JPS61275193A - 気相成長装置用サセプタ - Google Patents
気相成長装置用サセプタInfo
- Publication number
- JPS61275193A JPS61275193A JP11614885A JP11614885A JPS61275193A JP S61275193 A JPS61275193 A JP S61275193A JP 11614885 A JP11614885 A JP 11614885A JP 11614885 A JP11614885 A JP 11614885A JP S61275193 A JPS61275193 A JP S61275193A
- Authority
- JP
- Japan
- Prior art keywords
- susceptor
- sheet
- phase growth
- carbon plate
- carbon sheet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001947 vapour-phase growth Methods 0.000 title claims abstract description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 47
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 47
- 239000010453 quartz Substances 0.000 claims abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000004020 conductor Substances 0.000 claims description 3
- 230000002950 deficient Effects 0.000 claims description 3
- 239000012071 phase Substances 0.000 claims 1
- 238000009826 distribution Methods 0.000 abstract description 9
- 230000007547 defect Effects 0.000 abstract description 2
- 239000012808 vapor phase Substances 0.000 abstract description 2
- 230000006698 induction Effects 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000002470 thermal conductor Substances 0.000 description 2
- 241000234435 Lilium Species 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11614885A JPS61275193A (ja) | 1985-05-29 | 1985-05-29 | 気相成長装置用サセプタ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11614885A JPS61275193A (ja) | 1985-05-29 | 1985-05-29 | 気相成長装置用サセプタ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61275193A true JPS61275193A (ja) | 1986-12-05 |
| JPH0456799B2 JPH0456799B2 (enrdf_load_stackoverflow) | 1992-09-09 |
Family
ID=14679938
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11614885A Granted JPS61275193A (ja) | 1985-05-29 | 1985-05-29 | 気相成長装置用サセプタ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61275193A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01120814A (ja) * | 1987-11-04 | 1989-05-12 | Tokyo Electron Ltd | 半導体ウエハ用載置台 |
-
1985
- 1985-05-29 JP JP11614885A patent/JPS61275193A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01120814A (ja) * | 1987-11-04 | 1989-05-12 | Tokyo Electron Ltd | 半導体ウエハ用載置台 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0456799B2 (enrdf_load_stackoverflow) | 1992-09-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |