JPS61204025A - Method for removing harm of nf3 - Google Patents
Method for removing harm of nf3Info
- Publication number
- JPS61204025A JPS61204025A JP60042580A JP4258085A JPS61204025A JP S61204025 A JPS61204025 A JP S61204025A JP 60042580 A JP60042580 A JP 60042580A JP 4258085 A JP4258085 A JP 4258085A JP S61204025 A JPS61204025 A JP S61204025A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- fluoride
- react
- reaction
- treating agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 15
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims abstract description 11
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 5
- 229910052796 boron Inorganic materials 0.000 claims abstract description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 3
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 3
- 150000001875 compounds Chemical class 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 abstract description 10
- 229910052731 fluorine Inorganic materials 0.000 abstract description 6
- 239000007787 solid Substances 0.000 abstract description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 abstract description 4
- 239000011737 fluorine Substances 0.000 abstract description 4
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 abstract description 4
- 239000000428 dust Substances 0.000 abstract description 3
- 239000002360 explosive Substances 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 3
- 229910004014 SiF4 Inorganic materials 0.000 abstract description 2
- 239000010703 silicon Substances 0.000 abstract description 2
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052714 tellurium Inorganic materials 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 26
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- ZQXCQTAELHSNAT-UHFFFAOYSA-N 1-chloro-3-nitro-5-(trifluoromethyl)benzene Chemical compound [O-][N+](=O)C1=CC(Cl)=CC(C(F)(F)F)=C1 ZQXCQTAELHSNAT-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 229910006160 GeF4 Inorganic materials 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- OFLYIWITHZJFLS-UHFFFAOYSA-N [Si].[Au] Chemical compound [Si].[Au] OFLYIWITHZJFLS-UHFFFAOYSA-N 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000003546 flue gas Substances 0.000 description 1
- 239000012025 fluorinating agent Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- JTJMJGYZQZDUJJ-UHFFFAOYSA-N phencyclidine Chemical compound C1CCCCN1C1(C=2C=CC=CC=2)CCCCC1 JTJMJGYZQZDUJJ-UHFFFAOYSA-N 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000002760 rocket fuel Substances 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000004936 stimulating effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- PPMWWXLUCOODDK-UHFFFAOYSA-N tetrafluorogermane Chemical compound F[Ge](F)(F)F PPMWWXLUCOODDK-UHFFFAOYSA-N 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
ＮＦ３はロケット燃料のほか、近年ＬＢ工のドライエツ
チング４７６るいはフッ素化剤として注目されており、
特にドライエツチング剤としてはＯＦ４などのパーフロ
ロカーボン系のエツチング剤にくらベエッチングの際に
生じるＬ８工基板の汚染が極めて少ないことなどの利点
を有している。一方、ＮＦ３は大気中で極めて安定であ
り、水にもわずかしか溶解せずＴＬｌ １０ ｐｐｍ
の毒性ガスであり、これを使用する場合にはその残ガ
ス等の排気の際にその除害が常に必要となる。[Detailed Description of the Invention] [Industrial Application Field] In addition to being used as a rocket fuel, NF3 has recently attracted attention as a dry etching agent or fluorinating agent for LB work.
In particular, as a dry etching agent, it has the advantage that there is very little contamination of the L8 processed substrate that occurs during dry etching compared to perfluorocarbon type etching agents such as OF4. On the other hand, NF3 is extremely stable in the atmosphere and only slightly soluble in water, reaching TLl 10 ppm.
It is a toxic gas, and when using it, it is always necessary to remove the residual gas when exhausting it.
本発明はかかるＮＦ’、を含むガスの除害方法に関する
ものである。The present invention relates to a method for removing harmful substances from gases containing such NF'.
ＮＦ３の除害方法については、次に示す２方法が知られ
ている。（Ｆｒａｎｋ Ｊ、Ｐｉｓａｃａｎｅ ｅｔ
ａｌ。The following two methods are known for eliminating NF3. (Frank J, Pisacane et al.
al.
Ｎａｖａｌ ８ｕｒｆａｃｅ Ｗｅａｐｏｎｓ
Ｃｅｎｔｅｒ％、Ｎｉｔｒｏｇｅｎ □Ｔｒｉ
ｆｌｕｏｒｉｄｅ ：工ｔｓ Ｃｈｅｍｌｔｒｙ、 Ｔ
ｏｚｉｃｉｔｙ％ａｎｄ８ａｆｅ Ｈａｎｄｒｌｎｇ
１１２ Ｎｏｖｅｍｂｅｒ １９７６、Ｐ５１）（１）
金属と反応させる方法
この方法における反応式は次のとおりであシ、
ＮＦＳ 、 Ｍｅ Ｍｅｐｚ 、 Ｎａ（Ｍｅ
； ｃｕｌＢｉ、Ａ８、ｓｂ１鋼鉄等）得られるフッ化
物は固体状でアシ、金属の表面はフッ化物により皮膜が
形成されるため反応が阻害され易く、また反応器に充填
された金嬌の形状が７フ化物の生成と七もに変化するた
め反応器内での閉塞あるいは粉じんの発生等の問題を有
している。Naval 8surface Weapons
Center%, Nitrogen □Tri
Fluoride: Engineering, T
Ozicity%and8afe Handrlng
112 November 1976, P51) (1)
Method for reacting with metal The reaction formula in this method is as follows: NFS, Me Mepz, Na(Me
culBi, A8, sb1 steel, etc.) The obtained fluoride is solid and a film is formed on the surface of the metal, so the reaction is easily inhibited, and the shape of the metal plate filled in the reactor is Due to the formation of heptafluoride and its transformation into heptafluoride, there are problems such as clogging in the reactor and generation of dust.
（η カーボンと反応させる方法
この方法における反応式は次のとおりであり、
ＮＦ、、Ｃ−ミー、ＮりＦ４ 、ＣＦ＜ 、Ｃ！Ｆ４生
成物がガス状であるため前記の（１）の方法のような間
顧はないものの、街性および爆発性をＭするＮ、 Ｆ、
がｆ旬４を麿六、Ｔンはカーボン−とＮＦ、との接触時
間を極めて長くする必要があり、反応器を処理量に対し
て、非常に大きくするか、処理ｉｔ少くするかしか方法
がなく、いすｎも工業的な方法とは言い難い。また、こ
の方法においては反応温度を高くすると副生ずるパー７
０ロカーボンとＮＦ、 とが爆発する危険性があるな
ど、情々の問題点を有している。(Method of reacting with carbon) The reaction formula in this method is as follows: NF, , C-me, N-F4, CF<, C!F4 Since the product is gaseous, the above (1) N, F, which has urban nature and explosiveness, although there is no such thing as a method.
However, it is necessary to make the contact time between carbon and NF extremely long, and the only way to do this is to make the reactor very large in relation to the throughput, or to reduce the throughput. There is no such thing as IsuN, and it is hard to say that it is an industrial method. In addition, in this method, when the reaction temperature is raised, par-7 is produced as a by-product.
There are serious problems, such as the danger that zero carbon and NF may explode.
〔問題点を解決するための具体的十最〕本発明は前記し
た従来法の問題点を一掃した工業的なＮＦ、の除害方法
を提供するものであり、具体的には、ＮＦ、 ’（ｉ−
含むガスをＳｉ、Ｂ、 嶌Ｍｏ、ｖｌＦＪｅ。[Ten specific ways to solve the problem] The present invention provides an industrial method for eliminating NF, which eliminates the problems of the conventional method described above. (i-
Containing gases include Si, B, Mo, and vIFJe.
Ｔｅ、Ｇｅ およびこれらの非唆化・物系化合物の中
から選ばれる少なくとも１種と２００〜８００℃ の範
囲で反応させ、侍られるフッ化物ガスを補集することを
特徴とするＮＦ３の除害方法である。NF3 abatement characterized by reacting with Te, Ge, and at least one selected from these non-stimulating compounds at a temperature of 200 to 800°C to collect the fluoride gas that is present. It's a method.
本発明は、ＮＦ、を処理剤と反応させ対応するフッ化物
ガスとＮ２ を優る工程と、得られるフッ化物ガスを
補集する工程とよりなるものであり、第１段で用いる処
理剤はいずれもＮＦ、 と容易に反応して１９１Ｆ、
、ＢＦ３ 、ＷＴｌ’−１Ｍ０Ｆ＠、ＶＦｓ、 ５ｅＦ
ｓ、ＴｅＦｓ 、 ＧｅＦ４ として排量されるが、
こｊＬらはいずれも、常温で十分な蒸気圧金有し、ガス
状で取扱えるため、前述の（１） の方法において問
題となる反応の阻害閉塞粉じんの発生等によるトラブル
は全くない。また、毒性、爆発性を有するＮ、Ｆ、
の副生もなく、いずれも高温（ＣおいてもＮＦ３との爆
発の危険性もなく、極めて安全である。用いる処理剤と
しては、価格面ではＳｌが最も安価であり最適の処理剤
といえる。本発明で処理するＮＦ３ガスは、ＮＦ’、
１００％は勿論のこと、Ｎｌ、Ａｒ％Ｈｅ等の不活性ガ
スで希釈されたＢＦ３を含むガスについても勿論速用可
能である。The present invention consists of a step in which NF is reacted with a processing agent and the corresponding fluoride gas is superior to N2, and a step in which the obtained fluoride gas is collected. also easily reacts with NF, 191F,
, BF3, WTl'-1M0F@, VFs, 5eF
It is emitted as s, TeFs, GeF4,
All of these metals have sufficient vapor pressure at room temperature and can be handled in a gaseous state, so there are no problems such as generation of reaction-inhibiting, clogging dust, etc., which are problems in method (1) above. In addition, N, F, which is toxic and explosive,
There is no by-product, and there is no risk of explosion with NF3 even at high temperatures (C), making it extremely safe.As for the processing agent to be used, Sl is the cheapest and can be said to be the optimal processing agent. .NF3 gas treated in the present invention includes NF',
Not only 100% but also a gas containing BF3 diluted with an inert gas such as Nl or Ar%He can be used quickly.
また、反応温度は、用いる処理剤のＮ類によっても差が
あるが、一般に２００〜８００ ’Ｃ，より好筐しくは
、３００〜６００ ’Ｃの範囲が選ばれる。また、接触
時間は用いる処理剤の反応性によｐ、ｏ、１秒〜数時間
の範囲で適宜選択すればよい。また、圧力は、加圧下で
あれば反応は促進されるが、大気圧もしくは減圧下でも
十分な速度で除害できるため、時に制限されない。Although the reaction temperature varies depending on the N-class treatment agent used, it is generally in the range of 200 to 800'C, more preferably 300 to 600'C. Further, the contact time may be appropriately selected from p, o, 1 second to several hours depending on the reactivity of the processing agent used. In addition, although the reaction is accelerated under increased pressure, the reaction can be removed at a sufficient rate even under atmospheric pressure or reduced pressure, so it is not limited in some cases.
反応器としては、気体、固体を接触させるものであれば
、特に制限はないが、強制循環式、固定床流通式、流動
層式などの固気接触良好な反応器が轡に好ましい。また
その材質はニッケル、モネル等の耐フツ素性材料が好ま
しい。The reactor is not particularly limited as long as it brings gas and solid into contact, but reactors with good solid-gas contact such as forced circulation type, fixed bed flow type, and fluidized bed type are preferred. The material is preferably a fluorine-resistant material such as nickel or monel.
第１段の反応で生成したフッ化物およびＮ！戊次いでフ
ッ化物ガスの補集工程で処理される。Fluoride produced in the first stage reaction and N! This is then treated with a fluoride gas collection step.
その方式は、従来公知の桟々の方式が可能であり、例え
ば、水もしくはアルカリ性水溶液によるスクラッピング
、ソーダライム、ＫＯＨ，ＮａＯＨ，Ｃａｂ。The method can be a conventional method such as scraping with water or an alkaline aqueous solution, soda lime, KOH, NaOH, Cab.
０ａ（ＯＨ）、等のアルカリ祷固体およびＮａＦ、ゼオ
ライト等の吸着性を有する固体との接触により容易に除
去することができ、最終的にはＮＦ、を１０ｐｐｍ以下
まで効果的に除去することができるものである。It can be easily removed by contact with alkaline solids such as Oa(OH) and adsorbent solids such as NaF and zeolite, and ultimately NF can be effectively removed to 10 ppm or less. It is possible.
以下本発明を実施例により詳細に神明する。The present invention will be explained in detail by examples below.
実施例１
直径１インチ、長さ２ｍのＮ１パイプに粒状金属シリコ
ンＩ Ｋｇ を充てんし、外部ヒーターで５００℃ま
で昇温させた後、１００ｙ；のＮＦ、全３を声で供給し
た。出口ガスの組成はＮＦ、 が２ ｐｐｍで、他は
Ｎ、とＳｉＦ４ であった。さらにこのガスを直径４
インチ高さ１ｍにラツシリングを充てんしたスクラバー
に供給し、２０％ＫＯＨ水溶液で、洗浄したところ排ガ
スのフッ案分は３ｐｐｍであった。Example 1 A N1 pipe with a diameter of 1 inch and a length of 2 m was filled with granular metal silicon I Kg and heated to 500° C. using an external heater, and then 100 y of NF was supplied by voice. The composition of the outlet gas was 2 ppm of NF, and the others were N and SiF4. Furthermore, this gas has a diameter of 4
When the exhaust gas was supplied to a scrubber filled with a lacquer ring to a height of 1 m and washed with a 20% KOH aqueous solution, the proportion of fluorine in the exhaust gas was 3 ppm.
実施例２
実施例１と同様の反応器に、粒状金憾シリコンをＩＫｇ
充てんし、外部ヒーターで５００℃まア昇温させた後Ａ
ｒ で希釈した１％のＮＦ３を２ｆ１７ｋｉａで併給
した。出口ガスの組成は、ＮＦ、が２！ｐｐｍで他はＮ
、と８１ Ｆ４ であった。さらに、このガスを、直
径２インチ高さ１ｍのステンレス管にソーダライムを充
てんし外部ヒーターで１５０℃まで昇温させた後、供給
したところ排ガスのフッ前号は、４ｐｐｍ でめった
。Example 2 In a reactor similar to Example 1, IKg of granular gold silicon was added.
After filling and raising the temperature to 500℃ using an external heater A
2f17kia was co-fed with 1% NF3 diluted in r. The composition of the exit gas is NF, 2! ppm and others are N
, and 81 F4. Furthermore, when this gas was supplied after filling a stainless steel tube with a diameter of 2 inches and a height of 1 m with soda lime and raising the temperature to 150°C using an external heater, the exhaust gas concentration was 4 ppm.
実施例３
実施例１と同様の反応器に、粒状ホウ素Ｉ Ｋｇを充て
んし外部ヒーターで４５０℃ まで昇温させたＨｌｈｒ
で希釈した５０％ＮＦ３を４見、＾で供給した。出
口ガスの組成はＮＦ３が３ｐｐｍ で、他はＮｔ（！
：ＢＦｓであった。さらに、このガスを実施例２と同様
のソーダライム管を１００℃まで昇温さぞた後、供給し
たところ排ガスのフッ前号は４ｐｐｍであった。Example 3 A reactor similar to Example 1 was filled with I kg of granular boron and heated to 450°C using an external heater.
50% NF3 diluted with water was supplied at 4 times. The composition of the outlet gas is 3 ppm of NF3, and the rest is Nt (!
:BFs. Furthermore, when this gas was supplied after raising the temperature to 100° C. through a soda lime tube similar to that in Example 2, the amount of fluorine in the exhaust gas was 4 ppm.
実施例４
実施例］と同様の反応器にｃｈｉｐ状のタングステン６
Ｋｇ を充てんし、外部ヒーターで６００℃まで昇
温させた後、１００％のＮＦ’３を５１２４−で供給し
た。出口ガスの組成は、 ＮＦ、が５ ｐｐｍ″′ｃ。Example 4 Chip-shaped tungsten 6 was placed in a reactor similar to Example 4.
After filling with Kg and raising the temperature to 600°C using an external heater, 100% NF'3 was supplied at 5124-. The composition of the outlet gas is NF, 5 ppm''c.
他はＮ！とＷｌｉａであった。さらにこのガスを実施例
！と同様のスクラバーに供給し、２０％ＫＯＨ水溶液で
清浄したところ排ガスのフッ前号は３ｐｐｍであった。Others are N! and Wlia. Further examples of this gas! When the exhaust gas was supplied to a similar scrubber and cleaned with a 20% KOH aqueous solution, the flue gas concentration was 3 ppm.
実施例５〜９
実施例１においてＳｌ のかわりに、 Ｍｏ、■、Ｇｅ
。Examples 5 to 9 In Example 1, instead of Sl, Mo, ■, Ge
.
Ｆ１ａおよびＴｅ を用い実施した。その柔性および
Ｖ−果を４１表に示した
〔発明の効果〕
不発明によればＮＰ１ｆｔ含むガスを十分に除去できる
とともに、爆発性を有するガスの副生もなく安全に実施
することができるものである。It was carried out using F1a and Te. Its flexibility and V-effects are shown in Table 41. [Effects of the Invention] According to the invention, gas containing 1 ft of NP can be sufficiently removed, and the process can be carried out safely without producing any explosive gas as a by-product. It is.
Claims (1)
Ｔｅ、Ｇｅおよびこれらの非酸化物系化合物の中から選
ばれる少くとも１種と２００〜８００℃の範囲で反応さ
せ、得られるフッ化物ガスを補集することを特徴とする
ＮＦ＿３の除害方法。The gas containing NF_3 is Si, B, W, Mo, V, Se,
A method for abatement of NF_3, characterized by reacting with at least one selected from Te, Ge and these non-oxide compounds in the range of 200 to 800°C and collecting the obtained fluoride gas. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60042580A JPS61204025A (en) | 1985-03-06 | 1985-03-06 | Method for removing harm of nf3 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60042580A JPS61204025A (en) | 1985-03-06 | 1985-03-06 | Method for removing harm of nf3 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61204025A true JPS61204025A (en) | 1986-09-10 |
| JPS6348570B2 JPS6348570B2 (en) | 1988-09-29 |
Family
ID=12640005
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60042580A Granted JPS61204025A (en) | 1985-03-06 | 1985-03-06 | Method for removing harm of nf3 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61204025A (en) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0382986A1 (en) * | 1989-02-13 | 1990-08-22 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Method and apparatus for detoxicating halide of nitrogen or carbon |
| JPH02245223A (en) * | 1989-03-20 | 1990-10-01 | Mitsui Toatsu Chem Inc | Treatment of nitrogen fluoride-containing waste gas |
| JPH03202128A (en) * | 1989-12-28 | 1991-09-03 | Ebara Res Co Ltd | Removal of nf3 |
| US5213767A (en) * | 1988-06-04 | 1993-05-25 | Boc Limited | Dry exhaust gas conditioning |
| US5417934A (en) * | 1988-06-04 | 1995-05-23 | Boc Limited | Dry exhaust gas conditioning |
| EP0666101A1 (en) * | 1994-02-03 | 1995-08-09 | MITSUI TOATSU CHEMICALS, Inc. | Exhaust gas treating agent and a method of treating exhaust gas using the agent |
| US5486340A (en) * | 1989-12-02 | 1996-01-23 | The Boc Group Plc | Exhaust gas conditioning |
| EP0771579A1 (en) * | 1995-10-30 | 1997-05-07 | Central Glass Company, Limited | Method for decomposing halide-containing gas |
| US6106790A (en) * | 1997-08-18 | 2000-08-22 | Air Products And Chemicals, Inc. | Abatement of NF3 using small particle fluidized bed |
| EP1043058A1 (en) * | 1999-04-09 | 2000-10-11 | Central Glass Company, Limited | NF3 treating process |
| US6921519B2 (en) | 2001-01-24 | 2005-07-26 | Ineos Fluor Holdings Limited | Decomposition of fluorine containing compounds |
-
1985
- 1985-03-06 JP JP60042580A patent/JPS61204025A/en active Granted
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0419507B1 (en) * | 1988-06-04 | 2000-07-19 | Boc Limited | Dry exhaust gas conditioning |
| US5213767A (en) * | 1988-06-04 | 1993-05-25 | Boc Limited | Dry exhaust gas conditioning |
| US5417934A (en) * | 1988-06-04 | 1995-05-23 | Boc Limited | Dry exhaust gas conditioning |
| EP0382986A1 (en) * | 1989-02-13 | 1990-08-22 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Method and apparatus for detoxicating halide of nitrogen or carbon |
| JPH02245223A (en) * | 1989-03-20 | 1990-10-01 | Mitsui Toatsu Chem Inc | Treatment of nitrogen fluoride-containing waste gas |
| US5486340A (en) * | 1989-12-02 | 1996-01-23 | The Boc Group Plc | Exhaust gas conditioning |
| JPH03202128A (en) * | 1989-12-28 | 1991-09-03 | Ebara Res Co Ltd | Removal of nf3 |
| EP0666101A1 (en) * | 1994-02-03 | 1995-08-09 | MITSUI TOATSU CHEMICALS, Inc. | Exhaust gas treating agent and a method of treating exhaust gas using the agent |
| US5728642A (en) * | 1994-02-03 | 1998-03-17 | Mitsui Toatsu Chemicals, Inc. | Exhaust gas treating agent and a method of treating exhaust gas using the agent |
| EP0771579A1 (en) * | 1995-10-30 | 1997-05-07 | Central Glass Company, Limited | Method for decomposing halide-containing gas |
| US6106790A (en) * | 1997-08-18 | 2000-08-22 | Air Products And Chemicals, Inc. | Abatement of NF3 using small particle fluidized bed |
| EP1043058A1 (en) * | 1999-04-09 | 2000-10-11 | Central Glass Company, Limited | NF3 treating process |
| US6342194B1 (en) | 1999-04-09 | 2002-01-29 | Central Glass Company, Limited | NF3 treating process |
| US6921519B2 (en) | 2001-01-24 | 2005-07-26 | Ineos Fluor Holdings Limited | Decomposition of fluorine containing compounds |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6348570B2 (en) | 1988-09-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |