JPS61263123A - ステップアンドリピート露光方法 - Google Patents

ステップアンドリピート露光方法

Info

Publication number
JPS61263123A
JPS61263123A JP60102727A JP10272785A JPS61263123A JP S61263123 A JPS61263123 A JP S61263123A JP 60102727 A JP60102727 A JP 60102727A JP 10272785 A JP10272785 A JP 10272785A JP S61263123 A JPS61263123 A JP S61263123A
Authority
JP
Japan
Prior art keywords
wafer
alignment
semiconductor manufacturing
chip
mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60102727A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0149007B2 (enrdf_load_stackoverflow
Inventor
Hideki Ine
秀樹 稲
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60102727A priority Critical patent/JPS61263123A/ja
Publication of JPS61263123A publication Critical patent/JPS61263123A/ja
Priority to US07/273,707 priority patent/US4861162A/en
Publication of JPH0149007B2 publication Critical patent/JPH0149007B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60102727A 1985-05-16 1985-05-16 ステップアンドリピート露光方法 Granted JPS61263123A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60102727A JPS61263123A (ja) 1985-05-16 1985-05-16 ステップアンドリピート露光方法
US07/273,707 US4861162A (en) 1985-05-16 1988-11-15 Alignment of an object

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60102727A JPS61263123A (ja) 1985-05-16 1985-05-16 ステップアンドリピート露光方法

Publications (2)

Publication Number Publication Date
JPS61263123A true JPS61263123A (ja) 1986-11-21
JPH0149007B2 JPH0149007B2 (enrdf_load_stackoverflow) 1989-10-23

Family

ID=14335291

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60102727A Granted JPS61263123A (ja) 1985-05-16 1985-05-16 ステップアンドリピート露光方法

Country Status (1)

Country Link
JP (1) JPS61263123A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5386269A (en) * 1988-05-12 1995-01-31 Canon Kabushiki Kaisha Alignment and exposure apparatus
JPH10163100A (ja) * 1996-11-28 1998-06-19 Nikon Corp 投影露光装置及び投影露光方法並びに走査露光方法
KR100309932B1 (ko) * 1986-04-28 2001-12-15 제임스 엠. 윌리암스 웨이퍼 운반 장치 및 방법
JP2014143335A (ja) * 2013-01-25 2014-08-07 Dainippon Screen Mfg Co Ltd 描画装置および描画方法
WO2022118468A1 (ja) * 2020-12-04 2022-06-09 日本電信電話株式会社 ウエハ搬送用基板

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3962736B2 (ja) 2004-10-08 2007-08-22 キヤノン株式会社 露光装置およびデバイス製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100309932B1 (ko) * 1986-04-28 2001-12-15 제임스 엠. 윌리암스 웨이퍼 운반 장치 및 방법
US5386269A (en) * 1988-05-12 1995-01-31 Canon Kabushiki Kaisha Alignment and exposure apparatus
JPH10163100A (ja) * 1996-11-28 1998-06-19 Nikon Corp 投影露光装置及び投影露光方法並びに走査露光方法
JP2014143335A (ja) * 2013-01-25 2014-08-07 Dainippon Screen Mfg Co Ltd 描画装置および描画方法
WO2022118468A1 (ja) * 2020-12-04 2022-06-09 日本電信電話株式会社 ウエハ搬送用基板

Also Published As

Publication number Publication date
JPH0149007B2 (enrdf_load_stackoverflow) 1989-10-23

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