JPS5927961A - Paste for forming transparent film and transparent film - Google Patents

Paste for forming transparent film and transparent film

Info

Publication number
JPS5927961A
JPS5927961A JP13789382A JP13789382A JPS5927961A JP S5927961 A JPS5927961 A JP S5927961A JP 13789382 A JP13789382 A JP 13789382A JP 13789382 A JP13789382 A JP 13789382A JP S5927961 A JPS5927961 A JP S5927961A
Authority
JP
Japan
Prior art keywords
paste
compound
compd
transparent film
lead
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13789382A
Other languages
Japanese (ja)
Inventor
Mitsuru Kano
満 鹿野
Yoshimi Kamijo
芳省 上條
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Priority to JP13789382A priority Critical patent/JPS5927961A/en
Publication of JPS5927961A publication Critical patent/JPS5927961A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23Oxides
    • C03C17/27Oxides by oxidation of a coating previously applied

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Chemically Coating (AREA)

Abstract

PURPOSE:To provide a paste for forming transparent film, which has excellent mass-productivity, consisting of an organolead compd., an organo-silicon compd., a thickening agent and an org. solvent, as well as a transparent film having a high film strength and relatively high insulating properties, by coating a substrate with said paste an firing it. CONSTITUTION:A paste for forming transparent film is prepd. from an organolead compd. such as lead caprylate, an organosilicon compd. such as vinyl-tris (2-methoxyethoxy) silane, a thickening agent such as cellulose compd. and an org. solvent (e.g. butylcarbinol) capable of dissolving said organolead compd., said organosilicon compd. and said thickening agent. The combined amount of said organolead compd. and said organosilicon compd. in the paste is pref. 2- 10wt%. A substrate such as glass or ceramic is screen-printed with said paste and fired at 400 deg.C or above the form a transparent lead oxide/silicon oxide film having the desired pattern.

Description

【発明の詳細な説明】 本発明は、ガラスやセラミックなどの基板上に形成され
る透明金属酸化物被膜に係り、更に詳しくはその透明被
膜が酸化鉛−酸化ケイ素からなる透明ネルli4!j 
Ig関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a transparent metal oxide film formed on a substrate such as glass or ceramic, and more specifically, the present invention relates to a transparent metal oxide film formed on a substrate such as glass or ceramic. j
It is related to Ig.

6;2化鉛−酸化ケイ素から1よる透明金属酸化物被1
;・:°(の形成方法には、真空蒸着法、化学スプレー
法ならびに浸漬法)、(どがある。ところで前記真空蒸
着法は形成される被膜の特性は優牙1ているが、量産性
に問題があり、またパターン化に対応するためにはエツ
チングなどの処理が必要であった。
6; Transparent metal oxide coating 1 made from lead dioxide-silicon oxide
;・:°(formation methods include vacuum evaporation method, chemical spray method, and immersion method), and (. There were problems with this, and processing such as etching was required to support patterning.

一方、化学スプレー法ならびに浸漬法は比較的存産に適
しているが、パターン化対応については前者と同様の間
:1′αがある。このように従来の方法で&、t−長一
短があり、必ずしも優ねた方法とは言いケ(!:い。
On the other hand, the chemical spray method and the dipping method are relatively suitable for actual production, but the patterning response is similar to the former: 1'α. As you can see, the conventional method has advantages and disadvantages, and it cannot necessarily be said that it is a superior method.

本発明の目的は、このような従来接衝の欠点な解消【2
、M産性に優ねたスクリーン印刷が可能で、被膜l[l
I′性の良好1工透明被膜形成用ペーストならびにその
ペース) Pi用いて形成した誘明被膜′l;/提供−
むるにある。
The purpose of the present invention is to eliminate the drawbacks of such conventional collisions [2]
, screen printing with excellent M productivity is possible, and the coating l[l
Paste for forming a transparent film with good I' property and its paste) Dilutive film formed using Pi;/Provided-
It's all over the place.

この目的な達成するため、本発明は、焼成によ−)で酔
化鉛−酸化ケイ素の被膜な形成する化合物で有機溶剤r
可溶な有機鉛化合物ならびに有機ケイ素化合物と、こわ
ら有機鉛化合物、有枦ケイ素化合物ならびに増粘剤な溶
解する有機溶剤とな混線して透明被膜形成用ペーストと
することff特徴とするものである。
To achieve this objective, the present invention provides a compound which forms a film of lead-silicon oxide (by calcination) in an organic solvent.
A paste for forming a transparent film is produced by mixing a soluble organic lead compound and an organic silicon compound with a stiff organic lead compound, an organic silicon compound, and a soluble organic solvent such as a thickener. be.

前記目的な達成するため、さらに本発明は、焼成によっ
て酸化鉛−酸化ケイ素のネ1−シ形成す2)化合物で有
機溶剤に可溶な有機鉛化合物ならびに有機ケイ素化合物
と、増粘剤と、こわら有機鉛化合物、有機ケイ素化合物
ならびに増粘剤な溶解する有機溶剤とな混練したペース
トを基板」二に塗布し、焼成して酸化鉛−酸化ケイ素の
選明枦膜としたことな特徴とするものであ2)。
In order to achieve the above-mentioned object, the present invention further provides a method for forming a lead oxide-silicon oxide glue by calcination. A paste made by kneading a stiff organic lead compound, an organic silicon compound, and a soluble organic solvent such as a thickener is applied to a substrate and fired to form a lead oxide-silicon oxide selection film. 2).

本発明に用いらねろ前記有機鉛化合物としては、オクチ
ル酸鉛が好適でネ、る。
As the organic lead compound used in the present invention, lead octylate is preferable.

また本発明に用いられる前記有機ケイ素化合物としては
、ビニルトリス(2−メトキシエトキシ)シランが好適
であ2)。
Furthermore, as the organosilicon compound used in the present invention, vinyltris(2-methoxyethoxy)silane is preferred 2).

さらに本発明に用いら第1ろ増粘剤とI7て(」1、ニ
トロセルロースやエチルセルロースなどのセルロース化
合物が好適である。
Furthermore, as the first filter thickener used in the present invention, cellulose compounds such as nitrocellulose and ethylcellulose are preferred.

前記有梢鉛化合物、有機ケイ素化合物ならびに増粘剤紮
溶解する有機溶剤としては、ターピネオール、2−エチ
ルヘキサノール、ベンジルアルコール1.’c トの高
沸点アルコ−A/類、ベルジルアセテート、ジメチルツ
クレートなどの高沸点エステル類、カルピトール、ブチ
ルカルピトール、ブチルセロソルブなどの高沸点アルコ
ールエーテル類などが用いられる。
Examples of organic solvents that can dissolve the above-mentioned lead compound, organosilicon compound, and thickener include terpineol, 2-ethylhexanol, and benzyl alcohol. High boiling point alcohol-A/s, high boiling point esters such as verzyl acetate and dimethyl tucrate, and high boiling point alcohol ethers such as carpitol, butyl carpitol and butyl cellosolve are used.

イ1m鉛化合物と有機ケイ素化合物と増粘剤と有(熱溶
剤と2所定の割合に混合してペーストなつくり、所望の
形状にパターン化さ第7たスクリーン版な用いて前記ペ
ーストケガラスやセラミックなどの九板上にスクリーン
印刷する。こhを予備乾燥後に約400℃以上の温度で
焼成することにより、酸化鉛−酸化ケイ素の透明被膜が
所望のパターンに形成さJlろ。この被II@は透明で
あることは勿論、116強度が犬で、比較的高い絶縁性
ケ有している。
A 1m lead compound, an organosilicon compound, a thickener, and a hot solvent are mixed in a predetermined ratio to make a paste, patterned into the desired shape, and using a seventh screen plate, the paste is made of glass. Screen printing is performed on a nine board such as ceramic.By pre-drying this and firing it at a temperature of about 400°C or higher, a transparent film of lead oxide-silicon oxide is formed in the desired pattern. Not only is it transparent, it has a strength of 116 and has relatively high insulation properties.

士だ、ペースト中の有機鉛化合物と有機ケイ素化合物の
トータル都す適当にコントロールすること(τより、4
000’A以下の被膜を自由に形成することができる。
However, it is important to appropriately control the total amount of organic lead compounds and organic silicon compounds in the paste (from τ, 4
A coating of 000'A or less can be freely formed.

次に本発明の実施例について説明する。Next, examples of the present invention will be described.

有機鉛化合物としてオクチル酸鉛(鉛含有率20%)を
有機ケイ素化合物としてビニルトリス(2−メトキシエ
トキシ)シランな用い、こ」1ら有機化合物の混合比を
種々変えて次のような組成のペーストを作成した。
Using lead octylate (lead content 20%) as an organic lead compound and vinyltris(2-methoxyethoxy)silane as an organic silicon compound, pastes with the following compositions were made by varying the mixing ratio of the organic compounds. It was created.

〔有機化合物〕        5重量%(X+Y=1
00) 〔増粘剤〕         14重量−ニトロセルロ
ース    144重量 %有機溶剤〕        81重里チプチルセロソ
ルブ    405重音係ブチルカルピトール   4
05重量%また、比較のため有機化合物と12でオクチ
ル酸鉛およびビニルトリス(2−メトキシエトキシ)シ
ランをそわぞれ単独に用いて同様にペースト?作成した
[Organic compound] 5% by weight (X+Y=1
00) [Thickener] 14 weight - nitrocellulose 144 weight% organic solvent] 81 Shigesato Typtyl Cellosolve 405 Butyl Calpitol 4
05% by weight Also, for comparison, an organic compound and 12 lead octylate and vinyltris(2-methoxyethoxy)silane were used individually and pastes were made in the same way. Created.

こ第1ら各ペーストな、250メツシユでレジスト厚l
Oμn1のステンレスネットからなるスクリーン版?用
いてソーダガラス基板上に印刷する。
For each paste, resist thickness is 250 mesh.
A screen version made of Oμn1 stainless steel net? to print on a soda glass substrate.

そして] 50 ”Cで15分間予備乾燥し、引き続き
500℃で30分間焼成してそゎぞれ透明金属酸化物被
膜な形成する。
Then, they were pre-dried at 50"C for 15 minutes and then fired at 500C for 30 minutes to form transparent metal oxide films.

この各透明被膜の膜特性を調べた結果を次の表に示す。The results of examining the film properties of each of these transparent films are shown in the following table.

なお表中の○印は良好、△印はやや悪い。Note that in the table, ○ marks are good and △ marks are slightly bad.

X印は悪いと判断したものな示す。また膜強度はペンシ
ル型ひつかき試験を用いて調べ、光透過率は可視部での
最小光透過率を示す。
An X mark indicates something that has been judged to be bad. The film strength was examined using a pencil scratch test, and the light transmittance indicates the minimum light transmittance in the visible region.

表 この表から明らかなように、本発明の、ように有機溶剤
に可溶な有機鉛化合物と有機ケイ素化合物とを含むペー
ストを用いて形成された透明金属酸化物被膜は、膜厚が
比較的厚くても可視部の最小光透過率が高く、しかも高
い電気絶縁性を有している。また本発明のペーストを用
いたものは、1スクリーン印刷性が良好で、印刷表面が
非常にiいである。
Table As is clear from this table, the transparent metal oxide film formed using the paste of the present invention containing an organic lead compound and an organosilicon compound that are soluble in an organic solvent has a relatively thick film. Even though it is thick, it has a high minimum light transmittance in the visible region and has high electrical insulation properties. Furthermore, those using the paste of the present invention have good one-screen printability and the printed surface is very hard.

ペースト中における有機鉛化合物と有機ケイ素化合物と
のトータル含有率と形成された被膜のクラック発生の有
無について検討した結果、前記トータル含有率が10重
−1% ’k t’BY、えるとクラックの発生がある
。一方、トータル含有率が2重M%未満では少量過ぎて
被膜の形成がほとんど不可能である。従ってペースト中
におけろ有機鉛化合物と有機ケイ素化合物とのトータル
含有率な約2〜10重量%の範囲に規制すJlば、膜厚
500″′A〜4000’Aの美しい透明金属酸化物被
膜が形成される。
As a result of examining the total content of organolead compounds and organosilicon compounds in the paste and the presence or absence of cracks in the formed coating, it was found that the total content was 10% by weight - 1% 'k t'BY, which means that no cracks occurred. There is an outbreak. On the other hand, if the total content is less than 2 M%, the amount is too small and it is almost impossible to form a film. Therefore, if the total content of organolead compounds and organosilicon compounds in the paste is controlled to be within the range of approximately 2 to 10% by weight, a beautiful transparent metal oxide coating with a film thickness of 500'' to 4000'A will be formed. is formed.

本発明は前述のような構成になっており、48産に適し
たスクリーン印刷が可能で、パターン化が容易な透明被
膜形成用ペーストならびに膜厚が比較的jνくても光透
過率ならびに絶縁性の高い透明被膜な形成することがで
きる。
The present invention has the above-mentioned structure, and can be screen printed suitable for 48cm, has a transparent film forming paste that is easy to pattern, and has light transmittance and insulation properties even if the film thickness is relatively jν. A highly transparent coating can be formed.

Claims (1)

【特許請求の範囲】 (1)、焼成によって酸化鉛−酸化ケイ素の被膜を形成
する化合物で有機溶剤に可溶な有機鉛化合物ならびに有
機ケイ素化合物と、増粘剤と、前記有機鉛化合物、有機
ケイ素化合物ならびに増粘剤を溶解する有機溶剤とから
なることを特徴とする透明被膜形成用ペースト。 (2、特許請求の範囲第(1)項記載において、前記有
機鉛化合物がオクチル酸鉛であること?特徴とする透明
被膜形成用ペースト。 (3)、牛テ許請求の範囲第(lj項記載において、前
記有機ケイ素化合物が、ビニルトリス(2−メトキシエ
トキシ)シランであることに%徴とする透明被膜形成用
ペースト。 (4)、特許請求の範囲第(1)項記載において、前記
増粘剤がセルロース化合物であることな特徴とする透明
被膜形成用ペースト。 (5)、特許請求の範囲第(1)項記載において、前記
有機鉛化合物および有機ケイ素化合物のペースト中にお
けるトータル含有率が約2〜10重りチの範囲に規制さ
ねていることを特徴とする透明被膜形成用ペースト。 (6)、焼成によって酸化鉛−酸化ケイ素の被膜を形成
する化合物で有機溶剤に可溶な有機鉛化合物ならびに有
機ケイ素化合物と、増粘剤と、前記有機鉛化合物、有機
ケイ素化合物yzらびに増粘剤を溶解する有機溶剤と?
混練したペーストを基板上に塗布し、焼成して酸化鉛−
酸化ケイ素の神np +形成したことな特徴とする、1
明被膜。 (7)、特許請求の範囲第(6)項記載において、前記
有機鉛化合物および有様ケイ素化合物のペースト中にお
けるトータル含有率が約2〜10重預悌の範囲に規制さ
れていることな特徴とする透明被膜。
[Scope of Claims] (1) an organic lead compound and an organic silicon compound which are compounds that form a lead oxide-silicon oxide film upon firing; a thickener; A paste for forming a transparent film characterized by comprising a silicon compound and an organic solvent that dissolves a thickener. (2. A paste for forming a transparent film characterized in that the organic lead compound is lead octylate in claim (1). (3) Claim (1) In the description, the paste for forming a transparent film is characterized in that the organosilicon compound is vinyltris(2-methoxyethoxy)silane. (4) In the description in claim (1), the thickening agent A paste for forming a transparent film, characterized in that the agent is a cellulose compound. (5) In claim (1), the total content of the organolead compound and the organosilicon compound in the paste is about A paste for forming a transparent film, characterized in that the weight is regulated in the range of 2 to 10. (6) Organic lead, which is a compound that forms a lead oxide-silicon oxide film by firing and is soluble in organic solvents. compound, an organosilicon compound, a thickener, and an organic solvent that dissolves the organolead compound, the organosilicon compound yz, and the thickener?
The kneaded paste is applied onto the substrate and fired to form lead oxide.
Silicon oxide god np + formed is characterized by 1
Bright film. (7) In claim (6), the total content of the organic lead compound and the silicon compound in the paste is regulated to a range of about 2 to 10 times the content. Transparent coating.
JP13789382A 1982-08-10 1982-08-10 Paste for forming transparent film and transparent film Pending JPS5927961A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13789382A JPS5927961A (en) 1982-08-10 1982-08-10 Paste for forming transparent film and transparent film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13789382A JPS5927961A (en) 1982-08-10 1982-08-10 Paste for forming transparent film and transparent film

Publications (1)

Publication Number Publication Date
JPS5927961A true JPS5927961A (en) 1984-02-14

Family

ID=15209135

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13789382A Pending JPS5927961A (en) 1982-08-10 1982-08-10 Paste for forming transparent film and transparent film

Country Status (1)

Country Link
JP (1) JPS5927961A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62278147A (en) * 1986-05-26 1987-12-03 Dainippon Printing Co Ltd Production of decorated tempered glass public phone booth
EP0365027A2 (en) * 1988-10-21 1990-04-25 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Process for making materials having a structured surface
JPH03126642A (en) * 1989-10-09 1991-05-29 Asahi Glass Co Ltd Production of glass with functional thin film

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5638472A (en) * 1979-09-06 1981-04-13 Tokyo Denshi Kagaku Kabushiki Formation of silica coating

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5638472A (en) * 1979-09-06 1981-04-13 Tokyo Denshi Kagaku Kabushiki Formation of silica coating

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62278147A (en) * 1986-05-26 1987-12-03 Dainippon Printing Co Ltd Production of decorated tempered glass public phone booth
EP0365027A2 (en) * 1988-10-21 1990-04-25 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Process for making materials having a structured surface
JPH03126642A (en) * 1989-10-09 1991-05-29 Asahi Glass Co Ltd Production of glass with functional thin film

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