JPS6122872B2 - - Google Patents

Info

Publication number
JPS6122872B2
JPS6122872B2 JP53133615A JP13361578A JPS6122872B2 JP S6122872 B2 JPS6122872 B2 JP S6122872B2 JP 53133615 A JP53133615 A JP 53133615A JP 13361578 A JP13361578 A JP 13361578A JP S6122872 B2 JPS6122872 B2 JP S6122872B2
Authority
JP
Japan
Prior art keywords
layer
resistance
ion
implanted
epitaxial
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53133615A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5559781A (en
Inventor
Akihiro Shibatomi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13361578A priority Critical patent/JPS5559781A/ja
Publication of JPS5559781A publication Critical patent/JPS5559781A/ja
Publication of JPS6122872B2 publication Critical patent/JPS6122872B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Bipolar Transistors (AREA)
  • Junction Field-Effect Transistors (AREA)
JP13361578A 1978-10-30 1978-10-30 Method of fabricating semiconductor device Granted JPS5559781A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13361578A JPS5559781A (en) 1978-10-30 1978-10-30 Method of fabricating semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13361578A JPS5559781A (en) 1978-10-30 1978-10-30 Method of fabricating semiconductor device

Publications (2)

Publication Number Publication Date
JPS5559781A JPS5559781A (en) 1980-05-06
JPS6122872B2 true JPS6122872B2 (enrdf_load_stackoverflow) 1986-06-03

Family

ID=15108947

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13361578A Granted JPS5559781A (en) 1978-10-30 1978-10-30 Method of fabricating semiconductor device

Country Status (1)

Country Link
JP (1) JPS5559781A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58147075A (ja) * 1982-02-25 1983-09-01 Toshiba Corp 電界効果形トランジスタ用ウエハの製造方法
JPH0812867B2 (ja) * 1984-05-23 1996-02-07 日本電気株式会社 半導体装置

Also Published As

Publication number Publication date
JPS5559781A (en) 1980-05-06

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