JPS6118957A - Ｘ線リソグラフイ−用マスクの作成方法 - Google Patents

Ｘ線リソグラフイ−用マスクの作成方法

Info

Publication number
JPS6118957A
JPS6118957A JP59138878A JP13887884A JPS6118957A JP S6118957 A JPS6118957 A JP S6118957A JP 59138878 A JP59138878 A JP 59138878A JP 13887884 A JP13887884 A JP 13887884A JP S6118957 A JPS6118957 A JP S6118957A
Authority
JP
Japan
Prior art keywords
mask
ray
film body
adhesive
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59138878A
Other languages
English (en)
Japanese (ja)
Other versions
JPH053131B2 (enrdf_load_stackoverflow
Inventor
Hideo Kato
日出夫 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59138878A priority Critical patent/JPS6118957A/ja
Priority to DE3524196A priority patent/DE3524196C3/de
Publication of JPS6118957A publication Critical patent/JPS6118957A/ja
Priority to US07/150,494 priority patent/US4804600A/en
Publication of JPH053131B2 publication Critical patent/JPH053131B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59138878A 1984-07-06 1984-07-06 Ｘ線リソグラフイ−用マスクの作成方法 Granted JPS6118957A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP59138878A JPS6118957A (ja) 1984-07-06 1984-07-06 Ｘ線リソグラフイ−用マスクの作成方法
DE3524196A DE3524196C3 (de) 1984-07-06 1985-07-05 Lithografiemaske
US07/150,494 US4804600A (en) 1984-07-06 1988-02-01 Lithographic mask structure and process for preparing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59138878A JPS6118957A (ja) 1984-07-06 1984-07-06 Ｘ線リソグラフイ−用マスクの作成方法

Publications (2)

Publication Number Publication Date
JPS6118957A true JPS6118957A (ja) 1986-01-27
JPH053131B2 JPH053131B2 (enrdf_load_stackoverflow) 1993-01-14

Family

ID=15232221

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59138878A Granted JPS6118957A (ja) 1984-07-06 1984-07-06 Ｘ線リソグラフイ−用マスクの作成方法

Country Status (1)

Country Link
JP (1) JPS6118957A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63283023A (ja) * 1987-05-14 1988-11-18 Oki Electric Ind Co Ltd Ｘ線露光マスク用メンブレンの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63283023A (ja) * 1987-05-14 1988-11-18 Oki Electric Ind Co Ltd Ｘ線露光マスク用メンブレンの製造方法

Also Published As

Publication number Publication date
JPH053131B2 (enrdf_load_stackoverflow) 1993-01-14

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