JPS61191953A - ガス検出装置 - Google Patents
ガス検出装置Info
- Publication number
- JPS61191953A JPS61191953A JP3063585A JP3063585A JPS61191953A JP S61191953 A JPS61191953 A JP S61191953A JP 3063585 A JP3063585 A JP 3063585A JP 3063585 A JP3063585 A JP 3063585A JP S61191953 A JPS61191953 A JP S61191953A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- detection
- leads
- lead
- bridge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001514 detection method Methods 0.000 claims abstract description 76
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 239000000463 material Substances 0.000 claims abstract description 19
- 239000004065 semiconductor Substances 0.000 claims abstract description 19
- 239000012777 electrically insulating material Substances 0.000 claims abstract description 11
- 229910044991 metal oxide Inorganic materials 0.000 claims description 5
- 150000004706 metal oxides Chemical class 0.000 claims description 5
- 238000001179 sorption measurement Methods 0.000 abstract description 3
- 230000035945 sensitivity Effects 0.000 abstract description 2
- 238000010276 construction Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 32
- 238000005530 etching Methods 0.000 description 8
- 239000011247 coating layer Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 230000008859 change Effects 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 238000001552 radio frequency sputter deposition Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 238000001312 dry etching Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- BYFGZMCJNACEKR-UHFFFAOYSA-N aluminium(i) oxide Chemical compound [Al]O[Al] BYFGZMCJNACEKR-UHFFFAOYSA-N 0.000 description 2
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229910001120 nichrome Inorganic materials 0.000 description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000000992 sputter etching Methods 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910019017 PtRh Inorganic materials 0.000 description 1
- 229920000535 Tan II Polymers 0.000 description 1
- LDDQLRUQCUTJBB-UHFFFAOYSA-N ammonium fluoride Chemical compound [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000001282 iso-butane Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/12—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3063585A JPS61191953A (ja) | 1985-02-20 | 1985-02-20 | ガス検出装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3063585A JPS61191953A (ja) | 1985-02-20 | 1985-02-20 | ガス検出装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61191953A true JPS61191953A (ja) | 1986-08-26 |
| JPH053894B2 JPH053894B2 (enrdf_load_stackoverflow) | 1993-01-18 |
Family
ID=12309296
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3063585A Granted JPS61191953A (ja) | 1985-02-20 | 1985-02-20 | ガス検出装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61191953A (enrdf_load_stackoverflow) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63243817A (ja) * | 1987-03-31 | 1988-10-11 | Sharp Corp | シリコンマイクロセンサの製造方法 |
| JPH01167645A (ja) * | 1987-12-23 | 1989-07-03 | Ricoh Co Ltd | ガスセンサの製造方法 |
| JPH01299452A (ja) * | 1988-05-27 | 1989-12-04 | Ricoh Co Ltd | ４端子検出型ガス検出装置 |
| JPH0219756A (ja) * | 1988-07-06 | 1990-01-23 | Ricoh Co Ltd | ガス検出装置 |
| JPH02216043A (ja) * | 1989-02-15 | 1990-08-28 | Ricoh Co Ltd | ガスセンサの駆動方法 |
| US4967589A (en) * | 1987-12-23 | 1990-11-06 | Ricoh Company, Ltd. | Gas detecting device |
| US5019885A (en) * | 1989-03-30 | 1991-05-28 | Ricoh Company, Ltd. | Gas detecting device |
| JP2002286673A (ja) * | 2001-03-28 | 2002-10-03 | Denso Corp | ガスセンサ及びその製造方法 |
-
1985
- 1985-02-20 JP JP3063585A patent/JPS61191953A/ja active Granted
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63243817A (ja) * | 1987-03-31 | 1988-10-11 | Sharp Corp | シリコンマイクロセンサの製造方法 |
| JPH01167645A (ja) * | 1987-12-23 | 1989-07-03 | Ricoh Co Ltd | ガスセンサの製造方法 |
| US4967589A (en) * | 1987-12-23 | 1990-11-06 | Ricoh Company, Ltd. | Gas detecting device |
| US5003812A (en) * | 1987-12-23 | 1991-04-02 | Ricoh Company, Ltd. | Gas detecting device |
| JPH01299452A (ja) * | 1988-05-27 | 1989-12-04 | Ricoh Co Ltd | ４端子検出型ガス検出装置 |
| US4984446A (en) * | 1988-05-27 | 1991-01-15 | Ricoh Company, Ltd. | Gas detecting device and gas detecting system using the same |
| JPH0219756A (ja) * | 1988-07-06 | 1990-01-23 | Ricoh Co Ltd | ガス検出装置 |
| JPH02216043A (ja) * | 1989-02-15 | 1990-08-28 | Ricoh Co Ltd | ガスセンサの駆動方法 |
| US5019885A (en) * | 1989-03-30 | 1991-05-28 | Ricoh Company, Ltd. | Gas detecting device |
| JP2002286673A (ja) * | 2001-03-28 | 2002-10-03 | Denso Corp | ガスセンサ及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH053894B2 (enrdf_load_stackoverflow) | 1993-01-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |