JPS61204025A - Ｎｆ↓３の除害方法 - Google Patents
Ｎｆ↓３の除害方法Info
- Publication number
- JPS61204025A JPS61204025A JP60042580A JP4258085A JPS61204025A JP S61204025 A JPS61204025 A JP S61204025A JP 60042580 A JP60042580 A JP 60042580A JP 4258085 A JP4258085 A JP 4258085A JP S61204025 A JPS61204025 A JP S61204025A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- fluoride
- react
- reaction
- treating agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 15
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims abstract description 11
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 5
- 229910052796 boron Inorganic materials 0.000 claims abstract description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 3
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 3
- 150000001875 compounds Chemical class 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 abstract description 10
- 229910052731 fluorine Inorganic materials 0.000 abstract description 6
- 239000007787 solid Substances 0.000 abstract description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 abstract description 4
- 239000011737 fluorine Substances 0.000 abstract description 4
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 abstract description 4
- 239000000428 dust Substances 0.000 abstract description 3
- 239000002360 explosive Substances 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 3
- 229910004014 SiF4 Inorganic materials 0.000 abstract description 2
- 239000010703 silicon Substances 0.000 abstract description 2
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052714 tellurium Inorganic materials 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 26
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- ZQXCQTAELHSNAT-UHFFFAOYSA-N 1-chloro-3-nitro-5-(trifluoromethyl)benzene Chemical compound [O-][N+](=O)C1=CC(Cl)=CC(C(F)(F)F)=C1 ZQXCQTAELHSNAT-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 229910006160 GeF4 Inorganic materials 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- OFLYIWITHZJFLS-UHFFFAOYSA-N [Si].[Au] Chemical compound [Si].[Au] OFLYIWITHZJFLS-UHFFFAOYSA-N 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000003546 flue gas Substances 0.000 description 1
- 239000012025 fluorinating agent Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- JTJMJGYZQZDUJJ-UHFFFAOYSA-N phencyclidine Chemical compound C1CCCCN1C1(C=2C=CC=CC=2)CCCCC1 JTJMJGYZQZDUJJ-UHFFFAOYSA-N 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000002760 rocket fuel Substances 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000004936 stimulating effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- PPMWWXLUCOODDK-UHFFFAOYSA-N tetrafluorogermane Chemical compound F[Ge](F)(F)F PPMWWXLUCOODDK-UHFFFAOYSA-N 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60042580A JPS61204025A (ja) | 1985-03-06 | 1985-03-06 | Ｎｆ↓３の除害方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60042580A JPS61204025A (ja) | 1985-03-06 | 1985-03-06 | Ｎｆ↓３の除害方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61204025A true JPS61204025A (ja) | 1986-09-10 |
| JPS6348570B2 JPS6348570B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-09-29 |
Family
ID=12640005
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60042580A Granted JPS61204025A (ja) | 1985-03-06 | 1985-03-06 | Ｎｆ↓３の除害方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61204025A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0382986A1 (en) * | 1989-02-13 | 1990-08-22 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Method and apparatus for detoxicating halide of nitrogen or carbon |
| JPH02245223A (ja) * | 1989-03-20 | 1990-10-01 | Mitsui Toatsu Chem Inc | 窒素弗化物含有排ガスの処理方法 |
| JPH03202128A (ja) * | 1989-12-28 | 1991-09-03 | Ebara Res Co Ltd | Ｎｆ↓３の除害方法 |
| US5213767A (en) * | 1988-06-04 | 1993-05-25 | Boc Limited | Dry exhaust gas conditioning |
| US5417934A (en) * | 1988-06-04 | 1995-05-23 | Boc Limited | Dry exhaust gas conditioning |
| EP0666101A1 (en) * | 1994-02-03 | 1995-08-09 | MITSUI TOATSU CHEMICALS, Inc. | Exhaust gas treating agent and a method of treating exhaust gas using the agent |
| US5486340A (en) * | 1989-12-02 | 1996-01-23 | The Boc Group Plc | Exhaust gas conditioning |
| EP0771579A1 (en) * | 1995-10-30 | 1997-05-07 | Central Glass Company, Limited | Method for decomposing halide-containing gas |
| US6106790A (en) * | 1997-08-18 | 2000-08-22 | Air Products And Chemicals, Inc. | Abatement of NF3 using small particle fluidized bed |
| EP1043058A1 (en) * | 1999-04-09 | 2000-10-11 | Central Glass Company, Limited | NF3 treating process |
| US6921519B2 (en) | 2001-01-24 | 2005-07-26 | Ineos Fluor Holdings Limited | Decomposition of fluorine containing compounds |
-
1985
- 1985-03-06 JP JP60042580A patent/JPS61204025A/ja active Granted
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0419507B1 (en) * | 1988-06-04 | 2000-07-19 | Boc Limited | Dry exhaust gas conditioning |
| US5213767A (en) * | 1988-06-04 | 1993-05-25 | Boc Limited | Dry exhaust gas conditioning |
| US5417934A (en) * | 1988-06-04 | 1995-05-23 | Boc Limited | Dry exhaust gas conditioning |
| EP0382986A1 (en) * | 1989-02-13 | 1990-08-22 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Method and apparatus for detoxicating halide of nitrogen or carbon |
| JPH02245223A (ja) * | 1989-03-20 | 1990-10-01 | Mitsui Toatsu Chem Inc | 窒素弗化物含有排ガスの処理方法 |
| US5486340A (en) * | 1989-12-02 | 1996-01-23 | The Boc Group Plc | Exhaust gas conditioning |
| JPH03202128A (ja) * | 1989-12-28 | 1991-09-03 | Ebara Res Co Ltd | Ｎｆ↓３の除害方法 |
| EP0666101A1 (en) * | 1994-02-03 | 1995-08-09 | MITSUI TOATSU CHEMICALS, Inc. | Exhaust gas treating agent and a method of treating exhaust gas using the agent |
| US5728642A (en) * | 1994-02-03 | 1998-03-17 | Mitsui Toatsu Chemicals, Inc. | Exhaust gas treating agent and a method of treating exhaust gas using the agent |
| EP0771579A1 (en) * | 1995-10-30 | 1997-05-07 | Central Glass Company, Limited | Method for decomposing halide-containing gas |
| US6106790A (en) * | 1997-08-18 | 2000-08-22 | Air Products And Chemicals, Inc. | Abatement of NF3 using small particle fluidized bed |
| EP1043058A1 (en) * | 1999-04-09 | 2000-10-11 | Central Glass Company, Limited | NF3 treating process |
| US6342194B1 (en) | 1999-04-09 | 2002-01-29 | Central Glass Company, Limited | NF3 treating process |
| US6921519B2 (en) | 2001-01-24 | 2005-07-26 | Ineos Fluor Holdings Limited | Decomposition of fluorine containing compounds |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6348570B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-09-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |