JPS6127348B2 - - Google Patents

Info

Publication number
JPS6127348B2
JPS6127348B2 JP56208639A JP20863981A JPS6127348B2 JP S6127348 B2 JPS6127348 B2 JP S6127348B2 JP 56208639 A JP56208639 A JP 56208639A JP 20863981 A JP20863981 A JP 20863981A JP S6127348 B2 JPS6127348 B2 JP S6127348B2
Authority
JP
Japan
Prior art keywords
hydroxyapatite
target
fluorine
present
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56208639A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58110465A (ja
Inventor
Masaomi Ebihara
Masahide Inoe
Tetsuro Ogawa
Sachiko Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pentax Corp
Shingijutsu Kaihatsu Jigyodan
Original Assignee
Shingijutsu Kaihatsu Jigyodan
Asahi Kogaku Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shingijutsu Kaihatsu Jigyodan, Asahi Kogaku Kogyo Co Ltd filed Critical Shingijutsu Kaihatsu Jigyodan
Priority to JP56208639A priority Critical patent/JPS58110465A/ja
Publication of JPS58110465A publication Critical patent/JPS58110465A/ja
Publication of JPS6127348B2 publication Critical patent/JPS6127348B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Compositions Of Oxide Ceramics (AREA)
  • Physical Vapour Deposition (AREA)
JP56208639A 1981-12-23 1981-12-23 ハイドロキシ・アパタイトのスパッタリング用タ−ゲット部材 Granted JPS58110465A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56208639A JPS58110465A (ja) 1981-12-23 1981-12-23 ハイドロキシ・アパタイトのスパッタリング用タ−ゲット部材

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56208639A JPS58110465A (ja) 1981-12-23 1981-12-23 ハイドロキシ・アパタイトのスパッタリング用タ−ゲット部材

Publications (2)

Publication Number Publication Date
JPS58110465A JPS58110465A (ja) 1983-07-01
JPS6127348B2 true JPS6127348B2 (enrdf_load_stackoverflow) 1986-06-25

Family

ID=16559564

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56208639A Granted JPS58110465A (ja) 1981-12-23 1981-12-23 ハイドロキシ・アパタイトのスパッタリング用タ−ゲット部材

Country Status (1)

Country Link
JP (1) JPS58110465A (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0339468A (ja) * 1989-07-06 1991-02-20 Mitsui Eng & Shipbuild Co Ltd ハイドロキシアパタイト質ターゲット
CN1048291C (zh) * 1997-12-12 2000-01-12 清华大学 医用植入物的离子束增强沉积羟基磷灰石镀层的制备方法
JP5458230B2 (ja) 2007-08-30 2014-04-02 ＨＯＹＡ Ｔｅｃｈｎｏｓｕｒｇｉｃａｌ株式会社 フッ素アパタイトの製造方法、フッ素アパタイトおよび吸着装置
CN102206802B (zh) * 2010-03-29 2012-12-19 苏州晶纯新材料有限公司 全固态薄膜锂离子电池相关靶材及其制造方法
CN102181840B (zh) * 2011-06-22 2012-08-08 苏州晶纯新材料有限公司 一种钴酸锂靶材及其制备方法
CN102285790B (zh) * 2011-06-22 2012-08-08 苏州晶纯新材料有限公司 一种磷酸铁锂靶材及其制备方法
CN102249661B (zh) * 2011-06-22 2012-08-08 苏州晶纯新材料有限公司 一种磷酸锂靶材及其制备方法
CN114956790B (zh) * 2022-07-28 2022-11-04 广州市尤特新材料有限公司 一种近红外高透光的tco靶材及其制备方法

Also Published As

Publication number Publication date
JPS58110465A (ja) 1983-07-01

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