JPS61276968A - イオンビームスパッタ装置の陽極高電圧端子への二次電子飛び込み防止装置 - Google Patents

イオンビームスパッタ装置の陽極高電圧端子への二次電子飛び込み防止装置

Info

Publication number
JPS61276968A
JPS61276968A JP11917185A JP11917185A JPS61276968A JP S61276968 A JPS61276968 A JP S61276968A JP 11917185 A JP11917185 A JP 11917185A JP 11917185 A JP11917185 A JP 11917185A JP S61276968 A JPS61276968 A JP S61276968A
Authority
JP
Japan
Prior art keywords
flying
secondary electron
voltage anodic
ion beam
anodic terminal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11917185A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0576543B2 (enExample
Inventor
Toshio Nemoto
根本　利夫
Kintaro Mori
森　金太郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koki Holdings Co Ltd
Original Assignee
Hitachi Koki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Koki Co Ltd filed Critical Hitachi Koki Co Ltd
Priority to JP11917185A priority Critical patent/JPS61276968A/ja
Publication of JPS61276968A publication Critical patent/JPS61276968A/ja
Publication of JPH0576543B2 publication Critical patent/JPH0576543B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP11917185A 1985-05-31 1985-05-31 イオンビームスパッタ装置の陽極高電圧端子への二次電子飛び込み防止装置 Granted JPS61276968A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11917185A JPS61276968A (ja) 1985-05-31 1985-05-31 イオンビームスパッタ装置の陽極高電圧端子への二次電子飛び込み防止装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11917185A JPS61276968A (ja) 1985-05-31 1985-05-31 イオンビームスパッタ装置の陽極高電圧端子への二次電子飛び込み防止装置

Publications (2)

Publication Number Publication Date
JPS61276968A true JPS61276968A (ja) 1986-12-06
JPH0576543B2 JPH0576543B2 (enExample) 1993-10-22

Family

ID=14754667

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11917185A Granted JPS61276968A (ja) 1985-05-31 1985-05-31 イオンビームスパッタ装置の陽極高電圧端子への二次電子飛び込み防止装置

Country Status (1)

Country Link
JP (1) JPS61276968A (enExample)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5675572A (en) * 1979-11-22 1981-06-22 Fujitsu Ltd Sputtering device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5675572A (en) * 1979-11-22 1981-06-22 Fujitsu Ltd Sputtering device

Also Published As

Publication number Publication date
JPH0576543B2 (enExample) 1993-10-22

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