JPS6126656B2 - - Google Patents

Info

Publication number
JPS6126656B2
JPS6126656B2 JP54126970A JP12697079A JPS6126656B2 JP S6126656 B2 JPS6126656 B2 JP S6126656B2 JP 54126970 A JP54126970 A JP 54126970A JP 12697079 A JP12697079 A JP 12697079A JP S6126656 B2 JPS6126656 B2 JP S6126656B2
Authority
JP
Japan
Prior art keywords
photosensitive
silver
silver halide
group
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54126970A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5650330A (en
Inventor
Keisuke Shiba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP12697079A priority Critical patent/JPS5650330A/ja
Priority to GB8031486A priority patent/GB2062269B/en
Priority to DE19803037310 priority patent/DE3037310A1/de
Priority to US06/193,319 priority patent/US4358530A/en
Publication of JPS5650330A publication Critical patent/JPS5650330A/ja
Publication of JPS6126656B2 publication Critical patent/JPS6126656B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C243/00—Compounds containing chains of nitrogen atoms singly-bound to each other, e.g. hydrazines, triazanes
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C243/00—Compounds containing chains of nitrogen atoms singly-bound to each other, e.g. hydrazines, triazanes
    • C07C243/24—Hydrazines having nitrogen atoms of hydrazine groups acylated by carboxylic acids
    • C07C243/38—Hydrazines having nitrogen atoms of hydrazine groups acylated by carboxylic acids with acylating carboxyl groups bound to carbon atoms of six-membered aromatic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
    • G03C1/043—Polyalkylene oxides; Polyalkylene sulfides; Polyalkylene selenides; Polyalkylene tellurides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/08—Sensitivity-increasing substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0952—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer comprising silver halide or silver salt based image forming systems, e.g. for camera speed exposure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/15—Lithographic emulsion

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP12697079A 1979-10-02 1979-10-02 Photosensitive lithographic plate and its plate making method Granted JPS5650330A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP12697079A JPS5650330A (en) 1979-10-02 1979-10-02 Photosensitive lithographic plate and its plate making method
GB8031486A GB2062269B (en) 1979-10-02 1980-09-30 Photosensitive lithographic printing plate precursor and a method for preparing a printing plate therefrom
DE19803037310 DE3037310A1 (de) 1979-10-02 1980-10-02 Lichtempfindlicher lithographischer druckplattenvorlaeufer und verfahren zur herstellung einer druckplatte hinaus
US06/193,319 US4358530A (en) 1979-10-02 1980-10-02 Photosensitive lithographic printing plate precursor and a method for preparing a printing plate therefrom

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12697079A JPS5650330A (en) 1979-10-02 1979-10-02 Photosensitive lithographic plate and its plate making method

Publications (2)

Publication Number Publication Date
JPS5650330A JPS5650330A (en) 1981-05-07
JPS6126656B2 true JPS6126656B2 (en, 2012) 1986-06-21

Family

ID=14948394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12697079A Granted JPS5650330A (en) 1979-10-02 1979-10-02 Photosensitive lithographic plate and its plate making method

Country Status (4)

Country Link
US (1) US4358530A (en, 2012)
JP (1) JPS5650330A (en, 2012)
DE (1) DE3037310A1 (en, 2012)
GB (1) GB2062269B (en, 2012)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5748733A (en) * 1980-09-08 1982-03-20 Fuji Photo Film Co Ltd Photosensitive lithographic plate
US5015553A (en) * 1985-06-10 1991-05-14 The Foxboro Company Method of patterning resist
US5254435A (en) * 1985-06-10 1993-10-19 The Foxboro Company Method of patterning resist
WO1988005559A1 (en) * 1987-01-22 1988-07-28 The Foxboro Company Method of patterning resist
JPH0764132B2 (ja) * 1988-06-09 1995-07-12 株式会社日研化学研究所 老化回復処理液
US4882261A (en) * 1988-06-27 1989-11-21 Polychrome Corp. High contrast dot enhancing compositions and photographic products and methods for their use
US4975354A (en) * 1988-10-11 1990-12-04 Eastman Kodak Company Photographic element comprising an ethyleneoxy-substituted amino compound and process adapted to provide high constrast development
US5260168A (en) * 1989-10-13 1993-11-09 The Foxboro Company Application specific tape automated bonding
DE69603344T2 (de) 1995-11-14 2000-01-13 Eastman Kodak Co., Rochester Photopgraphische Hochkontrastmaterialien geschützt gegen Aufhelleffekte

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1227603A (en, 2012) * 1968-02-29 1971-04-07
US4188215A (en) * 1975-11-17 1980-02-12 Fuji Photo Film Co., Ltd. Photosensitive printing plate, method of preparing same, and method of processing same
JPS589410B2 (ja) * 1976-06-07 1983-02-21 富士写真フイルム株式会社 ハロゲン化銀写真感光材料の処理方法
GB1560005A (en) * 1976-08-11 1980-01-30 Fuji Photo Film Co Ltd Silver halide photographic emulsions
JPS5427804A (en) * 1977-07-29 1979-03-02 Riso Kagaku Corp Method and material for photoengraving
JPS589412B2 (ja) * 1977-08-30 1983-02-21 富士写真フイルム株式会社 ハロゲン化銀写真感光材料の現像方法
JPS5532086A (en) 1978-08-30 1980-03-06 Fuji Photo Film Co Ltd Photosensitive printing plate

Also Published As

Publication number Publication date
DE3037310A1 (de) 1981-04-23
JPS5650330A (en) 1981-05-07
GB2062269A (en) 1981-05-20
US4358530A (en) 1982-11-09
GB2062269B (en) 1983-11-23

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