JPS61284992A - 露光ビ−ム制御方法 - Google Patents

露光ビ−ム制御方法

Info

Publication number
JPS61284992A
JPS61284992A JP60127358A JP12735885A JPS61284992A JP S61284992 A JPS61284992 A JP S61284992A JP 60127358 A JP60127358 A JP 60127358A JP 12735885 A JP12735885 A JP 12735885A JP S61284992 A JPS61284992 A JP S61284992A
Authority
JP
Japan
Prior art keywords
pattern
exposure
exposure beam
printing
control method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60127358A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0254937B2 (OSRAM
Inventor
耕次 八尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP60127358A priority Critical patent/JPS61284992A/ja
Priority to US06/861,721 priority patent/US4887225A/en
Publication of JPS61284992A publication Critical patent/JPS61284992A/ja
Publication of JPH0254937B2 publication Critical patent/JPH0254937B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Fax Reproducing Arrangements (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60127358A 1985-05-24 1985-06-11 露光ビ−ム制御方法 Granted JPS61284992A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60127358A JPS61284992A (ja) 1985-06-11 1985-06-11 露光ビ−ム制御方法
US06/861,721 US4887225A (en) 1985-05-24 1986-05-12 Method and device for controlling exposure beams

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60127358A JPS61284992A (ja) 1985-06-11 1985-06-11 露光ビ−ム制御方法

Publications (2)

Publication Number Publication Date
JPS61284992A true JPS61284992A (ja) 1986-12-15
JPH0254937B2 JPH0254937B2 (OSRAM) 1990-11-26

Family

ID=14957970

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60127358A Granted JPS61284992A (ja) 1985-05-24 1985-06-11 露光ビ−ム制御方法

Country Status (1)

Country Link
JP (1) JPS61284992A (OSRAM)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63164317A (ja) * 1986-12-26 1988-07-07 Matsushita Electric Ind Co Ltd 電子線描画装置
JP2008074096A (ja) * 2006-08-22 2008-04-03 Ricoh Printing Systems Ltd 光走査装置
US8320028B2 (en) 2006-08-22 2012-11-27 Ricoh Company, Ltd. Optical scanning apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63164317A (ja) * 1986-12-26 1988-07-07 Matsushita Electric Ind Co Ltd 電子線描画装置
JP2008074096A (ja) * 2006-08-22 2008-04-03 Ricoh Printing Systems Ltd 光走査装置
US8320028B2 (en) 2006-08-22 2012-11-27 Ricoh Company, Ltd. Optical scanning apparatus

Also Published As

Publication number Publication date
JPH0254937B2 (OSRAM) 1990-11-26

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