JPS61188504A - Preparation of optical waveguide lens - Google Patents

Preparation of optical waveguide lens

Info

Publication number
JPS61188504A
JPS61188504A JP2959785A JP2959785A JPS61188504A JP S61188504 A JPS61188504 A JP S61188504A JP 2959785 A JP2959785 A JP 2959785A JP 2959785 A JP2959785 A JP 2959785A JP S61188504 A JPS61188504 A JP S61188504A
Authority
JP
Japan
Prior art keywords
optical waveguide
layer
laser light
waveguide lens
refractive index
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2959785A
Other languages
Japanese (ja)
Other versions
JPH0727089B2 (en
Inventor
Kazuhisa Yamamoto
和久 山本
Kazutoshi Nagano
長野 数利
Takao Kakiuchi
垣内 孝夫
Minoru Kubo
実 久保
Sumie Ishikawa
石川 澄江
Keisuke Koga
啓介 古賀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP60029597A priority Critical patent/JPH0727089B2/en
Publication of JPS61188504A publication Critical patent/JPS61188504A/en
Publication of JPH0727089B2 publication Critical patent/JPH0727089B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122Basic optical elements, e.g. light-guiding paths
    • G02B6/124Geodesic lenses or integrated gratings
    • G02B6/1245Geodesic lenses

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Integrated Circuits (AREA)

Abstract

PURPOSE:To prepare optical waveguide lens easily in large amt. by forming bowl shaped part having high refractive index on an optical waveguide layer by the CVD method using laser light. CONSTITUTION:When an SiO2 layer formed by thermal oxidation and a glass layer formed by sputter vapor deposition are built-up on an Si substrate 1 and irradiated with eximer laser light 4 in gaseous NH3 and SiH4, the reaction gas is excited by the laser light and Si3N4 layer 5 is deposited on th glass layer 3. Since the intensity of the laser light is distributed in Gaussian distribution, the film thickness of the layer 5 is also distributed in Gaussian distribution. Accordingly, optical waveguide lenses having small transmission loss are prepd. easily and in large amt. by the CVD method using laser light.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は光通信または光情報処理など釦用いる光導波路
レンズの製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method of manufacturing an optical waveguide lens used in a button such as optical communication or optical information processing.

従来の技術 集積光学系において光導波路レンズは集束光と平行光と
の変換またはフーリエ変換などの機能を持ち必要不可欠
な構成要素となっている0faa図に光導波路レンズの
一種であるルネプルクレンズの構成を示す(レーザ研究
、昭和56年7月号P636参照)。ここで1はS五基
板、2はバッファであるSlO層、3は光導波層となる
ガラス層、6′は813N4などで形成されている光導
波路レレズである。ガラス層3の屈折率はSlO□層2
よシも大きく、さらに光導波路レンズ6′の屈折率はガ
ラス層3よシも大きい0このため光導波路レンズ6′の
中心軸近傍の波面の伝達速度は周辺部に比べて遅くなり
集束作用が生じる0 次に上述′のルネシルクレンズによる光導波路レンズ−
参会舎導曖待−−−の製造方法忙ついて図面を用いて説
明を行う。第4図はその製造方法を示した斜視図である
。中心部分が盛り上ったおわん状の高屈折率部であ□る
光導波路レンズ6′を蒸着により形成する。蒸発源と基
板との距離が充分であれば蒸発分子は基板に垂直に飛来
する。この際、変形マ誠り7を回転させながら蒸発する
ことKよシ、中心部分が盛り上ったおわん状の高屈折率
部である光導波路レンズ5′がガラス層3上忙形成され
る。
In conventional technology-integrated optical systems, optical waveguide lenses have functions such as converting focused light and parallel light or Fourier transform, and are essential components. The configuration is shown (see Laser Research, July 1981 issue, p. 636). Here, 1 is an S5 substrate, 2 is an SlO layer serving as a buffer, 3 is a glass layer serving as an optical waveguide layer, and 6' is an optical waveguide layer made of 813N4 or the like. The refractive index of glass layer 3 is SlO□ layer 2
Furthermore, the refractive index of the optical waveguide lens 6' is also higher than that of the glass layer 30. Therefore, the propagation speed of the wavefront near the central axis of the optical waveguide lens 6' is slower than that of the peripheral area, and the focusing effect is lowered. The resulting 0 Next, the optical waveguide lens using the above-mentioned Renesil lens -
I will explain the manufacturing method of Sankaisha Dofutai using drawings. FIG. 4 is a perspective view showing the manufacturing method. An optical waveguide lens 6', which is a bowl-shaped high refractive index portion with a raised central portion, is formed by vapor deposition. If the distance between the evaporation source and the substrate is sufficient, the evaporated molecules will fly perpendicularly to the substrate. At this time, the deformed core 7 is evaporated while being rotated, and an optical waveguide lens 5', which is a bowl-shaped high refractive index portion with a raised central portion, is formed on the glass layer 3.

発明が解決しようとする問題点 以上のように蒸着時にマスクを回転させることにより作
製される光導波路レンズは1回の蒸着により1個の光導
波路レンズしか作製中きなかうた。
Problems to be Solved by the Invention As described above, optical waveguide lenses manufactured by rotating a mask during vapor deposition only produce one optical waveguide lens during one vapor deposition.

さらに、蒸着では質の良い膜の形成が困難で光導波路レ
ンズ部で伝搬ロスを生じていた。
Furthermore, it is difficult to form a high-quality film by vapor deposition, and propagation loss occurs in the optical waveguide lens portion.

問題点を解決するための手段 本発明の光導波路レンズの製造方法は以上の問題点を解
決するためになされたものであシ、光導波層上にレーザ
光を用いたCVD法により、おわん状の高屈折率部を形
成するものである。
Means for Solving the Problems The method for manufacturing an optical waveguide lens of the present invention has been made to solve the above problems. This forms a high refractive index portion.

作  用 光強度がガウス分布を持つレーザ光を用いて、このレー
ザによるCVD法゛寸、膜の堆積をガラス分布にし光導
波路レンズが簡JIiK製造できる。
By using a laser beam whose working light intensity has a Gaussian distribution, an optical waveguide lens can be easily manufactured in a JIiK manner by making the CVD method using this laser and depositing a film with a glass distribution.

実施例 本発明の一光導波路しレズの製蓬方法の一実施例を第1
図に示す。第1図(a)で1はSt基板、2は熱酸化に
よシ形成されたSlO□層、3はスパッタ蒸着によシ形
成された多成分を含んだガラス層、4はArFエキシマ
レーザ光であシ、これらはNH3゜5IH4ガス中に置
かれている。NH3,5in4の各反応ガスはArFエ
キシマレーザ光4により光励起されて 4NH3+38 iH4→513N4+12H2↑とい
う反応によシ第1図(b)のようにS i3.N4層5
が、ガラス層3上に堆積されていく。この際ArFエキ
シマレーザ4はガウス分布している念め堆積される5t
3N4層6の膜厚もガウス分布を持つこととなる。
Embodiment A first embodiment of a method for manufacturing an optical waveguide and a laser according to the present invention is described below.
As shown in the figure. In Fig. 1(a), 1 is an St substrate, 2 is an SlO□ layer formed by thermal oxidation, 3 is a glass layer containing multiple components formed by sputter deposition, and 4 is an ArF excimer laser beam. Yes, these are placed in NH3゜5IH4 gas. The reaction gases NH3 and 5in4 are optically excited by the ArF excimer laser beam 4, resulting in the reaction 4NH3+38iH4→513N4+12H2↑, resulting in Si3. N4 layer 5
is deposited on the glass layer 3. At this time, the ArF excimer laser 4 is deposited with a Gaussian distribution of 5t.
The thickness of the 3N4 layer 6 also has a Gaussian distribution.

第2図は本発明め光導波路レンズの製造方法によシ製造
された光導波路レンズの斜視図である。
FIG. 2 is a perspective view of an optical waveguide lens manufactured by the optical waveguide lens manufacturing method of the present invention.

ガラス層3の屈折率は1.52.これに対して8102
層の屈折率は1.47であるので光はガラス層3中“ 
 を伝搬可能となる。H・−Noレーザ光6(波長0.
63μm)を平行光にしガラス層3中を伝搬させた。こ
のH・−Noレーザ光6のビーム幅は1m1Bであシ、
中心部厚み0.8pme屈折率1.92の5t3N4層
6を通過後10μmまで集光された0光導波層であるガ
ラス層3に対して高屈折率部となっているS z 3層
4層6は光導波路レンズとして作用したのである。
The refractive index of the glass layer 3 is 1.52. On the other hand, 8102
Since the refractive index of the layer is 1.47, the light is transmitted through the glass layer 3.
can be propagated. H・-No laser beam 6 (wavelength 0.
63 μm) was made into parallel light and propagated through the glass layer 3. The beam width of this H・-No laser beam 6 is 1 m1B,
After passing through the 5t3N4 layer 6 with a center thickness of 0.8 pme and a refractive index of 1.92, the light is condensed to 10 μm.The S z 3 layer and 4 layer are the high refractive index portions compared to the glass layer 3 which is an optical waveguide layer. 6 acted as an optical waveguide lens.

なお本実施例では光導波層と、してガラス、高屈折率部
として5t3N4を使用したが、高屈折率部が光導波層
よシも高い屈折率を有する組み合せであれば良い。
In this embodiment, glass is used as the optical waveguide layer, and 5t3N4 is used as the high refractive index portion, but any combination may be used as long as the high refractive index portion has a high refractive index as well as the optical waveguide layer.

発明の効果 以上述べたように本発明の光導波路レンズによれば、レ
ーザ光によるCVD法で簡単に光導波路レンズが製造可
能であシ、量産性大である0さらにCVD法によシ膜が
形成される些め簀質の伝搬ロスの少ない光導波路レンズ
が得られる0
Effects of the Invention As described above, according to the optical waveguide lens of the present invention, the optical waveguide lens can be easily manufactured by the CVD method using laser light, and the film can be easily manufactured by the CVD method. An optical waveguide lens with a small thickness and low propagation loss can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

y81図は本発明の光導波路レンズの!遣方法の一実施
例を示す工程図、第2、図は本発明の光導波路レンズの
一実施例の斜視図1.第、3図は従来のルネプルクレン
ズによる光導波路し、ンズの斜視図、第4図は従来の光
導波路レンズの製造方法を示す斜視図である。 1・・・・・・Sl 基板、2・・・・・・SlO□層
、3・・・・・・ガラス層、4・・・・・・ArFエキ
シマレーザ光、6・・・・・・Si3N4層。 代理人の氏名 弁理士 中 尾 敏 男 砥か1名□ 、  ′ 渇 ム  凶 / −−−3,、JR ?−−−3i02層 3−一一声゛ラス漫 (bン 第2図 第3図 / −−−3i基板 2−−−5tOZ層 第4図
Figure y81 shows the optical waveguide lens of the present invention! Figure 2 is a process diagram showing one embodiment of the optical waveguide lens according to the present invention. FIGS. 3 and 3 are perspective views of a conventional optical waveguide lens, and FIG. 4 is a perspective view showing a conventional method of manufacturing an optical waveguide lens. 1...Sl substrate, 2...SlO□ layer, 3...Glass layer, 4...ArF excimer laser beam, 6... Si3N4 layer. Name of agent: Patent attorney Toshio Nakao, 1 person□, 'Tsumu Kyo/ ---3,, JR? ---3i02 layer 3-1 single layer diagram (b) Figure 2 Figure 3/---3i substrate 2---5tOZ layer Figure 4

Claims (2)

【特許請求の範囲】[Claims] (1)光導波層上にレーザ光を用いたCVD法により、
おわん状の高屈折率部を形成する工程を有することを特
徴とした光導波路レンズの製造方法。
(1) By CVD method using laser light on the optical waveguide layer,
A method for manufacturing an optical waveguide lens, comprising the step of forming a bowl-shaped high refractive index portion.
(2)高屈折率部がSi_3N_4であることを特徴と
する特許請求の範囲第1項記載の光導波路レンズの製造
方法。
(2) The method for manufacturing an optical waveguide lens according to claim 1, wherein the high refractive index portion is Si_3N_4.
JP60029597A 1985-02-18 1985-02-18 Method for manufacturing optical waveguide lens Expired - Lifetime JPH0727089B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60029597A JPH0727089B2 (en) 1985-02-18 1985-02-18 Method for manufacturing optical waveguide lens

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60029597A JPH0727089B2 (en) 1985-02-18 1985-02-18 Method for manufacturing optical waveguide lens

Publications (2)

Publication Number Publication Date
JPS61188504A true JPS61188504A (en) 1986-08-22
JPH0727089B2 JPH0727089B2 (en) 1995-03-29

Family

ID=12280482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60029597A Expired - Lifetime JPH0727089B2 (en) 1985-02-18 1985-02-18 Method for manufacturing optical waveguide lens

Country Status (1)

Country Link
JP (1) JPH0727089B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999053567A1 (en) * 1998-04-13 1999-10-21 Mems Optical, Inc. Three dimensional micromachined electromagnetic device and associated methods

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56113107A (en) * 1980-02-12 1981-09-05 Toshiba Corp Preparation for plane waveguide lens
JPS57132103A (en) * 1981-02-09 1982-08-16 Nec Corp Production of optical waveguide path on glass substrate
JPS57163204A (en) * 1981-04-02 1982-10-07 Nec Corp Production of optical waveguide on glass substrate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56113107A (en) * 1980-02-12 1981-09-05 Toshiba Corp Preparation for plane waveguide lens
JPS57132103A (en) * 1981-02-09 1982-08-16 Nec Corp Production of optical waveguide path on glass substrate
JPS57163204A (en) * 1981-04-02 1982-10-07 Nec Corp Production of optical waveguide on glass substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999053567A1 (en) * 1998-04-13 1999-10-21 Mems Optical, Inc. Three dimensional micromachined electromagnetic device and associated methods

Also Published As

Publication number Publication date
JPH0727089B2 (en) 1995-03-29

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