JP2812830B2 - How to remove NF (3) - Google Patents

How to remove NF (3)

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Publication number
JP2812830B2
JP2812830B2 JP4007822A JP782292A JP2812830B2 JP 2812830 B2 JP2812830 B2 JP 2812830B2 JP 4007822 A JP4007822 A JP 4007822A JP 782292 A JP782292 A JP 782292A JP 2812830 B2 JP2812830 B2 JP 2812830B2
Authority
JP
Japan
Prior art keywords
copper
nickel
compound
activated carbon
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP4007822A
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Japanese (ja)
Other versions
JPH05192538A (en
Inventor
昌弘 久保
伸介 中川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
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Priority to JP4007822A priority Critical patent/JP2812830B2/en
Publication of JPH05192538A publication Critical patent/JPH05192538A/en
Application granted granted Critical
Publication of JP2812830B2 publication Critical patent/JP2812830B2/en
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、NF3 を含む排ガスの
除害方法に関するものである。
The present invention relates to relates to a detoxifying method exhaust gas containing NF 3.

【0002】[0002]

【従来の技術】NF3 は、半導体工業の発展とともにド
ライエッチング剤、クリーニング剤としてその需要が急
速に伸びている。一方、NF3 は、常温では大気中にお
いて極めて安定であり、水にわずかしか溶解しない。ま
た、TLV10ppmの毒性ガスであるため、これを使
用する場合には残ガス等の排気の際にその除害が常に必
要となる。
2. Description of the Related Art With the development of the semiconductor industry, the demand for NF 3 is rapidly increasing as a dry etching agent and a cleaning agent. NF 3 , on the other hand, is extremely stable in air at room temperature and is only slightly soluble in water. In addition, since it is a toxic gas having a TLV of 10 ppm, when it is used, it must always be harmed when exhausting residual gas and the like.

【0003】NF3 は、常温付近では非常に安定である
が、高温ではN2 と活性なF原子に分解する。これまで
に開発されたNF3 を除害する方法は、この原理に基づ
いたものである。
NF 3 is very stable around normal temperature, but decomposes at high temperature into N 2 and active F atoms. How abating NF 3 so far developed are based on this principle.

【0004】具体的には、 Si、B、W、Mo、V、Se、Te、Geと200
〜800℃で反応させる方法(特公昭63-48570号) 金属チタンと200℃以上で反応させる方法(特公昭
63-48571号) 木炭等の炭素塊と300〜600℃で反応させる方法
(特公平2-30731 号) 遷移金属の酸化物と250℃以上で反応させる方法
(特開平3-181316号)等がある。また、これらの方法よ
り低い温度で除害する方法として 金属ハロゲン化物と40〜80℃で反応させる方法
(特公昭63-48569号) 水素と混合し還元触媒と130〜180℃の範囲で接
触させる方法(特開平2-303524号)等がある。
[0004] Specifically, Si, B, W, Mo, V, Se, Te, Ge and 200
Method to react at ~ 800 ° C (Japanese Patent Publication No. 63-48570)
63-48571) A method of reacting with a carbon lump such as charcoal at 300 to 600 ° C (Japanese Patent Publication No. 2-30731). A method of reacting with a transition metal oxide at 250 ° C or higher (Japanese Patent Application Laid-Open No. 3-181316). is there. As a method of removing harm at a lower temperature than these methods, a method of reacting with a metal halide at 40 to 80 ° C (Japanese Patent Publication No. 63-48569) is mixed with hydrogen and contacted with a reducing catalyst in a range of 130 to 180 ° C. Method (JP-A-2-303524).

【0005】[0005]

【発明が解決しようとする問題点】〜の方法はいず
れも高温が必要であるため大がかりなヒータ・保温が必
要で、装置が大きくなり、取扱いが不便でコストが高い
等の問題がある。そのため少しでも低い温度で除害でき
る方法の開発が望まれている。の方法は本発明と類似
であるが、本発明のような200℃程度の反応温度でN
3 は除害できない。250℃以上の反応温度でNF3
は除害できるというものの、生成物としてNO、NO2
が発生し、それを除去するための設備が別に必要とな
り、装置が複雑になるという問題がある。
All of the methods (1) to (4) require a high temperature and thus require a large amount of heater and heat retention, have a problem that the apparatus is large, the handling is inconvenient, and the cost is high. Therefore, the development of a method capable of removing harm at a low temperature is desired. Is similar to the present invention, but at a reaction temperature of about 200 ° C. as in the present invention.
F 3 can not abatement. NF 3 at a reaction temperature of 250 ° C or higher
Can be harmed, but NO, NO 2
Occurs, and equipment for removing it is required separately, and there is a problem that the apparatus becomes complicated.

【0006】およびの方法は、〜の方法よりも
低温でNF3 を除害できるが、の方法においては金属
ハロゲン化物は、その吸湿性のために取扱いが非常に困
難であり、の方法においては使用する水素が、NF3
と爆発範囲を形成し、また、生成物としてHFが発生す
る等の問題がある。
The methods (1) and (2) can remove NF 3 at a lower temperature than the methods (1) to ( 3) , but in the method (3), the metal halide is very difficult to handle because of its hygroscopicity. The hydrogen used is NF 3
And an explosion range, and HF is generated as a product.

【0007】[0007]

【問題点を解決するための手段】本発明者らは、これら
の問題点について種々検討の結果、NF3 を含むガスと
銅化合物または/およびニッケル化合物を添着させた活
性炭と接触、反応させることによりNF3 を除害できる
方法を見出し本発明に到達した。
As a result of various studies on these problems, the present inventors have found that a gas containing NF 3 is brought into contact with and reacted with activated carbon impregnated with a copper compound and / or a nickel compound. Thus, the present inventors have found a method capable of removing NF 3, and have reached the present invention.

【0008】すなわち本発明は、NF3 を含むガスと銅
化合物または/およびニッケル化合物を添着させた活性
炭とを100〜300℃の温度範囲で接触させ、銅化合
物または/およびニッケル化合物との反応により分解除
去することを特徴とするNF 3 の除害方法であり、かつ
銅化合物または/およびニッケル化合物を添着させた活
性炭は、100℃以上の温度で焼成することを特徴とす
るNF3 の除害方法である。
That is, the present invention provides an NFThreeContaining gas and copper
Activity impregnated with compound or / and nickel compound
Contact with charcoal at a temperature in the range of 100 to 300 ° C.
Release by reacting with substances and / or nickel compounds
NF characterized by leaving ThreeMethod of abatement, and
Activity with copper compound and / or nickel compound impregnated
The charcoal is characterized in that it is fired at a temperature of 100 ° C. or more.
NFThreeIt is an abatement method.

【0009】本発明は、NF3 を含むガスと銅化合物ま
たは/およびニッケル化合物を添着させた活性炭とを1
00〜300℃の温度範囲で接触させ、銅化合物または
/およびニッケル化合物との反応によりNF3 を分解除
去するものであるが、100℃より低い場合は、反応速
度が遅く分解が不十分となり好ましくない。また、30
0℃以上になるとNF3 を分解除去できるもののNF3
が活性炭と反応し、CF4 、C2 6 等のガス(有毒で
はないが、地球温暖化の問題がある)が生成するため好
ましくない。特に、好ましくは150〜250℃の範囲
で反応させるのが最適である。分解されたNF3 のFは
銅または/およびニッケルのフッ化物として固定され、
NはN2 として排出される。
According to the present invention, a gas containing NF 3 and an activated carbon to which a copper compound and / or a nickel compound are impregnated are used.
The NF 3 is decomposed and removed by contact with a copper compound and / or a nickel compound in a temperature range of from 00 to 300 ° C. When the temperature is lower than 100 ° C., the reaction rate is slow and the decomposition is insufficient. Absent. Also, 30
NF 3 but becomes the 0 ℃ more NF 3 decomposition can be removed
Reacts with activated carbon and generates gases such as CF 4 and C 2 F 6 (which are not toxic but have a problem of global warming), which is not preferable. In particular, it is most preferable to carry out the reaction in the range of preferably 150 to 250 ° C. F of the decomposed NF 3 is fixed as fluoride of copper and / or nickel,
N is discharged as N 2.

【0010】本発明に用いる銅化合物としては、硫酸
銅、硝酸銅等の酸素酸銅、酢酸銅、シュウ酸銅等の有機
酸銅等を用いることができる。また、ニッケル化合物と
しては、硫酸ニッケル、硝酸ニッケル等の酸素酸ニッケ
ル、酢酸ニッケル、シュウ酸ニッケル等の有機酸ニッケ
ル等を用いることができる。
As the copper compound used in the present invention, copper oxyacids such as copper sulfate and copper nitrate, and organic acid coppers such as copper acetate and copper oxalate can be used. As the nickel compound, nickel oxyacids such as nickel sulfate and nickel nitrate, nickel organic acids such as nickel acetate and nickel oxalate can be used.

【0011】銅化合物または/およびニッケル化合物を
活性炭に添着させる方法は、まず銅化合物または/およ
びニッケル化合物を水、アルコ−ル等の溶媒に溶かし溶
液とする。その中に活性炭を投入し銅化合物または/お
よびニッケル化合物の溶液を十分に含浸させた後、10
0℃以上で焼成し、活性炭に銅化合物または/およびニ
ッケル化合物を添着させる。含浸させる方法は、前記の
溶液中に活性炭を投入する方法のほか、活性炭を十分に
脱気した後、溶液を流入させ加圧する方法や活性炭に溶
液をスプレー散布する方法等があり、いずれの方法を用
いてもよい。これを100℃以上の温度で焼成したもの
を用いる。焼成したものは、X線回折から、金属銅また
は/および金属ニッケルが検出されたが、銅と活性炭ま
たは/およびニッケルと活性炭の活性化された反応物あ
るいは混合物であり、単に銅と活性炭または/およびニ
ッケルと活性炭との混合物とは効果が異なるものであ
る。焼成温度は、600℃以上で焼成しても除害効果に
変わりなく経済的に不利となり、100℃以下すなわち
反応温度以下の温度では除害効果が得られず好ましくな
い。また、焼成時間は、焼成する量によって異なるため
一概には言えないが、短いと除害効果が不十分で、長く
なると経済的に不利となる。好ましくは2〜5時間が最
適である。
In the method of attaching a copper compound or / and a nickel compound to activated carbon, a copper compound or / and a nickel compound are first dissolved in a solvent such as water or alcohol to form a solution. Activated carbon is charged therein and sufficiently impregnated with a solution of a copper compound and / or a nickel compound.
Calcination is carried out at 0 ° C. or higher to impregnate the activated carbon with a copper compound and / or a nickel compound. The method of impregnation includes, besides the method of charging activated carbon into the solution, a method of injecting the solution after sufficiently degassing the activated carbon, a method of injecting the solution and a method of spraying the solution on the activated carbon, and the like. May be used. This is fired at a temperature of 100 ° C. or higher. In the fired product, metallic copper and / or metallic nickel was detected from X-ray diffraction, but was an activated reactant or mixture of copper and activated carbon or / and nickel and activated carbon, and was simply copper and activated carbon or / And a mixture of nickel and activated carbon has a different effect. The baking temperature of 600 ° C. or higher is economically disadvantageous without changing the abatement effect, and a baking temperature of 100 ° C. or lower, that is, a reaction temperature or lower is not preferable because the abatement effect cannot be obtained. The firing time varies depending on the amount to be fired, and cannot be unconditionally determined. However, if the firing time is short, the abatement effect is insufficient, and if the firing time is long, it is economically disadvantageous. Preferably, 2 to 5 hours are optimal.

【0012】本発明で処理するNF3 ガスは、N2 、A
r、He等の不活性ガスで希釈されたNF3 を含むガス
はもちろんのこと、NF3 100%ガスについても適用
可能である。
The NF 3 gas treated in the present invention is N 2 , A
The present invention is applicable not only to a gas containing NF 3 diluted with an inert gas such as r or He, but also to a 100% NF 3 gas.

【0013】また、接触時間は0. 1秒〜数時間の範囲
で適宜選択すればよい。また、圧力は、加圧下であれば
反応は促進されるが、大気圧もしくは減圧下でも十分な
速度で除害できるため、特に制限されない。
The contact time may be appropriately selected within a range from 0.1 second to several hours. The pressure is not particularly limited, since the reaction is promoted if the pressure is increased, but it can be removed at a sufficient rate even under atmospheric pressure or reduced pressure.

【0014】反応器としては、気体、固体を接触させる
ものであれば、特に制限はないが、強制循環式、固定床
流通式、流動層式などの固気接触良好な反応器が特に好
ましい。またその材質は、SUS、ニッケル、モネル、
銅等が好ましい。
The reactor is not particularly limited as long as it allows gas and solids to be brought into contact, but a reactor having good solid-gas contact, such as a forced circulation system, a fixed bed circulation system or a fluidized bed system, is particularly preferred. The material is SUS, nickel, Monel,
Copper and the like are preferred.

【0015】[0015]

【実施例】以下、実施例によって本発明を詳細に説明す
る。 実施例 1 銅化合物として酢酸銅(II)一水和物を用い、その10
gを水100gに溶解させた酢酸銅水溶液に活性炭20
gを投入し十分に攪拌した後加熱し、水を蒸発・乾固さ
せ、活性炭に酢酸銅を添着させた。これを1/2インチ
Φ、長さ500mmのSUS製反応管に充填し、500
℃、4時間焼成した。この反応管を200℃に保持し、
そこに2%NF3 を125cc/minの速度で導入し
た。反応器出口ガスをガスクロマトグラフで分析した結
果、NF3 濃度は10ppm以下であった。また、IR
で分析した結果、CF4 、C2 6 、NO、NO2 等の
生成物は検出されなかった。
The present invention will be described below in detail with reference to examples. Example 1 Copper (II) acetate monohydrate was used as a copper compound,
g of activated carbon in an aqueous solution of copper acetate in which
g, and the mixture was sufficiently stirred and heated. The water was evaporated and dried, and activated carbon was impregnated with copper acetate. This is filled into a SUS reaction tube having a length of 1/2 inch and a length of 500 mm.
C. for 4 hours. The reaction tube was kept at 200 ° C.
There, 2% NF 3 was introduced at a rate of 125 cc / min. As a result of analyzing the gas at the reactor outlet by gas chromatography, the NF 3 concentration was 10 ppm or less. Also, IR
As a result, no products such as CF 4 , C 2 F 6 , NO, and NO 2 were detected.

【0016】実施例 2 実施例1と同じ方法で調整した薬剤を用いて10%NF
3 を125cc/minの速度で導入し200℃で処理
した。反応器出口ガスにはNF3 はもちろんのこと、そ
の他の副生ガスは検出されなかった。
Example 2 10% NF using a drug prepared in the same manner as in Example 1
3 was introduced at a rate of 125 cc / min and treated at 200 ° C. NF 3 as well as other by-product gases were not detected in the reactor outlet gas.

【0017】実施例3 実施例1と同じ条件で活性炭に酢酸銅を添着させ、20
0℃で2時間焼成した薬剤を用いて、実施例1と同じ温
度、濃度、流量でNF3 と反応させた。反応器出口ガス
にはNF3 はもちろんのこと、その他の副生ガスは検出
されなかった。
Example 3 Activated carbon was impregnated with copper acetate under the same conditions as in Example 1;
Using a drug calcined at 0 ° C. for 2 hours, NF 3 was reacted at the same temperature, concentration and flow rate as in Example 1. NF 3 as well as other by-product gases were not detected in the reactor outlet gas.

【0018】実施例 4 銅化合物として硝酸銅を用い、その10gを水60gに
溶解させた硝酸銅水溶液に活性炭20gを投入し十分に
攪拌した後加熱し、水を蒸発・乾固させ、活性炭に硝酸
銅を添着させた。これを1/2インチΦ、長さ500m
mのSUS製反応管に充填し、500℃、4時間焼成し
た。この反応管を200℃に保持し、そこに2%NF3
を125cc/minの速度で導入した。反応器出口ガ
スをガスクロマトグラフで分析した結果、NF3 はもち
ろんのこと、その他の副生ガスは検出されなかった。
Example 4 Copper nitrate was used as a copper compound, 20 g of activated carbon was added to an aqueous solution of copper nitrate in which 10 g was dissolved in 60 g of water, and the mixture was sufficiently stirred, heated, and evaporated to dryness to form activated carbon. Copper nitrate was impregnated. This is 1/2 inch Φ, length 500m
m, and fired at 500 ° C. for 4 hours. The reaction tube was kept at 200 ° C., and 2% NF 3
Was introduced at a rate of 125 cc / min. As a result of analyzing the outlet gas of the reactor by gas chromatography, not only NF 3 but also other by-product gases were not detected.

【0019】実施例 5 ニッケル化合物として酢酸ニッケルを用い、その6gを
水10gに溶解させた酢酸ニッケル水溶液に活性炭20
gを投入し十分に攪拌した後加熱し、水を蒸発・乾固さ
せ、活性炭に酢酸ニッケルを添着させた。これを1/2
インチΦ、長さ500mmのSUS製反応管に充填し、
500℃、4時間焼成した。この反応管を200℃に保
持し、そこに2%NF3 を125cc/minの速度で
導入した。反応器出口ガスをガスクロマトグラフで分析
した結果、NF3 はもちろんのこと、その他の副生ガス
は検出されなかった。
Example 5 Nickel acetate was used as a nickel compound, and activated carbon 20 was added to a nickel acetate aqueous solution in which 6 g was dissolved in 10 g of water.
g, and the mixture was sufficiently stirred and heated. The water was evaporated and dried, and activated carbon was impregnated with nickel acetate. This is 1/2
Fill into a SUS reaction tube of inch Φ, length 500mm,
It baked at 500 degreeC for 4 hours. The reaction tube was maintained at 200 ° C., and 2% NF 3 was introduced therein at a rate of 125 cc / min. As a result of analyzing the outlet gas of the reactor by gas chromatography, not only NF 3 but also other by-product gases were not detected.

【0020】実施例 6 銅化合物として酢酸銅、ニッケル化合物として酢酸ニッ
ケルを用い、それぞれ4gと3gを水100gに溶解さ
せた酢酸銅・酢酸ニッケル水溶液に活性炭20gを投入
し十分に攪拌した後加熱し、水を蒸発・乾固させ、活性
炭に酢酸銅・酢酸ニッケルを添着させた。これを1/2
インチΦ、長さ500mmのSUS製反応管に充填し、
500℃、4時間焼成した。この反応管を200℃に保
持し、そこに2%NF3 を125cc/minの速度で
導入した。反応器出口ガスをガスクロマトグラフで分析
した結果、NF3 はもちろんのこと、その他の副生ガス
は検出されなかった。
Example 6 Using copper acetate as a copper compound and nickel acetate as a nickel compound, 20 g of activated carbon was added to a copper acetate / nickel acetate aqueous solution in which 4 g and 3 g were dissolved in 100 g of water, and the mixture was sufficiently stirred and heated. Then, the water was evaporated and dried, and copper acetate / nickel acetate was impregnated on the activated carbon. This is 1/2
Fill into a SUS reaction tube of inch Φ, length 500mm,
It baked at 500 degreeC for 4 hours. The reaction tube was maintained at 200 ° C., and 2% NF 3 was introduced therein at a rate of 125 cc / min. As a result of analyzing the outlet gas of the reactor by gas chromatography, not only NF 3 but also other by-product gases were not detected.

【0021】比較例 1 酢酸銅を添着していない活性炭を反応管に充填し、実施
例1と同じ温度、濃度、流量でNF3 と反応させた。出
口ガスを分析した結果、入口と同じ濃度のNF 3 が検出
され、NF3 は全く分解されていなかった。
Comparative Example 1 Activated carbon not impregnated with copper acetate was filled in a reaction tube, and
NF at the same temperature, concentration and flow rate as in Example 1ThreeAnd reacted. Out
As a result of analyzing the mouth gas, NF with the same concentration as the inlet ThreeIs detected
NFThreeHad not been decomposed at all.

【0022】比較例 2 銅を反応管に充填し水素で還元した後、実施例1と同じ
温度、濃度、流量でNF3 と反応させた。出口ガスを分
析した結果、入口と同じ濃度のNF3 が検出され、NF
3 は分解されていなかった。
Comparative Example 2 After filling copper in a reaction tube and reducing it with hydrogen, it was reacted with NF 3 at the same temperature, concentration and flow rate as in Example 1. As a result of analyzing the outlet gas, NF 3 having the same concentration as that of the inlet was detected, and NF 3 was detected.
3 had not been disassembled.

【0023】比較例 3 銅6wt%を混合した活性炭を反応管に充填し、実施例
1と同じ温度、濃度、流量でNF3 と反応させた。出口
ガスを分析した結果、入口と同じ濃度のNF3 が検出さ
れ、NF3 は分解されていなかった。
Comparative Example 3 Activated carbon mixed with 6 wt% of copper was filled in a reaction tube and reacted with NF 3 at the same temperature, concentration and flow rate as in Example 1. As a result of analyzing the outlet gas, NF 3 having the same concentration as that of the inlet was detected, and NF 3 was not decomposed.

【0024】比較例 4 実施例1と同じ条件で調整した薬剤を充填した反応管を
320℃に加熱し、実施例1と同じ濃度、流量のNF3
を処理した。出口ガスを分析した結果、NF3 は検出さ
れなかったが、CF4 が200ppm検出された。
Comparative Example 4 A reaction tube filled with a drug prepared under the same conditions as in Example 1 was heated to 320 ° C., and NF 3 having the same concentration and flow rate as in Example 1 was used.
Was processed. As a result of analyzing the outlet gas, NF 3 was not detected, but 200 ppm of CF 4 was detected.

【0025】[0025]

【発明の効果】本発明によればNF3 を含む排ガスを従
来の方法よりも低温で、副生ガスの発生なしに除害する
ことを可能にした。
According to the present invention, it is possible to remove NF 3 -containing exhaust gas at a lower temperature than the conventional method without generating by-product gas.

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6,DB名) B01D 53/68 B01D 53/54──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 6 , DB name) B01D 53/68 B01D 53/54

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】NF3 を含むガスと銅化合物または/およ
びニッケル化合物を添着させた活性炭とを100〜30
0℃の温度範囲で接触させ、銅化合物または/およびニ
ッケル化合物との反応により分解除去することを特徴と
するNF3 の除害方法。
1. A gas containing NF 3 and activated carbon impregnated with a copper compound and / or a nickel compound are mixed in an amount of 100 to 30%.
A method for removing NF 3 , comprising contacting at a temperature of 0 ° C. and decomposing and removing it by reaction with a copper compound and / or a nickel compound.
【請求項2】上記銅化合物または/およびニッケル化合
物を添着させた活性炭は、100℃以上の温度で焼成す
ることを特徴とする請求項1記載のNF3 の除害方法。
2. The method for removing NF 3 according to claim 1, wherein the activated carbon to which the copper compound and / or the nickel compound is attached is calcined at a temperature of 100 ° C. or higher.
【請求項3】上記銅化合物または/およびニッケル化合
物が、酸素酸銅、有機酸銅、酸素酸ニッケル、有機酸ニ
ッケルであることを特徴とする請求項1記載のNF3
除害方法。
Wherein said copper compound and / or nickel compounds, oxygen copper, organic copper, oxygen, nickel, abatement method NF 3 according to claim 1, characterized in that the organic acid nickel.
JP4007822A 1992-01-20 1992-01-20 How to remove NF (3) Expired - Fee Related JP2812830B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4007822A JP2812830B2 (en) 1992-01-20 1992-01-20 How to remove NF (3)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4007822A JP2812830B2 (en) 1992-01-20 1992-01-20 How to remove NF (3)

Publications (2)

Publication Number Publication Date
JPH05192538A JPH05192538A (en) 1993-08-03
JP2812830B2 true JP2812830B2 (en) 1998-10-22

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Country Link
JP (1) JP2812830B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5993007B2 (en) * 2011-08-15 2016-09-14 エンパイア テクノロジー ディベロップメント エルエルシー Oxalate sorbent for mercury removal

Also Published As

Publication number Publication date
JPH05192538A (en) 1993-08-03

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