JPS61163279A - Cvd装置 - Google Patents
Cvd装置Info
- Publication number
- JPS61163279A JPS61163279A JP162785A JP162785A JPS61163279A JP S61163279 A JPS61163279 A JP S61163279A JP 162785 A JP162785 A JP 162785A JP 162785 A JP162785 A JP 162785A JP S61163279 A JPS61163279 A JP S61163279A
- Authority
- JP
- Japan
- Prior art keywords
- reactor core
- core pipe
- wafer
- inert gas
- pipe
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP162785A JPS61163279A (ja) | 1985-01-09 | 1985-01-09 | Cvd装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP162785A JPS61163279A (ja) | 1985-01-09 | 1985-01-09 | Cvd装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61163279A true JPS61163279A (ja) | 1986-07-23 |
JPH0465146B2 JPH0465146B2 (fr) | 1992-10-19 |
Family
ID=11506771
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP162785A Granted JPS61163279A (ja) | 1985-01-09 | 1985-01-09 | Cvd装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61163279A (fr) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG90250A1 (en) * | 2000-06-24 | 2002-07-23 | Ips Ltd | Apparatus and method for depositing thin film on wafer using atomic layer deposition |
SG90249A1 (en) * | 2000-07-22 | 2002-07-23 | Ips Ltd | Atomic layer deposition (ald) thin film deposition equipment having cleaning apparatus and cleaning method |
WO2016190006A1 (fr) * | 2015-05-26 | 2016-12-01 | 株式会社日本製鋼所 | Dispositif de croissance de couche atomique, et partie échappement de dispositif de croissance de couche atomique |
WO2016190007A1 (fr) * | 2015-05-26 | 2016-12-01 | 株式会社日本製鋼所 | Dispositif de croissance de couche atomique par plasma |
US10508338B2 (en) | 2015-05-26 | 2019-12-17 | The Japan Steel Works, Ltd. | Device for atomic layer deposition |
US10633737B2 (en) | 2015-05-26 | 2020-04-28 | The Japan Steel Works, Ltd. | Device for atomic layer deposition |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5358487A (en) * | 1976-11-08 | 1978-05-26 | Hitachi Ltd | Decompressive gas phase reaction apparatus |
-
1985
- 1985-01-09 JP JP162785A patent/JPS61163279A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5358487A (en) * | 1976-11-08 | 1978-05-26 | Hitachi Ltd | Decompressive gas phase reaction apparatus |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG90250A1 (en) * | 2000-06-24 | 2002-07-23 | Ips Ltd | Apparatus and method for depositing thin film on wafer using atomic layer deposition |
SG90249A1 (en) * | 2000-07-22 | 2002-07-23 | Ips Ltd | Atomic layer deposition (ald) thin film deposition equipment having cleaning apparatus and cleaning method |
WO2016190006A1 (fr) * | 2015-05-26 | 2016-12-01 | 株式会社日本製鋼所 | Dispositif de croissance de couche atomique, et partie échappement de dispositif de croissance de couche atomique |
WO2016190007A1 (fr) * | 2015-05-26 | 2016-12-01 | 株式会社日本製鋼所 | Dispositif de croissance de couche atomique par plasma |
JP2016222940A (ja) * | 2015-05-26 | 2016-12-28 | 株式会社日本製鋼所 | 原子層成長装置および原子層成長装置排気部 |
JP2016225326A (ja) * | 2015-05-26 | 2016-12-28 | 株式会社日本製鋼所 | プラズマ原子層成長装置 |
CN107614750A (zh) * | 2015-05-26 | 2018-01-19 | 株式会社日本制钢所 | 原子层成长装置及原子层成长装置排气部 |
US10508338B2 (en) | 2015-05-26 | 2019-12-17 | The Japan Steel Works, Ltd. | Device for atomic layer deposition |
US10519549B2 (en) | 2015-05-26 | 2019-12-31 | The Japan Steel Works, Ltd. | Apparatus for plasma atomic layer deposition |
US10604838B2 (en) | 2015-05-26 | 2020-03-31 | The Japan Steel Works, Ltd. | Apparatus for atomic layer deposition and exhaust unit for apparatus for atomic layer deposition |
CN107614750B (zh) * | 2015-05-26 | 2020-04-24 | 株式会社日本制钢所 | 原子层成长装置及原子层成长装置排气部 |
US10633737B2 (en) | 2015-05-26 | 2020-04-28 | The Japan Steel Works, Ltd. | Device for atomic layer deposition |
Also Published As
Publication number | Publication date |
---|---|
JPH0465146B2 (fr) | 1992-10-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |