JPS6123313A - 多結晶シリコンウエハの製造皿用離型剤層形成方法 - Google Patents

多結晶シリコンウエハの製造皿用離型剤層形成方法

Info

Publication number
JPS6123313A
JPS6123313A JP59143965A JP14396584A JPS6123313A JP S6123313 A JPS6123313 A JP S6123313A JP 59143965 A JP59143965 A JP 59143965A JP 14396584 A JP14396584 A JP 14396584A JP S6123313 A JPS6123313 A JP S6123313A
Authority
JP
Japan
Prior art keywords
release agent
mold release
melt
silicon
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59143965A
Other languages
English (en)
Japanese (ja)
Other versions
JPH038578B2 (cg-RX-API-DMAC10.html
Inventor
Yasuhiro Maeda
泰宏 前田
Ichiro Hide
一郎 秀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoxan Corp
Hokusan Co Ltd
Original Assignee
Hoxan Corp
Hokusan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoxan Corp, Hokusan Co Ltd filed Critical Hoxan Corp
Priority to JP59143965A priority Critical patent/JPS6123313A/ja
Publication of JPS6123313A publication Critical patent/JPS6123313A/ja
Publication of JPH038578B2 publication Critical patent/JPH038578B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P76/20—

Landscapes

  • Silicon Compounds (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Photovoltaic Devices (AREA)
JP59143965A 1984-07-11 1984-07-11 多結晶シリコンウエハの製造皿用離型剤層形成方法 Granted JPS6123313A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59143965A JPS6123313A (ja) 1984-07-11 1984-07-11 多結晶シリコンウエハの製造皿用離型剤層形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59143965A JPS6123313A (ja) 1984-07-11 1984-07-11 多結晶シリコンウエハの製造皿用離型剤層形成方法

Publications (2)

Publication Number Publication Date
JPS6123313A true JPS6123313A (ja) 1986-01-31
JPH038578B2 JPH038578B2 (cg-RX-API-DMAC10.html) 1991-02-06

Family

ID=15351169

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59143965A Granted JPS6123313A (ja) 1984-07-11 1984-07-11 多結晶シリコンウエハの製造皿用離型剤層形成方法

Country Status (1)

Country Link
JP (1) JPS6123313A (cg-RX-API-DMAC10.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0484467A (ja) * 1990-07-27 1992-03-17 Mitsubishi Electric Corp 太陽電池の製造方法
CN1073005C (zh) * 1996-12-19 2001-10-17 艾利森电话股份有限公司 制备弹性凸起的方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56129377A (en) * 1980-03-14 1981-10-09 Agency Of Ind Science & Technol Manufacture of polycrystalline silicone semiconductor
JPS57181175A (en) * 1981-04-30 1982-11-08 Hoxan Corp Manufacture of polycrystalline silicon wafer

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56129377A (en) * 1980-03-14 1981-10-09 Agency Of Ind Science & Technol Manufacture of polycrystalline silicone semiconductor
JPS57181175A (en) * 1981-04-30 1982-11-08 Hoxan Corp Manufacture of polycrystalline silicon wafer

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0484467A (ja) * 1990-07-27 1992-03-17 Mitsubishi Electric Corp 太陽電池の製造方法
CN1073005C (zh) * 1996-12-19 2001-10-17 艾利森电话股份有限公司 制备弹性凸起的方法

Also Published As

Publication number Publication date
JPH038578B2 (cg-RX-API-DMAC10.html) 1991-02-06

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term