JPH10286439A - Decomposing method of fluorine-containing compound - Google Patents

Decomposing method of fluorine-containing compound

Info

Publication number
JPH10286439A
JPH10286439A JP9097154A JP9715497A JPH10286439A JP H10286439 A JPH10286439 A JP H10286439A JP 9097154 A JP9097154 A JP 9097154A JP 9715497 A JP9715497 A JP 9715497A JP H10286439 A JPH10286439 A JP H10286439A
Authority
JP
Japan
Prior art keywords
fluorine
group
containing compound
carrier
alumina
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9097154A
Other languages
Japanese (ja)
Inventor
Takashi Atokuchi
隆 後口
Hirohide Yada
博英 矢田
Tsunemi Sugimoto
常実 杉本
Tokuo Matsuzaki
徳雄 松崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP9097154A priority Critical patent/JPH10286439A/en
Publication of JPH10286439A publication Critical patent/JPH10286439A/en
Pending legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02CCAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00Capture or disposal of greenhouse gases
    • Y02C20/30Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Abstract

PROBLEM TO BE SOLVED: To enable continuous decomposition of a perfluoro compd. by bringing a gaseous fluorine-contg. compd. into contact with molecular oxygen and water in the presence of catalyst prepared by depositing at least one kind of metal selected from among 4A, 5A, 6A, 7A, 8 and 1B groups and 3B groups on a carrier. SOLUTION: When a gaseous fluorine-contg. compd. (such as perfluoro compds. and fluorinated hydrocarbons) is decomposed, the fluorine-contg. compd. is brought into contact with molecular oxygen and water in the presence of a catalyst which is prepared by depositing at least one kind of metal selected from among 4A, 5A, 6A, 7A, 8, 1B and 3B groups on a carrier. As for the carrier, for example, alumina such as γ-alumina is preferably used. Its shape is not limited but properly selected according to the reactor and the reaction method. The amt. of the metal deposited is preferably 0.01 to 20 wt.% calculated as a metal to the carrier. As for the molecular oxygen, air is preferably used.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、含フッ素化合物、
特に半導体工場でのプラズマCVDのチャンバークリー
ニングガス等に使用されているガス状の含フッ素化合物
(パーフルオロ化合物、フッ化炭化水素等)や、冷媒等
に使用されているガス状の含フッ素化合物(フロン等)
の分解法に関する。
The present invention relates to a fluorine-containing compound,
In particular, gaseous fluorinated compounds (perfluoro compounds, fluorinated hydrocarbons, etc.) used for plasma CVD chamber cleaning gas and the like in semiconductor factories, and gaseous fluorinated compounds used for refrigerants and the like ( Freon etc.)
The decomposition method.

【0002】[0002]

【従来の技術】含フッ素化合物(ガス状の含フッ素化合
物)はオゾン層の破壊に関与するなど、地球環境に影響
を及ぼすため、その排出は極力抑える必要がある。この
うち、パーフルオロ化合物(以下、PFCと略する)
は、炭化水素の水素原子が全てフッ素原子で置換された
パーフルオロカーボンなどで、フロンとは異なり塩素を
含まず、かつ非常に安定であるため、オゾン層の破壊に
は関与しないものの、地球温暖化係数が大きく、使用後
の排出は今後規制される可能性がある。
2. Description of the Related Art Since fluorine-containing compounds (gas-containing fluorine-containing compounds) affect the global environment, for example, by being involved in the destruction of the ozone layer, their emission must be suppressed as much as possible. Of these, perfluoro compounds (hereinafter abbreviated as PFC)
Is a perfluorocarbon in which all the hydrogen atoms of hydrocarbons are replaced with fluorine atoms. Unlike fluorocarbons, they do not contain chlorine and are very stable, so they do not contribute to the destruction of the ozone layer, but they do not contribute to global warming. The coefficient is large and emissions after use may be regulated in the future.

【0003】このようなガス状の含フッ素化合物の排出
を抑制するためには、使用後の排ガスを何らかの方法で
回収又は分解する必要があるが、方法の簡便さを考慮す
れば、後者の排ガスを分解処理する方法が好ましい。し
かし、該含フッ素化合物のうち、PFCは非常に安定で
あるため、通常のフロン分解で用いられる方法では処理
が困難である。例えば、燃料と共に燃焼処理して分解す
る方法では、1000℃以上の高温が必要とされるな
ど、実用的にはまだ解決されるべき問題が残されてい
る。また、シリカやゼオライト等を分解剤として用いて
分解する方法(特開平7−116466号公報、同7−
132211号公報)では、PFCを十分な速度で分解
するために同様に1000〜1500℃程度の高温が必
要とされ、更に、粉体の分解剤を供給しながら分解を行
うなど、操作的、装置的にも複雑かつ煩雑であり、更な
る改良が必要である。
[0003] In order to suppress the emission of such gaseous fluorine-containing compounds, it is necessary to recover or decompose the used exhaust gas by some method. However, considering the simplicity of the method, the latter exhaust gas is required. Is preferred. However, among the fluorine-containing compounds, PFC is very stable, so that it is difficult to treat PFC by a method usually used for decomposition of chlorofluorocarbons. For example, in the method of decomposing by burning together with fuel, a high temperature of 1000 ° C. or more is required. In addition, a method of decomposing using silica, zeolite, or the like as a decomposing agent (Japanese Patent Application Laid-Open No. 7-116466,
No. 132211) requires a high temperature of about 1000 to 1500 ° C. in order to decompose PFC at a sufficient rate. It is complicated and complicated, and further improvement is required.

【0004】[0004]

【発明が解決しようとする課題】前記のような技術背景
に鑑み、本発明は、含フッ素化合物(ガス状の含フッ素
化合物)、中でもPFCを連続的に分解できる方法、特
に触媒的に連続分解できる方法を提供することを課題と
する。
SUMMARY OF THE INVENTION In view of the above technical background, the present invention relates to a method capable of continuously decomposing a fluorine-containing compound (a gaseous fluorine-containing compound), especially PFC, and particularly to a method of continuously decomposing catalytically. It is an object to provide a method that can be used.

【0005】[0005]

【課題を解決するための手段】本発明の課題は、ガス状
の含フッ素化合物を、4A族、5A族、6A族、7A
族、8族、1B族、及び3B族から選ばれる少なくとも
一種の金属が担体に担持された触媒の存在下で、分子状
酸素及び水と接触させることを特徴とする含フッ素化合
物の分解法によって達成される。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method for converting a gaseous fluorine-containing compound into a 4A group, a 5A group, a 6A group, and a 7A group.
At least one metal selected from the group consisting of group 8, group 1B and group 3B is brought into contact with molecular oxygen and water in the presence of a catalyst supported on a carrier, Achieved.

【0006】[0006]

【発明の実施の形態】含フッ素化合物としては、半導体
工場でのプラズマCVDのチャンバークリーニングガス
等に使用されているガス状の含フッ素化合物(パーフル
オロ化合物(PFC)、フッ化炭化水素等)や、冷媒等
に使用されているガス状の含フッ素化合物(フロン等)
が使用される。これらの含フッ素化合物(ガス状の含フ
ッ素化合物)は、ヘリウム、アルゴン、窒素等の不活性
ガスで希釈されていてもよく、また、単独であっても二
種以上の混合物であってもよい。
BEST MODE FOR CARRYING OUT THE INVENTION Examples of the fluorine-containing compound include gaseous fluorine-containing compounds (perfluoro compounds (PFC), fluorinated hydrocarbons, etc.) used as plasma CVD chamber cleaning gases in semiconductor factories. Gaseous fluorine-containing compounds used in refrigerants and refrigerants (such as CFCs)
Is used. These fluorinated compounds (gaseous fluorinated compounds) may be diluted with an inert gas such as helium, argon or nitrogen, or may be used alone or as a mixture of two or more. .

【0007】PFCとしては、CF4 、C2 6 、C3
8 等の炭化水素の水素原子が全てフッ素原子で置換さ
れたパーフルオロカーボン(飽和、不飽和を含む)や、
NF 3 等のフッ化窒素や、SF6 等のフッ化硫黄などが
挙げられる。フッ化炭化水素としては、CH3 F、CH
2 2 、(CH2 F)2 等の炭化水素の水素原子の一部
がフッ素原子で置換されたものなどが挙げられる。フロ
ンとしては、C2 Cl3 3 (フロン−113)、C2
Cl2 4 (フロン−114)、C2 ClF5 (フロン
−115)などが挙げられる。
As PFC, CFFour, CTwoF6, CThree
F8All hydrogen atoms of hydrocarbons such as
Perfluorocarbons (including saturated and unsaturated),
NF ThreeSuch as nitrogen fluoride and SF6Such as sulfur fluoride
No. As the fluorinated hydrocarbon, CHThreeF, CH
TwoFTwo, (CHTwoF)TwoPart of hydrogen atoms of hydrocarbons such as
Is substituted with a fluorine atom. Flow
As CTwoClThreeFThree(CFC-113), CTwo
ClTwoFFour(CFC-114), CTwoClFFive(CFC
-115).

【0008】本発明では、4A族、5A族、6A族、7
A族、8族、1B族、及び3B族から選ばれる少なくと
も一種の金属が担体に担持された触媒の存在下で、前記
含フッ素化合物を分子状酸素及び水と接触させることに
よって、含フッ素化合物の分解が行われる。これらの金
属は、その化合物、即ち、ハロゲン化物(塩化物等)、
無機酸塩(硝酸塩、硫酸塩等)、有機酸塩(シュウ酸
塩、酢酸塩等)、酸素酸塩、酸素酸、有機金属化合物、
酸化物等の形態で担持されていてもよく、また、金属の
形態で担持されていてもよい。
In the present invention, the 4A group, 5A group, 6A group, 7
By bringing the fluorine-containing compound into contact with molecular oxygen and water in the presence of a catalyst in which at least one metal selected from the group A, the group 8, the group 1B, and the group 3B is supported on a carrier, Is decomposed. These metals are compounds, namely halides (such as chlorides),
Inorganic acid salts (nitrates, sulfates, etc.), organic acid salts (oxalates, acetates, etc.), oxyacid salts, oxyacids, organometallic compounds,
It may be supported in the form of an oxide or the like, or may be supported in the form of a metal.

【0009】4A族の金属としては、チタン、ジルコニ
ウム、ハフニウムが挙げられる。5A族の金属として
は、バナジウム、ニオブ、タンタルが挙げられる。6A
族の金属としては、クロム、モリブデン、タングステン
が挙げられる。7A族の金属としては、マンガン、テク
ネチウム、レニウムが挙げられる。8族の金属として
は、鉄、ルテニウム、オスミウム、コバルト、ロジウ
ム、イリジウム、ニッケル、パラジウム、白金が挙げら
れる。1B族の金属としては、銅、銀、金が挙げられ
る。3B族の金属としては、ホウ素、ガリウム、インジ
ウム、タリウムが挙げられる。
As the Group 4A metal, titanium, zirconium and hafnium can be mentioned. Group 5A metals include vanadium, niobium, and tantalum. 6A
Group metals include chromium, molybdenum, and tungsten. Group 7A metals include manganese, technetium, and rhenium. Group 8 metals include iron, ruthenium, osmium, cobalt, rhodium, iridium, nickel, palladium, and platinum. Group 1B metals include copper, silver, and gold. Group 3B metals include boron, gallium, indium, and thallium.

【0010】担体としては、例えば、γ−アルミナ、δ
−アルミナ、θ−アルミナ等のアルミナが好適に使用さ
れる。なお、アルミナの比表面積は120〜200m2
/g程度であることが好ましい。アルミナの形状は特に
限定されるものではなく、反応器及び反応方法に合わせ
て、粒状、粉末状、ハニカム状など、それぞれに適した
形状のものを選ぶことができる。
As the carrier, for example, γ-alumina, δ
-Alumina such as alumina and [theta] -alumina are preferably used. The specific surface area of alumina is 120 to 200 m 2.
/ G is preferred. The shape of the alumina is not particularly limited, and a shape suitable for each, such as a granular shape, a powder shape, and a honeycomb shape, can be selected according to the reactor and the reaction method.

【0011】前記触媒を調製する方法としては、前記金
属のハロゲン化物(塩化物等)、無機酸塩(硝酸塩、硫
酸塩等)、有機酸塩(シュウ酸塩、酢酸塩等)、酸素
酸、酸素酸塩、錯体(アンミン錯体等)の水溶液や、前
記金属の有機金属化合物の溶液(水溶液又はアルコール
等の有機溶剤溶液)を用いて、含浸法、共沈法、イオン
交換法、機械的混練法等の通常の方法により、担体に前
記金属を担持させる方法が挙げられる。なお、前記金属
の担持量は、担体に対して、金属として0.01〜50
重量%、特に0.01〜20重量%であることが好まし
い。得られた触媒は、乾燥後、通常の前処理、即ち、空
気中あるいは窒素等の不活性ガス気流中での焼成を行う
ことが好ましい。この処理はマッフル炉等を用いて行っ
てもよく、また、反応器(反応管)中で分解反応を始め
る前に数時間行っても差し支えない。なお、焼成温度は
100〜800℃、特に400〜700℃であることが
好ましい。この温度が余りに高くなると、アルミナの表
面積の減少が起こって好ましくない。
As the method for preparing the catalyst, halides (chlorides, etc.), inorganic acid salts (nitrates, sulfates, etc.), organic acid salts (oxalates, acetates, etc.), oxygen acids, Impregnation method, coprecipitation method, ion exchange method, mechanical kneading using an aqueous solution of an oxyacid salt or a complex (ammine complex or the like) or a solution of an organic metal compound of the metal (aqueous solution or an organic solvent solution such as alcohol). A method in which the metal is supported on a carrier by an ordinary method such as a method. The amount of the metal supported is 0.01 to 50 as a metal on the carrier.
% By weight, particularly preferably 0.01 to 20% by weight. After drying the obtained catalyst, it is preferable to perform normal pretreatment, that is, calcination in air or a stream of an inert gas such as nitrogen. This treatment may be performed using a muffle furnace or the like, or may be performed for several hours before starting the decomposition reaction in the reactor (reaction tube). The firing temperature is preferably from 100 to 800C, particularly preferably from 400 to 700C. If the temperature is too high, the surface area of alumina decreases, which is not preferable.

【0012】分子状酸素としては、酸素ガスを窒素等の
不活性ガスで希釈したものも使用できるが、空気が好適
に使用される。分子状酸素の供給量は前記含フッ素化合
物中の炭素分(炭素原子)を二酸化炭素及び一酸化炭素
に変換するのに十分な量であれば、特に制限されるもの
ではない。即ち、分子状酸素の供給量は、前記含フッ素
化合物中の炭素原子に対して、等モル以上、好ましくは
等モルから10倍モル程度である。分子状酸素の供給方
法は特に制限されず、例えば、含フッ素化合物と混合し
て反応器(反応管)に供給する方法などが挙げられる。
As the molecular oxygen, oxygen gas diluted with an inert gas such as nitrogen can be used, but air is preferably used. The supply amount of molecular oxygen is not particularly limited as long as it is an amount sufficient to convert the carbon content (carbon atoms) in the fluorine-containing compound into carbon dioxide and carbon monoxide. That is, the supply amount of molecular oxygen is at least equimolar, and preferably about equimolar to about 10-fold molar with respect to the carbon atom in the fluorine-containing compound. The method of supplying molecular oxygen is not particularly limited, and examples thereof include a method of mixing with a fluorine-containing compound and supplying the mixture to a reactor (reaction tube).

【0013】本発明では、分解反応で発生するハロゲン
(フッ素及び塩素)を除去するために水が添加される。
また、水を添加すると触媒活性が維持されるようにな
る。水の添加量は前記含フッ素化合物中のハロゲン分
(フッ素原子及び塩素原子)と等モル以上、好ましくは
等モルから10倍モル程度であればよい。例えば、CF
4 であれば4倍モル以上、好ましくは4〜40倍モルで
あって、C2 6 であれば6倍モル以上、好ましくは6
〜60倍モル程度であればよい。水の添加方法は特に制
限されず、例えば、マイクロフィーダーを用いて液体と
して反応器(反応管)に供給する方法、サチュレーター
を用いて含フッ素化合物に同伴させる方法などが挙げら
れる。
In the present invention, water is added to remove halogens (fluorine and chlorine) generated in the decomposition reaction.
Further, when water is added, the catalytic activity is maintained. The amount of water to be added may be at least equimolar to the halogen content (fluorine atom and chlorine atom) in the fluorine-containing compound, and preferably about equimolar to about 10-fold molar. For example, CF
If 4 4 moles or more, preferably a 4 to 40-fold moles, C 2 F 6 in the case when 6 moles or more, preferably 6
It may be about 60-fold molar. The method of adding water is not particularly limited, and examples thereof include a method of supplying a liquid to a reactor (reaction tube) using a microfeeder, and a method of using a saturator to accompany the fluorine-containing compound.

【0014】本発明の含フッ素化合物の分解は、例え
ば、前記触媒を充填した反応器(反応管)に、前記含フ
ッ素化合物、分子状酸素及び水の混合ガスを供給するこ
とによって行われる。このとき、反応温度は300〜1
000℃、好ましくは400〜800℃で、混合ガスの
供給速度は50000hr-1以下、好ましくは100〜
10000hr-1程度である。また、反応圧力は1to
rrの減圧から100atmの加圧まで広い範囲が可能
であるが、好ましくは常圧から10atm程度である。
分解反応は流通式又はバッチ式で行うことができるが、
簡便であることから前者の流通式が好ましい。また、流
通式の場合、固定床、流動床いずれの形態でも反応を行
いうる。
The decomposition of the fluorine-containing compound of the present invention is carried out, for example, by supplying a mixed gas of the fluorine-containing compound, molecular oxygen and water to a reactor (reaction tube) filled with the catalyst. At this time, the reaction temperature is 300 to 1
000 ° C., preferably 400 to 800 ° C., and the mixed gas supply rate is 50,000 hr −1 or less, preferably 100 to
It is about 10,000 hr -1 . The reaction pressure is 1 to
A wide range from a reduced pressure of rr to a pressurization of 100 atm is possible, but it is preferably from normal pressure to about 10 atm.
The decomposition reaction can be performed by a flow system or a batch system,
The former distribution type is preferred because it is simple. In the case of a flow type, the reaction can be carried out in any of a fixed bed and a fluidized bed.

【0015】[0015]

【実施例】次に、実施例及び比較例を挙げて本発明を具
体的に説明する。なお、以下の操作は特に記載しない限
り常圧下で行った。また、含フッ素化合物(C2 6
の転化率は次式により求めた。
Next, the present invention will be described specifically with reference to examples and comparative examples. The following operations were performed under normal pressure unless otherwise specified. Fluorine-containing compounds (C 2 F 6 )
Was determined by the following equation.

【0016】[0016]

【数1】 (Equation 1)

【0017】実施例1 パラジウムアンミン錯体〔Pd(NH3 4 Cl2
(0.01g)を蒸留水(30g)に溶解し、この溶液
に市販の粒状のγ−アルミナ(10g)を加えた後、ロ
ータリーエバポレーターを用いて60℃で減圧乾固し
た。得られた触媒(5.0ml)を100℃で乾燥した
後、内径10mmの石英製反応管に充填し、窒素気流
中、700℃で1時間焼成した。次いで、C2 6 /空
気混合ガス(C 2 6 :1容量%)を20ml/min
で、水を0.36g/hrでそれぞれ反応管に供給して
同温度で分解反応を行った。出口ガス中のC2 6 濃度
(C2 6 残存量)をガスクロマトグラフィーにより分
析したところ、C2 6 転化率は反応開始2時間後で4
9%であった。なお、反応生成物としては、二酸化炭素
がガスクロマトグラフィー及びFT−IRにより確認さ
れた。
Example 1 A palladium ammine complex [Pd (NHThree)FourClTwo]
(0.01 g) was dissolved in distilled water (30 g).
After adding commercially available granular γ-alumina (10 g) to
To dryness under reduced pressure at 60 ° C using a tally evaporator.
Was. The obtained catalyst (5.0 ml) was dried at 100 ° C.
After that, the reactor was filled into a quartz reaction tube having an inner diameter of 10 mm,
It was baked at 700 ° C. for 1 hour. Then CTwoF6/Sky
Gas mixture gas (C TwoF6: 1% by volume) at 20 ml / min
Then, supply water to the reaction tubes at 0.36 g / hr, respectively.
The decomposition reaction was performed at the same temperature. C in outlet gasTwoF6concentration
(CTwoF6Remaining amount) by gas chromatography
When analyzed, CTwoF6The conversion was 4 hours after the start of the reaction.
9%. The reaction product is carbon dioxide
Was confirmed by gas chromatography and FT-IR.
Was.

【0018】実施例2 実施例1において、パラジウムアンミン錯体に代えて塩
化白金酸〔H2 PtCl4 〕(0.1g)を用いたほか
は、実施例1と同様に触媒を調製して反応を行った。そ
の結果、C2 6 転化率は反応開始2時間後で80%で
あった。
Example 2 A catalyst was prepared in the same manner as in Example 1 except that chloroplatinic acid [H 2 PtCl 4 ] (0.1 g) was used instead of the palladium ammine complex. went. As a result, the C 2 F 6 conversion was 80% two hours after the start of the reaction.

【0019】比較例1 実施例1において、触媒として、金属を担持させていな
いγ−アルミナ(5.0ml)を用いたほかは、実施例
1と同様に反応を行った。その結果、C2 6 転化率は
反応開始2時間後で21%であった。
Comparative Example 1 A reaction was carried out in the same manner as in Example 1 except that γ-alumina (5.0 ml) not supporting a metal was used as a catalyst. As a result, the C 2 F 6 conversion was 21% 2 hours after the start of the reaction.

【0020】実施例3〜11 実施例1において、パラジウムアンミン錯体に代えて、
硝酸銅、硝酸鉄、シュウ酸コバルト、硝酸クロム、硝酸
ニッケル、塩化ルテニウム、塩化ジルコニウム、硫酸イ
ンジウム、メタバナジン酸を各0.1g用いたほかは、
実施例1と同様に触媒を調製して反応を行った。その結
果を表1に示す。
Examples 3 to 11 In Example 1, instead of the palladium ammine complex,
Other than using 0.1 g each of copper nitrate, iron nitrate, cobalt oxalate, chromium nitrate, nickel nitrate, ruthenium chloride, zirconium chloride, indium sulfate, and metavanadic acid,
A catalyst was prepared and reacted in the same manner as in Example 1. Table 1 shows the results.

【0021】実施例12、13 実施例1において、パラジウムアンミン錯体に代えて、
メタタングステン酸、モリブデン酸を各0.5g用いた
ほかは、実施例1と同様に触媒を調製して反応操作を行
った。その結果を表1に示す。
Examples 12 and 13 In Example 1, instead of the palladium ammine complex,
A reaction was carried out by preparing a catalyst in the same manner as in Example 1 except that 0.5 g of each of metatungstic acid and molybdic acid was used. Table 1 shows the results.

【0022】実施例14 実施例1において、硝酸クロム(0.1g)を同様に担
持した後、パラジウムアンミン錯体〔Pd(NH3 4
Cl2 〕(0.01g)を同様に担持した触媒を用いた
ほかは、実施例1に同様に反応を行った。その結果を表
1に示す。
Example 14 In Example 1, after carrying chromium nitrate (0.1 g) in the same manner, a palladium ammine complex [Pd (NH 3 ) 4
The reaction was carried out in the same manner as in Example 1 except for using a catalyst similarly supporting [Cl 2 ] (0.01 g). Table 1 shows the results.

【0023】[0023]

【表1】 [Table 1]

【0024】[0024]

【発明の効果】本発明によれば、入手が容易でかつ比較
的安価なアルミナを触媒として用いて、簡便な反応装置
において、非常に安定で処理が難しいPFC等の半導体
工場でのプラズマCVDのチャンバークリーニングガス
等に使用されている含フッ素化合物を連続的に分解する
ことが可能である。この方法は、生成するガスも二酸化
炭素等であり、地球環境に極めて優しい、ガス状の含フ
ッ素化合物の処理方法である。
According to the present invention, it is possible to use a readily available and relatively inexpensive alumina as a catalyst in a simple reactor and to perform plasma CVD in a semiconductor plant such as PFC which is very stable and difficult to process. It is possible to continuously decompose a fluorine-containing compound used for a chamber cleaning gas or the like. This method is a method for treating a gaseous fluorine-containing compound, which is also very friendly to the global environment because the generated gas is carbon dioxide or the like.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI B01J 23/26 B01J 23/26 A 23/28 23/28 A 23/30 23/30 A 23/42 23/42 A 23/44 23/44 A 23/46 301 23/46 301A 23/72 23/72 A 23/74 23/74 A (72)発明者 松崎 徳雄 山口県宇部市大字小串1978番地の5 宇部 興産株式会社宇部研究所内──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 6 Identification code FI B01J 23/26 B01J 23/26 A 23/28 23/28 A 23/30 23/30 A 23/42 23/42 A 23 / 44 23/44 A 23/46 301 23/46 301A 23/72 23/72 A 23/74 23/74 A (72) Inventor Tokuo Matsuzaki 5, 1978 Kogushi, Oji, Ube City, Yamaguchi Prefecture Inside

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 ガス状の含フッ素化合物を、4A族、5
A族、6A族、7A族、8族、1B族、及び3B族から
選ばれる少なくとも一種の金属が担体に担持された触媒
の存在下で、分子状酸素及び水と接触させることを特徴
とする含フッ素化合物の分解法。
1. A gaseous fluorine-containing compound comprising a 4A group,
At least one metal selected from Group A, Group 6A, Group 7A, Group 8, Group 1B, and Group 3B is brought into contact with molecular oxygen and water in the presence of a catalyst supported on a carrier. A method for decomposing a fluorine-containing compound.
【請求項2】 含フッ素化合物が、パーフルオロ化合
物、フッ化炭化水素、又ははフロンであることを特徴と
する請求項1記載の含フッ素化合物の分解法。
2. The method for decomposing a fluorine-containing compound according to claim 1, wherein the fluorine-containing compound is a perfluoro compound, a fluorinated hydrocarbon or chlorofluorocarbon.
【請求項3】 担体がアルミナであることを特徴とする
請求項1記載の含フッ素化合物の分解法。
3. The method for decomposing a fluorine-containing compound according to claim 1, wherein the carrier is alumina.
JP9097154A 1997-04-15 1997-04-15 Decomposing method of fluorine-containing compound Pending JPH10286439A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Publications (1)

Publication Number Publication Date
JPH10286439A true JPH10286439A (en) 1998-10-27

Family

ID=14184661

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Country Status (1)

Country Link
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000074821A1 (en) * 1999-06-09 2000-12-14 Hitachi, Ltd. Method and apparatus for disposing of fluorine-containing compound by decomposition
JP2001232152A (en) * 1997-06-20 2001-08-28 Hitachi Ltd Decomposition treating method of fluorine-containing compound, catalyst and decomposition treating device
US6563011B2 (en) 1999-04-28 2003-05-13 Showa Denko Kabushiki Kaisha Reactive agent and process for decomposing fluorine compounds and use thereof
JP2007130635A (en) * 1997-06-20 2007-05-31 Hitachi Ltd Method and apparatus for decomposing fluorocompound
US7261868B2 (en) 2001-09-13 2007-08-28 Hitachi, Ltd. Process and apparatus for the decomposition of fluorine compounds

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001232152A (en) * 1997-06-20 2001-08-28 Hitachi Ltd Decomposition treating method of fluorine-containing compound, catalyst and decomposition treating device
JP2007130635A (en) * 1997-06-20 2007-05-31 Hitachi Ltd Method and apparatus for decomposing fluorocompound
JP4596432B2 (en) * 1997-06-20 2010-12-08 昭和電工株式会社 Method and apparatus for decomposing fluorine-containing compounds
US6563011B2 (en) 1999-04-28 2003-05-13 Showa Denko Kabushiki Kaisha Reactive agent and process for decomposing fluorine compounds and use thereof
US6630421B1 (en) 1999-04-28 2003-10-07 Showa Denko Kabushiki Kaisha Reactive agent and process for decomposing fluorine compounds and use thereof
WO2000074821A1 (en) * 1999-06-09 2000-12-14 Hitachi, Ltd. Method and apparatus for disposing of fluorine-containing compound by decomposition
US7294315B1 (en) 1999-06-09 2007-11-13 Hitachi, Ltd. Method and apparatus for disposing of fluorine-containing compound by decomposition
US7261868B2 (en) 2001-09-13 2007-08-28 Hitachi, Ltd. Process and apparatus for the decomposition of fluorine compounds

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