JPS61264725A - ステツプ・アンド・リピ−ト用軟ｘ線転写マスク及びその製造方法 - Google Patents

ステツプ・アンド・リピ−ト用軟ｘ線転写マスク及びその製造方法

Info

Publication number
JPS61264725A
JPS61264725A JP60105536A JP10553685A JPS61264725A JP S61264725 A JPS61264725 A JP S61264725A JP 60105536 A JP60105536 A JP 60105536A JP 10553685 A JP10553685 A JP 10553685A JP S61264725 A JPS61264725 A JP S61264725A
Authority
JP
Japan
Prior art keywords
soft
ray
frame
wafer
absorber pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60105536A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0521334B2 (enExample
Inventor
Yasuo Iida
康夫 飯田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP60105536A priority Critical patent/JPS61264725A/ja
Publication of JPS61264725A publication Critical patent/JPS61264725A/ja
Publication of JPH0521334B2 publication Critical patent/JPH0521334B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60105536A 1985-05-17 1985-05-17 ステツプ・アンド・リピ−ト用軟ｘ線転写マスク及びその製造方法 Granted JPS61264725A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60105536A JPS61264725A (ja) 1985-05-17 1985-05-17 ステツプ・アンド・リピ−ト用軟ｘ線転写マスク及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60105536A JPS61264725A (ja) 1985-05-17 1985-05-17 ステツプ・アンド・リピ−ト用軟ｘ線転写マスク及びその製造方法

Publications (2)

Publication Number Publication Date
JPS61264725A true JPS61264725A (ja) 1986-11-22
JPH0521334B2 JPH0521334B2 (enExample) 1993-03-24

Family

ID=14410307

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60105536A Granted JPS61264725A (ja) 1985-05-17 1985-05-17 ステツプ・アンド・リピ−ト用軟ｘ線転写マスク及びその製造方法

Country Status (1)

Country Link
JP (1) JPS61264725A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0413950U (enExample) * 1990-05-28 1992-02-04
EP0677787A3 (en) * 1994-03-15 1996-03-27 Canon Kk Mask and mask holder.

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0413950U (enExample) * 1990-05-28 1992-02-04
EP0677787A3 (en) * 1994-03-15 1996-03-27 Canon Kk Mask and mask holder.

Also Published As

Publication number Publication date
JPH0521334B2 (enExample) 1993-03-24

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