JPS61190975A - 絶縁ゲート型電界効果トランジスタの製法 - Google Patents

絶縁ゲート型電界効果トランジスタの製法

Info

Publication number
JPS61190975A
JPS61190975A JP61036964A JP3696486A JPS61190975A JP S61190975 A JPS61190975 A JP S61190975A JP 61036964 A JP61036964 A JP 61036964A JP 3696486 A JP3696486 A JP 3696486A JP S61190975 A JPS61190975 A JP S61190975A
Authority
JP
Japan
Prior art keywords
gate
region
source
diffusion
impurity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61036964A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0225261B2 (enrdf_load_stackoverflow
Inventor
Koji Otsu
大津 孝二
Hidenobu Mochizuki
望月 英伸
Takashi Shimada
喬 島田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP61036964A priority Critical patent/JPS61190975A/ja
Publication of JPS61190975A publication Critical patent/JPS61190975A/ja
Publication of JPH0225261B2 publication Critical patent/JPH0225261B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/0123Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
    • H10D84/0126Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
    • H10D84/0165Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs the components including complementary IGFETs, e.g. CMOS devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/02Manufacture or treatment characterised by using material-based technologies
    • H10D84/03Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
    • H10D84/038Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
JP61036964A 1986-02-21 1986-02-21 絶縁ゲート型電界効果トランジスタの製法 Granted JPS61190975A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61036964A JPS61190975A (ja) 1986-02-21 1986-02-21 絶縁ゲート型電界効果トランジスタの製法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61036964A JPS61190975A (ja) 1986-02-21 1986-02-21 絶縁ゲート型電界効果トランジスタの製法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP9902976A Division JPS5324281A (en) 1976-08-19 1976-08-19 Production of insulated gate type field effect transistors

Publications (2)

Publication Number Publication Date
JPS61190975A true JPS61190975A (ja) 1986-08-25
JPH0225261B2 JPH0225261B2 (enrdf_load_stackoverflow) 1990-06-01

Family

ID=12484414

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61036964A Granted JPS61190975A (ja) 1986-02-21 1986-02-21 絶縁ゲート型電界効果トランジスタの製法

Country Status (1)

Country Link
JP (1) JPS61190975A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190131090A (ko) * 2017-05-19 2019-11-25 이구루코교 가부시기가이샤 슬라이딩 부품

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4868177A (enrdf_load_stackoverflow) * 1972-01-27 1973-09-17
JPS4952984A (enrdf_load_stackoverflow) * 1972-09-25 1974-05-23
JPS5169372A (enrdf_load_stackoverflow) * 1974-11-06 1976-06-15 Ibm
JPS5324281A (en) * 1976-08-19 1978-03-06 Sony Corp Production of insulated gate type field effect transistors

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4868177A (enrdf_load_stackoverflow) * 1972-01-27 1973-09-17
JPS4952984A (enrdf_load_stackoverflow) * 1972-09-25 1974-05-23
JPS5169372A (enrdf_load_stackoverflow) * 1974-11-06 1976-06-15 Ibm
JPS5324281A (en) * 1976-08-19 1978-03-06 Sony Corp Production of insulated gate type field effect transistors

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190131090A (ko) * 2017-05-19 2019-11-25 이구루코교 가부시기가이샤 슬라이딩 부품

Also Published As

Publication number Publication date
JPH0225261B2 (enrdf_load_stackoverflow) 1990-06-01

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