JPS61256622A - 薄膜形成装置 - Google Patents
薄膜形成装置Info
- Publication number
- JPS61256622A JPS61256622A JP9740485A JP9740485A JPS61256622A JP S61256622 A JPS61256622 A JP S61256622A JP 9740485 A JP9740485 A JP 9740485A JP 9740485 A JP9740485 A JP 9740485A JP S61256622 A JPS61256622 A JP S61256622A
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- thin film
- film forming
- vapor
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9740485A JPS61256622A (ja) | 1985-05-08 | 1985-05-08 | 薄膜形成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9740485A JPS61256622A (ja) | 1985-05-08 | 1985-05-08 | 薄膜形成装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61256622A true JPS61256622A (ja) | 1986-11-14 |
| JPH0467774B2 JPH0467774B2 (enExample) | 1992-10-29 |
Family
ID=14191567
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9740485A Granted JPS61256622A (ja) | 1985-05-08 | 1985-05-08 | 薄膜形成装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61256622A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5099791A (en) * | 1989-09-08 | 1992-03-31 | Mitsubishi Denki Kabushiki Kaisha | Cluster beam thin film deposition apparatus with thermionic electron control |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4913793U (enExample) * | 1972-05-11 | 1974-02-05 | ||
| JPS552901A (en) * | 1978-06-19 | 1980-01-10 | American District Telegraph Co | Optical smoke detector |
| JPS5754930A (en) * | 1980-09-20 | 1982-04-01 | Minolta Camera Co Ltd | Exposure controlling circuit of camera |
| JPS58118119A (ja) * | 1982-01-07 | 1983-07-14 | Nec Corp | 反応性イオンプレ−テイング装置 |
-
1985
- 1985-05-08 JP JP9740485A patent/JPS61256622A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4913793U (enExample) * | 1972-05-11 | 1974-02-05 | ||
| JPS552901A (en) * | 1978-06-19 | 1980-01-10 | American District Telegraph Co | Optical smoke detector |
| JPS5754930A (en) * | 1980-09-20 | 1982-04-01 | Minolta Camera Co Ltd | Exposure controlling circuit of camera |
| JPS58118119A (ja) * | 1982-01-07 | 1983-07-14 | Nec Corp | 反応性イオンプレ−テイング装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5099791A (en) * | 1989-09-08 | 1992-03-31 | Mitsubishi Denki Kabushiki Kaisha | Cluster beam thin film deposition apparatus with thermionic electron control |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0467774B2 (enExample) | 1992-10-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3046936A (en) | Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof | |
| JP2501828B2 (ja) | 薄膜蒸着装置 | |
| JPS56139673A (en) | Manufacture of lead coat | |
| JPS61256622A (ja) | 薄膜形成装置 | |
| JPH0364454A (ja) | 蒸気発生源用るつぼ | |
| JPS60262963A (ja) | 化合物薄膜蒸着装置 | |
| JPH0516214Y2 (enExample) | ||
| JPH0449173Y2 (enExample) | ||
| JPS6212120A (ja) | 蒸発源加熱用フイラメント | |
| JPH0342033Y2 (enExample) | ||
| JPS60125368A (ja) | 薄膜蒸着装置 | |
| JPS60124915A (ja) | 薄膜蒸着装置 | |
| JPS62260053A (ja) | 化合物薄膜蒸着装置 | |
| JPS62122209A (ja) | 薄膜形成装置 | |
| JPS6329925A (ja) | 化合物薄膜形成装置 | |
| JPH0215630B2 (enExample) | ||
| JPS6386863A (ja) | 薄膜製造装置 | |
| JPH0719746B2 (ja) | 薄膜蒸着装置 | |
| JPS62287617A (ja) | 薄膜形成装置 | |
| JPS60124918A (ja) | 薄膜蒸着装置 | |
| JPH0510424B2 (enExample) | ||
| JPS6215815A (ja) | 薄膜蒸着装置 | |
| JPS61256623A (ja) | 薄膜形成装置 | |
| JPS60124916A (ja) | 薄膜蒸着装置 | |
| JPS60124930A (ja) | 薄膜蒸着装置 |