JPS61190975A - 絶縁ゲート型電界効果トランジスタの製法 - Google Patents
絶縁ゲート型電界効果トランジスタの製法Info
- Publication number
- JPS61190975A JPS61190975A JP61036964A JP3696486A JPS61190975A JP S61190975 A JPS61190975 A JP S61190975A JP 61036964 A JP61036964 A JP 61036964A JP 3696486 A JP3696486 A JP 3696486A JP S61190975 A JPS61190975 A JP S61190975A
- Authority
- JP
- Japan
- Prior art keywords
- gate
- region
- source
- diffusion
- impurity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/0123—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
- H10D84/0126—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
- H10D84/0165—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs the components including complementary IGFETs, e.g. CMOS devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
- H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61036964A JPS61190975A (ja) | 1986-02-21 | 1986-02-21 | 絶縁ゲート型電界効果トランジスタの製法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61036964A JPS61190975A (ja) | 1986-02-21 | 1986-02-21 | 絶縁ゲート型電界効果トランジスタの製法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9902976A Division JPS5324281A (en) | 1976-08-19 | 1976-08-19 | Production of insulated gate type field effect transistors |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61190975A true JPS61190975A (ja) | 1986-08-25 |
JPH0225261B2 JPH0225261B2 (enrdf_load_stackoverflow) | 1990-06-01 |
Family
ID=12484414
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61036964A Granted JPS61190975A (ja) | 1986-02-21 | 1986-02-21 | 絶縁ゲート型電界効果トランジスタの製法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61190975A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190131090A (ko) * | 2017-05-19 | 2019-11-25 | 이구루코교 가부시기가이샤 | 슬라이딩 부품 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4868177A (enrdf_load_stackoverflow) * | 1972-01-27 | 1973-09-17 | ||
JPS4952984A (enrdf_load_stackoverflow) * | 1972-09-25 | 1974-05-23 | ||
JPS5169372A (enrdf_load_stackoverflow) * | 1974-11-06 | 1976-06-15 | Ibm | |
JPS5324281A (en) * | 1976-08-19 | 1978-03-06 | Sony Corp | Production of insulated gate type field effect transistors |
-
1986
- 1986-02-21 JP JP61036964A patent/JPS61190975A/ja active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4868177A (enrdf_load_stackoverflow) * | 1972-01-27 | 1973-09-17 | ||
JPS4952984A (enrdf_load_stackoverflow) * | 1972-09-25 | 1974-05-23 | ||
JPS5169372A (enrdf_load_stackoverflow) * | 1974-11-06 | 1976-06-15 | Ibm | |
JPS5324281A (en) * | 1976-08-19 | 1978-03-06 | Sony Corp | Production of insulated gate type field effect transistors |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190131090A (ko) * | 2017-05-19 | 2019-11-25 | 이구루코교 가부시기가이샤 | 슬라이딩 부품 |
Also Published As
Publication number | Publication date |
---|---|
JPH0225261B2 (enrdf_load_stackoverflow) | 1990-06-01 |