JPS61264769A - Superconducting device - Google Patents

Superconducting device

Info

Publication number
JPS61264769A
JPS61264769A JP60105944A JP10594485A JPS61264769A JP S61264769 A JPS61264769 A JP S61264769A JP 60105944 A JP60105944 A JP 60105944A JP 10594485 A JP10594485 A JP 10594485A JP S61264769 A JPS61264769 A JP S61264769A
Authority
JP
Japan
Prior art keywords
base layer
collector
quasi
superconductor
density
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60105944A
Other languages
Japanese (ja)
Other versions
JPH071805B2 (en
Inventor
Yasutaka Tamura
泰孝 田村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP60105944A priority Critical patent/JPH071805B2/en
Publication of JPS61264769A publication Critical patent/JPS61264769A/en
Publication of JPH071805B2 publication Critical patent/JPH071805B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/10Junction-based devices

Landscapes

  • Superconductor Devices And Manufacturing Methods Thereof (AREA)

Abstract

PURPOSE:To obtain a quasi-particle collector having lower leak current and in which a high transmittance and a high impedance can be realized simultaneously, by forming a base layer of a superconductor having a density of electrons lower than those of metals. CONSTITUTION:A superconducting device comprises a base layer 2 which is totally or partially formed of a superconductor having a density of electrons lower than those of ordinary metals (e.g. BaPb1-xBixO3), a means for implanting quasi-particles into the base layer 2 (e.g. an emitter layer 3 of Nb), and a collector for taking out quasi-particles from the base layer 2 (e.g. a semiconductor substrate 1 of InSb). The device having such construction can operate similarly as a bipolar transistor. Further, since the base layer 2 has a lower electron density than those of the metals, the leak current in the semiconductor substrate 1 serving as a collector is decreased and a high electron transmittance can be realized simultaneously with a high impedance.

Description

【発明の詳細な説明】 〔概要〕 本発明は、電流などの準粒子をキャリヤとして用い且つ
信号増幅作用などトランジスタと同様な動作をする超伝
導装置に於いて、ベース層の全体或いは少なくともその
一部を通常の金属に於けるよりも低電子密度である超伝
導体で形成し、また、そのベース層に対しては準粒子を
注入する手段を形成し、更にまた、そのベース層から準
粒子を取り出すコレクタ接合を形成した構成とすること
に依り、リーク電流が少なく、高い電子透過率と高い出
力インピーダンスとを両立させた準粒子コレクタを実現
できるようにしたものである。
[Detailed Description of the Invention] [Summary] The present invention provides a superconducting device that uses quasi-particles such as current as carriers and operates in the same way as a transistor, such as signal amplification. The part is formed of a superconductor having a lower electron density than that of ordinary metals, and the base layer is formed with a means for injecting quasiparticles, and furthermore, the quasiparticles are injected from the base layer. By forming a collector junction that extracts , it is possible to realize a quasi-particle collector that has low leakage current, high electron transmittance, and high output impedance.

〔産業上の利用分野〕            □本発
明は準粒子をキャリヤとし且つトランジスタと同様な信
号増幅作用を有する超伝導装置に関する。
[Industrial Application Field] □The present invention relates to a superconducting device that uses quasiparticles as carriers and has a signal amplification effect similar to that of a transistor.

〔従来の技術〕[Conventional technology]

従来、超伝導体に対してエミッタから準粒子を注入し、
超伝導体及び半導体の接合で構成されたコレクタから準
粒子を取り出すようにしたバイポーラ・トランジスタと
同様な動作をする超伝導装置が提案されている(要すれ
ば、特願昭58−224311号参照)。
Conventionally, quasiparticles were injected into a superconductor from an emitter,
A superconducting device has been proposed that operates similarly to a bipolar transistor in which quasiparticles are taken out from a collector composed of a junction of a superconductor and a semiconductor (see Japanese Patent Application No. 58-224311) ).

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

前記従来技術に依る超伝導装置では、ベースに通常の金
属超伝導体、例えばNbやpbを使用した場合、次のよ
うな問題を生ずる。
In the superconducting device according to the prior art described above, when a normal metal superconductor such as Nb or PB is used for the base, the following problems occur.

(1)  ベースM域には注入に依って生じた準粒子の
他に熱励起に依って生じた準粒子が存在し、従って、注
入の有無に拘わらず一定のリーク電流が出力に流れるこ
とになり、このリーク電流の値、即ち、熱励起に依って
流れるコレクタ電流I SA4の値は4.2 [K)の
温度に於いて極めて大きな値、例えばNbを用いたもの
で500(A/c++2) 、また、Pbを用いたもの
で4400 (A/am” )にもなる為、これを回避
するには装置の動作温度を例えば2〔K〕程度に低下さ
せることが必要になる。
(1) In addition to quasiparticles generated by injection, there are quasiparticles generated by thermal excitation in the base M region. Therefore, a constant leakage current will flow to the output regardless of the presence or absence of injection. Therefore, the value of this leakage current, that is, the value of the collector current ISA4 flowing due to thermal excitation, is an extremely large value at a temperature of 4.2 [K], for example, 500 (A/c++2) when Nb is used. ), and in the case of using Pb, it is as high as 4400 (A/am"), so to avoid this, it is necessary to lower the operating temperature of the device to, for example, about 2 [K].

(2)ベース領域には準粒子の他に大量の超伝導電子が
存在している。このような場合、コレクタに於ける電子
透過率を上昇させると超伝導電子の電流への寄与が増加
することになり、コレクタの設計は困難になる。
(2) In addition to quasiparticles, a large number of superconducting electrons exist in the base region. In such a case, increasing the electron transmittance in the collector increases the contribution of superconducting electrons to the current, making collector design difficult.

本発明は、高い電子透過率並びに低いリーク電流(高イ
ンピーダンス)を実現した準粒子コレクタを有する超伝
導装置を提供する。
The present invention provides a superconducting device having a quasiparticle collector that achieves high electron transmittance and low leakage current (high impedance).

〔問題点を解決するための手段〕[Means for solving problems]

この種の超伝導装置に於いて、熱励起に依り流れるコレ
クタ電流I SATは、 I  sat  =Nt  e  d/ rmtt  
 (A/am2 )N7 :熱平衡時の準粒子密度 d:ベースの厚み τoff  :実効再結合時間 で与えられる。即ち、熱励起に依って流れるコレクタ電
流tsAアは熱平衡時の準粒子密度N、に比例する。尚
、熱励起に依って流れるコレクタ電流1 SATは前記
したところから判るようにトランジスタ動作には無関係
な無駄な電流である。
In this type of superconducting device, the collector current I SAT flowing due to thermal excitation is I sat =Nt ed/rmtt
(A/am2)N7: Quasiparticle density at thermal equilibrium d: Base thickness τoff: Given by effective recombination time. That is, the collector current tsAa flowing due to thermal excitation is proportional to the quasiparticle density N at the time of thermal equilibrium. It should be noted that the collector current 1SAT flowing due to thermal excitation is a wasteful current that is unrelated to the transistor operation, as can be seen from the above description.

ところで、熱平衡時の準粒子密度NYは、ギャップ・パ
ラメータが同程度であれば、超伝導体の電子密度に比例
する。従って、若し、低電子密度の超伝導体を用いれば
準粒子密度が小さくなり、無駄な電流である熱励起に依
って流れるコレクタ電流I SATも少なくなる。また
、同じ電子透過率の準粒子コレクタを用いた場合でも、
電子密度そのものが小さい為、その分だけ高インピーダ
ンスのコレクタとなる。
By the way, the quasiparticle density NY at thermal equilibrium is proportional to the electron density of the superconductor if the gap parameters are approximately the same. Therefore, if a superconductor with a low electron density is used, the quasi-particle density will be reduced, and the collector current ISAT flowing due to thermal excitation, which is a wasteful current, will also be reduced. Furthermore, even when using quasi-particle collectors with the same electron transmittance,
Since the electron density itself is low, it becomes a collector with high impedance.

そこで、本発明の超伝導装置では、全体或いは一部が通
常の金属に於ける電子密度より低い僅のそれを有する超
伝導体(例えばBaPb+−xBlxOl)で構成され
たベース層2と、該ベース層2に準粒子を注入する手段
(例えばNbからなるエミツタ層3)と、該ベース層2
から準粒子を取り出すコレクタ(例えばInSbからな
る半導体基板1)とを備えてなる構造になっている。
Therefore, in the superconducting device of the present invention, the base layer 2 is made entirely or partly of a superconductor (for example, BaPb+-xBlxOl) having a slightly lower electron density than that of ordinary metals, and means for injecting quasi-particles into the layer 2 (e.g. emitter layer 3 made of Nb) and the base layer 2;
It has a structure including a collector (for example, a semiconductor substrate 1 made of InSb) for extracting quasi-particles from the substrate.

〔作用〕[Effect]

この手段によれば、リーク電流が少なく、高い電子透過
率と高いインピーダンスを両立させた準粒子コレクタが
得られる為、特性良好なトランジスタ動作をする超伝導
装置が得られる。
According to this means, a quasi-particle collector with low leakage current, high electron transmittance, and high impedance can be obtained, so that a superconducting device that operates as a transistor with good characteristics can be obtained.

〔実施例〕〔Example〕

第1図は本発明一実施例の要部切断側面図を表している
FIG. 1 shows a cutaway side view of essential parts of an embodiment of the present invention.

図に於いて、1はInSbからなリコレクタとして作用
する半導体基板、2は低電子密度超伝導体であるBaP
b、−XBi、03からなるベース層、3は金属である
Nbからなる準粒子エミツタ層、4はS i O2から
なる絶縁層、5はベース電極、5′はエミッタ電極、6
はオーミック接触のコレクタ電極をそれぞれ示している
In the figure, 1 is a semiconductor substrate made of InSb that acts as a collector, and 2 is BaP, a low electron density superconductor.
b, -XBi, a base layer made of 03, 3 a quasi-particle emitter layer made of metal Nb, 4 an insulating layer made of SiO2, 5 a base electrode, 5' an emitter electrode, 6
indicate collector electrodes with ohmic contact.

尚、B a P I)’I−x B’t x Oxに於
けるXの値としては0.3程度を選択して良く、また、
この実施例では、ベース電極5が準粒子エミツタ層3を
介して取り出されているが、超伝導モードの場合には、
この構成で何等の支障もないが、必要あれば、ベース層
2から直接取り出すようにしても良い。
In addition, the value of X in B a P I)'I-x B't x Ox may be selected to be about 0.3,
In this embodiment, the base electrode 5 is taken out through the quasi-particle emitter layer 3, but in the case of superconducting mode,
Although there is no problem with this configuration, it may be taken out directly from the base layer 2 if necessary.

図示例に於いて、コレクタである半導体基板1は、In
Sbに限られず、GaAs、  InAs。
In the illustrated example, the semiconductor substrate 1 serving as the collector is made of In
Not limited to Sb, but also GaAs, InAs.

In、−、Gax As、InP、HgCdTeなどに
代替することができ、また、ベース層2を構成する低電
子密度超伝導体としては、例示したものの他、Li、□
Ti、、0.或いはM、Mo6Ss(M=Pb、Cu)
などを用いることができ、更にまた、準粒子エミツタ層
3を構成する金属としてはNbの他にAIlなどを用い
ることが可能である。尚、第1図には示されていないが
、ベース層2と準粒子エミツタ層4との間にはトンネル
・バリヤが介在している。
In, -, Gax As, InP, HgCdTe, etc. can be substituted, and as the low electron density superconductor constituting the base layer 2, in addition to the exemplified ones, Li, □
Ti,,0. Or M, Mo6Ss (M=Pb, Cu)
Further, as the metal constituting the quasi-particle emitter layer 3, it is possible to use Al, etc. in addition to Nb. Although not shown in FIG. 1, a tunnel barrier is interposed between the base layer 2 and the quasi-particle emitter layer 4.

本実施例に依ると、バイポーラ・トランジスタと同様な
動作をさせることが可能であるのは勿論、ベース層2の
電子密度が金属より小さい為、コレクタである半導体基
板1に於けるリーク電流は少なく、高い電子透過率と高
インピーダンスが同時に実現されている。
According to this embodiment, it is possible to perform the same operation as a bipolar transistor, and since the electron density of the base layer 2 is lower than that of metal, the leakage current in the semiconductor substrate 1, which is the collector, is small. , high electron transmittance and high impedance are simultaneously achieved.

第2図は本発明に於ける他の実施例を表す要部切断側面
図であり、第1図に於いて用いた記号と同記号は同部分
を表すか或いは同じ意味を持つものとする。
FIG. 2 is a side view showing a main part of another embodiment of the present invention, and the same symbols as those used in FIG. 1 represent the same parts or have the same meanings.

本実施例が第1図に関して説明した実施例と相違する点
は、低電子密度超伝導体からなるベース層2上に例えば
Nbからなる超伝導金属層2′が形成され、その上に準
粒子エミツタ層3が形成されていることである。
This embodiment is different from the embodiment explained with reference to FIG. The emitter layer 3 is formed.

このような構成にすると、準粒子エミツタ層3がエネル
ギ・ギャップが比較的大きいNbなどの超伝導金属層2
′上に形成されている為、準粒子エミツタ層3の非線型
性が大きくなること、そして、注入された準粒子が超伝
導金属層2′からベース層2に移動した際に第1図に示
した実施例と比較して高速で走行する為、動作速度が向
上すること等の効果が付加される。
With such a configuration, the quasi-particle emitter layer 3 is made of a superconducting metal layer 2 such as Nb, which has a relatively large energy gap.
′, the nonlinearity of the quasiparticle emitter layer 3 increases, and when the injected quasiparticles move from the superconducting metal layer 2′ to the base layer 2, as shown in FIG. Since it runs at a higher speed than the illustrated embodiment, it has additional effects such as improved operating speed.

〔発明の効果〕〔Effect of the invention〕

本発明に依る超伝導装置では、ベース層の全部或いは一
部に金属の電子密度より小さい値のそれを有する低電子
密度超伝導体を適用した構成を採っている。
The superconducting device according to the present invention employs a structure in which a low electron density superconductor having a value smaller than the electron density of metal is applied to all or part of the base layer.

このような構成に依り、リーク電流が少なく、高い電子
透過率と高いインピーダンスを同時に実現した準粒子コ
レクタが得られている。
With this configuration, a quasi-particle collector can be obtained that has low leakage current and simultaneously achieves high electron transmittance and high impedance.

従って、本発明の超伝導装置をトランジスタ動作させる
場合、さほどの低温度を維持しなくても良好に動作し、
また、コレクタの設計も容易である。
Therefore, when operating the superconducting device of the present invention as a transistor, it operates well without maintaining a very low temperature.
Moreover, the design of the collector is also easy.

【図面の簡単な説明】[Brief explanation of drawings]

第1図及び第2図は本発明に於けるそれぞれ異なる実施
例を表す要部切断側面図である。 図に於いて、1は半導体基板、2はベース層、2′は超
伝導金属層、3はエミツタ層、4は絶縁層、5はベース
電極、5′はエミッタ電極、6はコレクタ電極をそれぞ
れ示している。 特許出願人   富士通株式会社 代理人弁理士  相 谷 昭 司 代理人弁理士  渡 邊 弘 一 本発明一実施例の要部切断側面図 第1図
FIGS. 1 and 2 are main part cutaway side views showing different embodiments of the present invention. In the figure, 1 is a semiconductor substrate, 2 is a base layer, 2' is a superconducting metal layer, 3 is an emitter layer, 4 is an insulating layer, 5 is a base electrode, 5' is an emitter electrode, and 6 is a collector electrode. It shows. Patent Applicant: Fujitsu Ltd. Representative Patent Attorney: Akira Aitani Representative Patent Attorney: Hiroshi Watanabe Figure 1: Cutaway side view of essential parts of an embodiment of the present invention

Claims (1)

【特許請求の範囲】 全体或いは一部が通常の金属に於ける電子密度より低い
値のそれを有する超伝導体で構成されたベース層と、 該ベース層に準粒子を注入する手段と、 該ベース層から準粒子を取り出すコレクタとを備えてな
ることを特徴とする超伝導装置。
[Claims] A base layer made entirely or partially of a superconductor having an electron density lower than that of ordinary metals; means for implanting quasiparticles into the base layer; A superconducting device comprising: a collector for extracting quasiparticles from a base layer.
JP60105944A 1985-05-20 1985-05-20 Superconducting device Expired - Lifetime JPH071805B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60105944A JPH071805B2 (en) 1985-05-20 1985-05-20 Superconducting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60105944A JPH071805B2 (en) 1985-05-20 1985-05-20 Superconducting device

Publications (2)

Publication Number Publication Date
JPS61264769A true JPS61264769A (en) 1986-11-22
JPH071805B2 JPH071805B2 (en) 1995-01-11

Family

ID=14420955

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60105944A Expired - Lifetime JPH071805B2 (en) 1985-05-20 1985-05-20 Superconducting device

Country Status (1)

Country Link
JP (1) JPH071805B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5106819A (en) * 1988-07-08 1992-04-21 Semiconductor Energy Laboratory Co., Ltd. Oxide superconducting tunnel junctions and manufacturing method for the same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60231375A (en) * 1984-04-26 1985-11-16 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション Superconductive transistor

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60231375A (en) * 1984-04-26 1985-11-16 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション Superconductive transistor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5106819A (en) * 1988-07-08 1992-04-21 Semiconductor Energy Laboratory Co., Ltd. Oxide superconducting tunnel junctions and manufacturing method for the same

Also Published As

Publication number Publication date
JPH071805B2 (en) 1995-01-11

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