JPS61264175A - Ｃｖｄ装置 - Google Patents

Ｃｖｄ装置

Info

Publication number
JPS61264175A
JPS61264175A JP10596885A JP10596885A JPS61264175A JP S61264175 A JPS61264175 A JP S61264175A JP 10596885 A JP10596885 A JP 10596885A JP 10596885 A JP10596885 A JP 10596885A JP S61264175 A JPS61264175 A JP S61264175A
Authority
JP
Japan
Prior art keywords
wafer
cvd
source
heated
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10596885A
Other languages
English (en)
Japanese (ja)
Other versions
JPS634915B2 (enrdf_load_stackoverflow
Inventor
Shoji Madokoro
間所　昭次
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP10596885A priority Critical patent/JPS61264175A/ja
Publication of JPS61264175A publication Critical patent/JPS61264175A/ja
Publication of JPS634915B2 publication Critical patent/JPS634915B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP10596885A 1985-05-20 1985-05-20 Ｃｖｄ装置 Granted JPS61264175A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10596885A JPS61264175A (ja) 1985-05-20 1985-05-20 Ｃｖｄ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10596885A JPS61264175A (ja) 1985-05-20 1985-05-20 Ｃｖｄ装置

Publications (2)

Publication Number Publication Date
JPS61264175A true JPS61264175A (ja) 1986-11-22
JPS634915B2 JPS634915B2 (enrdf_load_stackoverflow) 1988-02-01

Family

ID=14421578

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10596885A Granted JPS61264175A (ja) 1985-05-20 1985-05-20 Ｃｖｄ装置

Country Status (1)

Country Link
JP (1) JPS61264175A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62239526A (ja) * 1986-04-11 1987-10-20 Fujitsu Ltd 金属被膜のエピタキシヤル成長方法
JPH01264258A (ja) * 1988-04-15 1989-10-20 Hitachi Ltd 半導体装置およびその製造方法
JPH0593273A (ja) * 1991-10-01 1993-04-16 Nec Corp アルミ薄膜の形成方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0373247A (ja) * 1989-08-10 1991-03-28 Mitsubishi Materials Corp ワーク配列装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62239526A (ja) * 1986-04-11 1987-10-20 Fujitsu Ltd 金属被膜のエピタキシヤル成長方法
JPH01264258A (ja) * 1988-04-15 1989-10-20 Hitachi Ltd 半導体装置およびその製造方法
JPH0593273A (ja) * 1991-10-01 1993-04-16 Nec Corp アルミ薄膜の形成方法

Also Published As

Publication number Publication date
JPS634915B2 (enrdf_load_stackoverflow) 1988-02-01

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