JPS61242021A - 露光装置 - Google Patents
露光装置Info
- Publication number
- JPS61242021A JPS61242021A JP60084106A JP8410685A JPS61242021A JP S61242021 A JPS61242021 A JP S61242021A JP 60084106 A JP60084106 A JP 60084106A JP 8410685 A JP8410685 A JP 8410685A JP S61242021 A JPS61242021 A JP S61242021A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- substrate
- pattern
- stage
- optical axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P95/00—
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60084106A JPS61242021A (ja) | 1985-04-19 | 1985-04-19 | 露光装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60084106A JPS61242021A (ja) | 1985-04-19 | 1985-04-19 | 露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61242021A true JPS61242021A (ja) | 1986-10-28 |
| JPH0154854B2 JPH0154854B2 (cg-RX-API-DMAC10.html) | 1989-11-21 |
Family
ID=13821266
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60084106A Granted JPS61242021A (ja) | 1985-04-19 | 1985-04-19 | 露光装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61242021A (cg-RX-API-DMAC10.html) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63175859A (ja) * | 1987-01-16 | 1988-07-20 | Ushio Inc | 液晶基板製作の露光方式 |
| WO1995016276A1 (fr) * | 1993-12-07 | 1995-06-15 | Kabushiki Kaisha Toshiba | Afficheur et sa fabrication |
| JP2001312069A (ja) * | 2000-04-28 | 2001-11-09 | Canon Inc | 液晶パネル用走査型露光装置および走査型露光方法 |
| JP2008060576A (ja) * | 2006-08-30 | 2008-03-13 | Asml Netherlands Bv | リソグラフィ装置及び方法 |
| JP2009295614A (ja) * | 2008-06-02 | 2009-12-17 | Nec Electronics Corp | 半導体デバイスの製造方法 |
-
1985
- 1985-04-19 JP JP60084106A patent/JPS61242021A/ja active Granted
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63175859A (ja) * | 1987-01-16 | 1988-07-20 | Ushio Inc | 液晶基板製作の露光方式 |
| WO1995016276A1 (fr) * | 1993-12-07 | 1995-06-15 | Kabushiki Kaisha Toshiba | Afficheur et sa fabrication |
| US5656526A (en) * | 1993-12-07 | 1997-08-12 | Kabushiki Kaisha Toshiba | Method of fabricating a display device |
| US5784135A (en) * | 1993-12-07 | 1998-07-21 | Kabushiki Kaisha Toshiba | Display device in which display regions have non-linear boundaries and transmit light differently for the same applied voltage |
| JP2001312069A (ja) * | 2000-04-28 | 2001-11-09 | Canon Inc | 液晶パネル用走査型露光装置および走査型露光方法 |
| JP2008060576A (ja) * | 2006-08-30 | 2008-03-13 | Asml Netherlands Bv | リソグラフィ装置及び方法 |
| JP2009295614A (ja) * | 2008-06-02 | 2009-12-17 | Nec Electronics Corp | 半導体デバイスの製造方法 |
| US8455179B2 (en) | 2008-06-02 | 2013-06-04 | Renesas Electronics Corporation | Method of forming semiconductor device by using reduction projection aligner |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0154854B2 (cg-RX-API-DMAC10.html) | 1989-11-21 |
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