Links

JP60132216A 1985-06-18 1985-06-18 気相反応装置 Granted JPS61289623A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60132216A JPS61289623A (ja) 1985-06-18 1985-06-18 気相反応装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60132216A JPS61289623A (ja) 1985-06-18 1985-06-18 気相反応装置

Publications (2)

Publication Number Publication Date
JPS61289623A true JPS61289623A (ja) 1986-12-19
JPH0544825B2 JPH0544825B2 (enrdf_load_stackoverflow) 1993-07-07

Family

ID=15076101

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60132216A Granted JPS61289623A (ja) 1985-06-18 1985-06-18 気相反応装置

Country Status (1)

Country Link
JP (1) JPS61289623A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63179525A (ja) * 1987-01-21 1988-07-23 Tokyo Electron Ltd アッシング装置
US5711811A (en) * 1994-11-28 1998-01-27 Mikrokemia Oy Method and equipment for growing thin films
US5855680A (en) * 1994-11-28 1999-01-05 Neste Oy Apparatus for growing thin films
US5997651A (en) * 1995-10-18 1999-12-07 Tokyo Electron Limited Heat treatment apparatus
US6015590A (en) * 1994-11-28 2000-01-18 Neste Oy Method for growing thin films

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60113420A (ja) * 1983-11-22 1985-06-19 Mitsubishi Electric Corp 半導体結晶の製造装置
JPS60178621A (ja) * 1984-02-24 1985-09-12 Toshiba Corp 薄膜形成装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60113420A (ja) * 1983-11-22 1985-06-19 Mitsubishi Electric Corp 半導体結晶の製造装置
JPS60178621A (ja) * 1984-02-24 1985-09-12 Toshiba Corp 薄膜形成装置

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63179525A (ja) * 1987-01-21 1988-07-23 Tokyo Electron Ltd アッシング装置
US5711811A (en) * 1994-11-28 1998-01-27 Mikrokemia Oy Method and equipment for growing thin films
US5855680A (en) * 1994-11-28 1999-01-05 Neste Oy Apparatus for growing thin films
US6015590A (en) * 1994-11-28 2000-01-18 Neste Oy Method for growing thin films
US6572705B1 (en) 1994-11-28 2003-06-03 Asm America, Inc. Method and apparatus for growing thin films
US7404984B2 (en) 1994-11-28 2008-07-29 Asm America, Inc. Method for growing thin films
US7498059B2 (en) 1994-11-28 2009-03-03 Asm America, Inc. Method for growing thin films
US8507039B2 (en) 1994-11-28 2013-08-13 Asm America, Inc. Method for growing thin films
US5997651A (en) * 1995-10-18 1999-12-07 Tokyo Electron Limited Heat treatment apparatus

Also Published As

Publication number Publication date
JPH0544825B2 (enrdf_load_stackoverflow) 1993-07-07

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