JPS6116130B2 - - Google Patents
Info
- Publication number
- JPS6116130B2 JPS6116130B2 JP12154680A JP12154680A JPS6116130B2 JP S6116130 B2 JPS6116130 B2 JP S6116130B2 JP 12154680 A JP12154680 A JP 12154680A JP 12154680 A JP12154680 A JP 12154680A JP S6116130 B2 JPS6116130 B2 JP S6116130B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- transparent insulating
- organic
- paste
- liquid crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000576 coating method Methods 0.000 claims description 6
- 150000003755 zirconium compounds Chemical class 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 claims description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 239000013110 organic ligand Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 238000010304 firing Methods 0.000 claims 1
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 6
- 239000004973 liquid crystal related substance Substances 0.000 description 6
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 5
- 239000001856 Ethyl cellulose Substances 0.000 description 5
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 229920001249 ethyl cellulose Polymers 0.000 description 5
- 235000019325 ethyl cellulose Nutrition 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 4
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 3
- 239000000020 Nitrocellulose Substances 0.000 description 3
- 229940007550 benzyl acetate Drugs 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229920001220 nitrocellulos Polymers 0.000 description 3
- 238000007650 screen-printing Methods 0.000 description 3
- 210000002858 crystal cell Anatomy 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- -1 butyl cellosolve Chemical class 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Inorganic Insulating Materials (AREA)
- Non-Insulated Conductors (AREA)
- Manufacturing Of Electric Cables (AREA)
Description
【発明の詳細な説明】
本発明は、液晶セル等の透明絶縁被膜に係り、
特に液晶セルの下部基板等よりのアルカリイオン
溶出防止膜、基板上に形成された電極層と、液晶
層とを分離する絶縁膜、TN型液晶表示装置等に
おける液晶配向膜などとして用いられる透明絶縁
被膜に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a transparent insulating coating for liquid crystal cells, etc.
In particular, transparent insulation used as a film to prevent alkali ion elution from the lower substrate of a liquid crystal cell, an insulating film that separates an electrode layer formed on a substrate from a liquid crystal layer, a liquid crystal alignment film in a TN type liquid crystal display device, etc. Regarding coatings.
従来、この種の透明絶縁被膜は、SiO2を主成
分とした膜で、真空蒸着法、浸漬法などにより形
成していた。しかし、真空蒸着法は、生産性が悪
るく、設備も大型になりがちであつた。又、浸漬
法は、不必要な箇所にも被膜が形成され、パター
ンの微細化に対応できない欠点があつた。 Conventionally, this type of transparent insulating film is a film mainly composed of SiO 2 and has been formed by vacuum evaporation, dipping, or the like. However, the vacuum deposition method has poor productivity and tends to require large equipment. In addition, the dipping method has the disadvantage that a film is formed in unnecessary locations and cannot correspond to finer patterns.
これらの欠点を解消するため、スクリーン印刷
法により基板上等にペーストを所望形状に印刷
し、焼成して透明絶縁被膜を形成する方法が試み
られているが、形成された被膜は、もろく、ポー
ラスであることが多く、被膜自体の特性は、真空
蒸着法、浸漬法により形成された被膜より劣つて
いた。 In order to overcome these drawbacks, attempts have been made to print a paste into a desired shape onto a substrate using screen printing and bake it to form a transparent insulating film, but the formed film is brittle and porous. In many cases, the properties of the film itself were inferior to those formed by vacuum evaporation or immersion methods.
本発明は、叙上の従来の欠点を解決し、透明度
良好、被膜強度大で緻密な透明絶縁被膜を提供す
る目的でなされたものである。 The present invention has been made for the purpose of solving the above-mentioned conventional drawbacks and providing a dense transparent insulating coating with good transparency and high coating strength.
本発明の特徴は、金属ジルコニウムと有機配位
子とが酸素を介して結合してなる有機ジルコニウ
ム化合物を焼成してZrO2を主成分とした透明絶
縁被膜を得ることにある。透明絶縁被膜をスクリ
ーン印刷法にて形成可能ならしめるためには、ジ
ルコニウム化合物が、高沸点（180℃以上）有機
溶媒に、安定に溶解する必要があり、かつ、500
℃以下の温度下で完全に酸化物となるものでなけ
ればならない。これら条件を満足するジルコニウ
ム化合物として、金属ジルコニウムと有機配位子
とが酸素を介して結合してなるZr（C5H7O2）4、
Zr（C7H15CO2）4、などの有機ジルコニウム化合
物が該当する。Zr（C5H7O2）4、Zr（C7H15CO2）4
などの有機ジルコニウム化合物を、ベンジルアル
コール、ジプロピレングリコール、２−エチルヘ
キシルアルコール等の高沸点アルコール類、ベン
ジルアセテート、カルビトールアセテート等の高
沸点エステル類、ブチルセロソルブ等の高沸点エ
ーテル類などの高沸点有機溶媒に溶解させ、エチ
ルセルローズ、ニトロセルローズ等のセルローズ
系粘性剤を添加して混練してペーストを作製す
る。該ペーストを、スクリーン印刷により、基板
上に印刷、焼成して得られたZrO2を主成分とし
た透明絶縁被膜は、透明度良好、被膜強度大で緻
密な膜であつた。 A feature of the present invention is that an organic zirconium compound formed by bonding metal zirconium and an organic ligand via oxygen is fired to obtain a transparent insulating film containing ZrO 2 as a main component. In order to be able to form a transparent insulating film using the screen printing method, the zirconium compound must be stably dissolved in a high boiling point (180°C or higher) organic solvent, and
It must completely become an oxide at temperatures below ℃. As a zirconium compound that satisfies these conditions, Zr(C 5 H 7 O 2 ) 4 , which is formed by bonding metal zirconium and an organic ligand via oxygen,
This includes organic zirconium compounds such as Zr(C 7 H 15 CO 2 ) 4 . Zr(C 5 H 7 O 2 ) 4 , Zr(C 7 H 15 CO 2 ) 4
organic zirconium compounds such as benzyl alcohol, dipropylene glycol, 2-ethylhexyl alcohol, high boiling point esters such as benzyl acetate, carbitol acetate, high boiling point ethers such as butyl cellosolve, etc. A paste is prepared by dissolving in a solvent, adding a cellulose-based viscosity agent such as ethyl cellulose or nitrocellulose, and kneading. The paste was printed on a substrate by screen printing and fired, resulting in a transparent insulating film containing ZrO 2 as a main component, which had good transparency, high film strength, and was dense.
叙上の説明のとおり、本発明は生産性がよく、
しかも、透明度良好、被膜強度大で緻密な透明絶
縁被膜を提供できるという大きな利点がある。 As explained above, the present invention has good productivity and
Moreover, it has the great advantage of being able to provide a dense transparent insulating film with good transparency and high film strength.
以下、実施例をもとに、さらに詳しく本発明を
説明する。 Hereinafter, the present invention will be explained in more detail based on Examples.
実施例 １
Zr化合物としてZr（C7H15CO2）4、有機溶媒と
して２−エチルヘキサノール粘性剤としてエチル
セルローズ（高粘度型）を選び下記組成のペース
トを作成した。Example 1 A paste having the following composition was prepared by selecting Zr(C 7 H 15 CO 2 ) 4 as the Zr compound and 2-ethylhexanol as the organic solvent and ethyl cellulose (high viscosity type) as the viscosity agent.
Zr（C7H15CO2）4 8.0wt％
２−エチルヘキサノール 81.0wt％
エチルセルローズ 11.0wt％
このペーストを用いて、ステンレス250メツシ
ユ、レジスト厚10μｍ版で印刷し、150℃で15分
予備乾燥し、500℃で30分焼成した所、膜厚2000
Å、透明度良好、被膜強度大な美しい膜が得られ
た。 Zr (C 7 H 15 CO 2 ) 4 8.0wt% 2-Ethylhexanol 81.0wt% Ethylcellulose 11.0wt% Using this paste, print on a stainless steel 250 mesh with a resist thickness of 10μm, and pre-dry at 150℃ for 15 minutes. After baking at 500℃ for 30 minutes, the film thickness was 2000mm.
A beautiful film with good transparency and high film strength was obtained.
実施例 ２
Zr化合物としてZr（C5H7O2）4、有機溶媒とし
てブチルセロソルブ粘性剤としてエチルセルロー
ズ（高粘度型）を選び下記組成のペーストを作成
した。Example 2 A paste having the following composition was prepared by selecting Zr(C 5 H 7 O 2 ) 4 as the Zr compound, butyl cellosolve as the organic solvent, and ethyl cellulose (high viscosity type) as the viscosity agent.
Zr（C5H7O2）4 8.0wt％
ブチルセロソルブ 81.0wt％
エチルセルローズ 11.0wt％
実施例１と同様にして被膜形成したところ同様
な膜が得られた。なお、実施例１，２で得られた
被膜は液晶分子を水平に配向させる能力を有す
る。従つて、配向膜として使用することもでき
る。 Zr(C 5 H 7 O 2 ) 4 8.0 wt% Butyl cellosolve 81.0 wt% Ethyl cellulose 11.0 wt% A film was formed in the same manner as in Example 1, and a similar film was obtained. The films obtained in Examples 1 and 2 have the ability to horizontally align liquid crystal molecules. Therefore, it can also be used as an alignment film.
実施例 ３
Zr化合物としてZr（C5H7O2）4、有機溶媒とし
てベンジルアセテート粘性剤としてニトロセルロ
ーズ80秒（日本工業規格、JIS−K6703）を選び
下記組成のペーストを作成した。Example 3 A paste having the following composition was prepared by selecting Zr (C 5 H 7 O 2 ) 4 as the Zr compound, benzyl acetate as the organic solvent, and nitrocellulose 80 seconds (Japanese Industrial Standards, JIS-K6703) as the viscosity agent.
Zr（C5H7O2）4 8.0wt％
ベンジルアセテート 81.0wt％
ニトロセルローズ 11.0wt％
形成された被膜の特性は、実施例１，２とほぼ
同じであるが、被膜強度は１番強い。 Zr (C 5 H 7 O 2 ) 4 8.0wt% Benzyl acetate 81.0wt% Nitrocellulose 11.0wt% The characteristics of the formed film are almost the same as those of Examples 1 and 2, but the film strength is the strongest.
又、実施例１，２，３とも生成した透明絶縁被
膜は市販原料中にあらかじめ混入していた不純物
等や有機溶媒、粘性剤による残査等を極く微量含
むことを除き、その他はすべてZrO2からなつて
いるものであつた。 In addition, the transparent insulating coatings produced in Examples 1, 2, and 3 were all ZrO 2 except that they contained extremely small amounts of impurities, organic solvents, and residues from viscous agents that had been mixed in commercially available raw materials. It was made up of a lot of things.
Claims (1)
して結合してなる有機ジルコニウム化合物を焼成
して得られるZrO2を主成分とした透明絶縁被
膜。1. A transparent insulating coating mainly composed of ZrO 2 obtained by firing an organic zirconium compound in which metal zirconium and an organic ligand are bonded via oxygen.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12154680A JPS5746405A (en) | 1980-09-02 | 1980-09-02 | Paste forming transparent insulating film and transparent insulating film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12154680A JPS5746405A (en) | 1980-09-02 | 1980-09-02 | Paste forming transparent insulating film and transparent insulating film |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60225411A Division JPS61159469A (en) | 1985-10-09 | 1985-10-09 | Transparent insulating film-forming paste |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5746405A JPS5746405A (en) | 1982-03-16 |
| JPS6116130B2 true JPS6116130B2 (en) | 1986-04-28 |
Family
ID=14813917
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12154680A Granted JPS5746405A (en) | 1980-09-02 | 1980-09-02 | Paste forming transparent insulating film and transparent insulating film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5746405A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6064805A (en) * | 1983-09-21 | 1985-04-13 | 原田株式会社 | Instantaneous mold-release method of cylindrical concrete product |
-
1980
- 1980-09-02 JP JP12154680A patent/JPS5746405A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5746405A (en) | 1982-03-16 |
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