JPS61279678A - 流量制御装置 - Google Patents

流量制御装置

Info

Publication number
JPS61279678A
JPS61279678A JP60121726A JP12172685A JPS61279678A JP S61279678 A JPS61279678 A JP S61279678A JP 60121726 A JP60121726 A JP 60121726A JP 12172685 A JP12172685 A JP 12172685A JP S61279678 A JPS61279678 A JP S61279678A
Authority
JP
Japan
Prior art keywords
gas
raw material
flow rate
flow path
carrier gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60121726A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0535225B2 (enExample
Inventor
Sukeyuki Ito
祐之 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON TAIRAN KK
Original Assignee
NIPPON TAIRAN KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON TAIRAN KK filed Critical NIPPON TAIRAN KK
Priority to JP60121726A priority Critical patent/JPS61279678A/ja
Publication of JPS61279678A publication Critical patent/JPS61279678A/ja
Publication of JPH0535225B2 publication Critical patent/JPH0535225B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D11/00—Control of flow ratio
    • G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
    • G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
    • G05D11/131—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components
    • G05D11/132—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring the values related to the quantity of the individual components by controlling the flow of the individual components

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Chemical Vapour Deposition (AREA)
  • Flow Control (AREA)
JP60121726A 1985-06-05 1985-06-05 流量制御装置 Granted JPS61279678A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60121726A JPS61279678A (ja) 1985-06-05 1985-06-05 流量制御装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60121726A JPS61279678A (ja) 1985-06-05 1985-06-05 流量制御装置

Publications (2)

Publication Number Publication Date
JPS61279678A true JPS61279678A (ja) 1986-12-10
JPH0535225B2 JPH0535225B2 (enExample) 1993-05-26

Family

ID=14818356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60121726A Granted JPS61279678A (ja) 1985-06-05 1985-06-05 流量制御装置

Country Status (1)

Country Link
JP (1) JPS61279678A (enExample)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100048894A (ko) * 2008-10-31 2010-05-11 가부시키가이샤 호리바 세이샤쿠쇼 재료가스 농도 제어 시스템
JP2010109305A (ja) * 2008-10-31 2010-05-13 Horiba Ltd 材料ガス濃度制御システム
JP2010109302A (ja) * 2008-10-31 2010-05-13 Horiba Ltd 材料ガス濃度制御システム
JP2010109304A (ja) * 2008-10-31 2010-05-13 Horiba Ltd 材料ガス濃度制御システム
WO2010106410A1 (en) * 2009-03-16 2010-09-23 Applied Materials, Inc. Evaporator, coating installation, and method for use thereof
KR20100108304A (ko) * 2009-03-27 2010-10-06 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨. 방법 및 장치
JP2013249511A (ja) * 2012-05-31 2013-12-12 Tokyo Electron Ltd 原料ガス供給装置、成膜装置、原料ガスの供給方法及び記憶媒体
JP2014108395A (ja) * 2012-12-03 2014-06-12 Air Liquide Japan Ltd 固体材料の気化量モニタリングシステムおよびモニタリング方法
JP2016040402A (ja) * 2014-08-12 2016-03-24 東京エレクトロン株式会社 原料ガス供給装置
JP2019153805A (ja) * 2012-07-18 2019-09-12 ケレス テクノロジーズ インコーポレイテッド 蒸気送達装置、その製造方法およびその使用方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11970772B2 (en) 2014-08-22 2024-04-30 Lam Research Corporation Dynamic precursor dosing for atomic layer deposition
KR20250162583A (ko) * 2023-03-02 2025-11-18 램 리써치 코포레이션 증기-위-유동 전구체 전달

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100048894A (ko) * 2008-10-31 2010-05-11 가부시키가이샤 호리바 세이샤쿠쇼 재료가스 농도 제어 시스템
JP2010109305A (ja) * 2008-10-31 2010-05-13 Horiba Ltd 材料ガス濃度制御システム
JP2010109302A (ja) * 2008-10-31 2010-05-13 Horiba Ltd 材料ガス濃度制御システム
JP2010109304A (ja) * 2008-10-31 2010-05-13 Horiba Ltd 材料ガス濃度制御システム
US8459290B2 (en) 2008-10-31 2013-06-11 Horiba, Ltd. Material gas concentration control system
WO2010106410A1 (en) * 2009-03-16 2010-09-23 Applied Materials, Inc. Evaporator, coating installation, and method for use thereof
KR20100108304A (ko) * 2009-03-27 2010-10-06 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨. 방법 및 장치
JP2011006779A (ja) * 2009-03-27 2011-01-13 Rohm & Haas Electronic Materials Llc 基体上に膜を堆積する方法および気化前駆体化合物を送達する装置
JP2013249511A (ja) * 2012-05-31 2013-12-12 Tokyo Electron Ltd 原料ガス供給装置、成膜装置、原料ガスの供給方法及び記憶媒体
JP2019153805A (ja) * 2012-07-18 2019-09-12 ケレス テクノロジーズ インコーポレイテッド 蒸気送達装置、その製造方法およびその使用方法
JP2014108395A (ja) * 2012-12-03 2014-06-12 Air Liquide Japan Ltd 固体材料の気化量モニタリングシステムおよびモニタリング方法
JP2016040402A (ja) * 2014-08-12 2016-03-24 東京エレクトロン株式会社 原料ガス供給装置

Also Published As

Publication number Publication date
JPH0535225B2 (enExample) 1993-05-26

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