JPS5927964A - Paste for forming transparent film and transparent film - Google Patents
Paste for forming transparent film and transparent filmInfo
- Publication number
- JPS5927964A JPS5927964A JP13789682A JP13789682A JPS5927964A JP S5927964 A JPS5927964 A JP S5927964A JP 13789682 A JP13789682 A JP 13789682A JP 13789682 A JP13789682 A JP 13789682A JP S5927964 A JPS5927964 A JP S5927964A
- Authority
- JP
- Japan
- Prior art keywords
- paste
- organic
- compound
- transparent film
- cerium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/27—Oxides by oxidation of a coating previously applied
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Paints Or Removers (AREA)
- Chemically Coating (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、ガラスやセラミックなどの基板上に形成され
る透明金属酸化物被膜に係り、更に詳しくはその透明被
膜が酸化セリウム−酸化ケイ素からなる透明被膜に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a transparent metal oxide film formed on a substrate such as glass or ceramic, and more particularly to a transparent film made of cerium oxide-silicon oxide. .
酸化セリウム−酸化ケイ素からなる透明金属酸化物被膜
の形成方法には、真空蒸着法、化学スプレー法ならびに
浸漬法などがある。ところで前記真空蒸着法は形成され
る被膜の特性は優わているが、量産性に問題があり、ま
拍パターン化に対応するためにはエツチングなどの処理
が必要であった。一方、化学スプレー法ならびに浸漬法
は比較的量産に適しているが、パターン化対応について
は前者と同様の問題がある、このように従来の方法では
一長一短があり、必ずしも優Jまた方法とは召い難い。Methods for forming a transparent metal oxide film made of cerium oxide-silicon oxide include a vacuum deposition method, a chemical spray method, and a dipping method. By the way, although the properties of the film formed by the vacuum evaporation method are excellent, there is a problem in mass production, and processing such as etching is required in order to correspond to the formation of a pattern. On the other hand, the chemical spray method and the dipping method are relatively suitable for mass production, but they have the same problems as the former when it comes to patterning.As described above, the conventional methods have advantages and disadvantages, and are not necessarily considered superior or superior methods. It's difficult.
本発明の目的は、このような従来技術の欠点な解消し7
、量産性に優れたスクリーン印刷が可能で、被膜特性の
良好な透明被膜形成用ペーストならびにそのペーストを
用いて形成した透明被膜を提供するにある。The object of the present invention is to overcome the drawbacks of the prior art.
An object of the present invention is to provide a paste for forming a transparent film that can be screen printed with excellent mass productivity and has good film properties, and a transparent film formed using the paste.
この目的な達成するため、本発明は、焼成によって酸化
セリウム−酸化ケイ素の被膜な形成する化合物で有機溶
剤に可溶な有機セリウム化合物ならびに有機ケイ素化合
物と、増粘剤と、こわら有機セリウム化合物、有機ケイ
素化合物ならびに増粘剤を溶解する有機溶剤とを混練し
て透明被膜形成用ペーストとすることを特徴とするもの
である。To achieve this objective, the present invention comprises an organic cerium compound which forms a cerium oxide-silicon oxide film by firing, an organic solvent-soluble organic cerium compound, an organic silicon compound, a thickener, and a stiff organic cerium compound. The present invention is characterized in that an organosilicon compound and an organic solvent that dissolves a thickener are kneaded to form a paste for forming a transparent film.
前記目的な達成するため、さらに本発明は、焼成によっ
て酸化セリウム−酸化ケイ素の被膜な形成する化合物で
有機溶剤に可溶な有機セリウム化合物ならびに有機ケイ
素化合物と、増粘剤と、こわら有機セリウム化合物、有
機ケイ素化合物ならびに増粘剤な溶解する有機溶剤とを
混練したペーストな基板上に塗布し、焼成して酸化セリ
ウム−酸化ケイ素の透明被膜としたことを特徴とするも
のである。In order to achieve the above object, the present invention further provides an organic cerium compound and an organic silicon compound which are compounds that form a cerium oxide-silicon oxide film by firing, and which are soluble in an organic solvent, a thickener, and a stiff organic cerium compound. The compound, an organosilicon compound, and a soluble organic solvent such as a thickener are kneaded and coated on a paste substrate, which is then baked to form a transparent film of cerium oxide-silicon oxide.
本発明に用いられる前記有機セリウム化合物としては、
トリスアセチルアセトナートセリウムが好適である。The organic cerium compound used in the present invention includes:
Cerium trisacetylacetonate is preferred.
また本発明に用いらJする前記有機ケイ素化合物として
は、ビニルトリス(2−メトキシエトキシ)シランが好
適である。Furthermore, vinyltris(2-methoxyethoxy)silane is suitable as the organosilicon compound used in the present invention.
さらに本発明に用いられる増粘剤としては、ニトロセル
ロースやエチルセルロースなどのセルロース化合物が好
適である。Further, as the thickener used in the present invention, cellulose compounds such as nitrocellulose and ethylcellulose are suitable.
前記有機セリウム化合物、有機ケイ素化合物ならびに増
粘剤を溶解する有機溶剤としては、ターヒネオール、2
−エチルヘキサノール、ベンジルアルコールなどの高沸
点アルコール類、ベルジルアセテート、ジメチルフタレ
ートなどの高沸点エステル類、カルピトール、プチルカ
ルピト・−ル。Examples of the organic solvent that dissolves the organic cerium compound, the organic silicon compound, and the thickener include terhineol, 2
- High boiling point alcohols such as ethylhexanol and benzyl alcohol, high boiling point esters such as verzyl acetate and dimethyl phthalate, calpitol and butyl carpitol.
ブチルセロソルブなどの高沸点アルコールエーテル類な
どが用いらJする。High boiling point alcohol ethers such as butyl cellosolve are used.
有機セリウム化合物と有機ケイ素化合物と増粘剤と有機
溶剤とな所定の割合に混合してペーストな・つくり、所
望の形状にパターン化されたスクリーン版も・用いて前
記ペーストなガラスやセラミックなどの基板上にスクリ
ーン印刷する。こわケ予備乾燥後に約400℃以上の温
度で焼成することにより、酸化セリウム−酸化ケイ素の
透明被膜h″−−所望ターンに形成される。この被膜は
透明であることは勿論、膜強度が犬で、比較的病い絶縁
性を有している。また、ペースト中の有機セリウム化合
物と有機ケイ素化合物のトータル量な適当にコントロー
ルすることにより、20006八以下の被膜を自由に形
成することができる。A paste is made by mixing an organocerium compound, an organosilicon compound, a thickener, and an organic solvent in a predetermined ratio, and a screen plate patterned into a desired shape is also used to make the paste into glass, ceramic, etc. Screen print onto the board. By baking at a temperature of about 400°C or higher after pre-drying, a cerium oxide-silicon oxide transparent film h'' is formed in the desired turn.This film is not only transparent but also has a high film strength. It has relatively poor insulation properties.Furthermore, by appropriately controlling the total amount of organic cerium compounds and organic silicon compounds in the paste, it is possible to freely form a film of 20,006 or less. .
次に本発明の実施例について説明する。Next, examples of the present invention will be described.
有機セリウム化合物としてトリアセチルアセトナートセ
リウムな有機ケイ素化合物としてビニルトリス(2−メ
トキシエトキシ)シランな用い、こわら有機化合物の混
合比な種々変えて次のような組成のペース)k作成した
。The following compositions were prepared by using triacetylacetonate and cerium as the organic cerium compound, vinyltris(2-methoxyethoxy)silane as the organic silicon compound, and varying the mixing ratio of the organic compounds.
〔有機化合物〕 15重付係ヒフ、□)リ
ス(2−メト4′シ“c) −+7) □ 58
丁3.量チシラン
(X+Y=100)
〔増粘剤] 14ili!?3’チ
ニトロセルロース 14重叶チ
〔有機溶剤〕 71重i’r%ブチルセ
ロソルブ 355重9%
ブチルカルピトール 355重@係
また、比較のため有機化合物としてトリアセチルアセト
ナートセリウムならびにビニルトリス(2−メトキシエ
トキシ)シランなそわぞわ単独に用いて同オ8βにペー
ストを作成した。[Organic compounds] 15-layered Hif, □) Squirrel (2-meth4'c) -+7) □ 58
Ding 3. Amount Tisilane (X+Y=100) [Thickener] 14ili! ? 3'tinitrocellulose 14-fold organic solvent [Organic solvent] 71% by weight Butyl cellosolve 355% by weight Butylcarpitol 355% by weight Also, for comparison, organic compounds such as cerium triacetylacetonate and vinyltris (2-methoxy A paste was made using the same O8β using ethoxysilane Sowazowa alone.
こわら各ペーストl?<、250メツシユでレジスト厚
10μmのステンレスネットからなるスクリーン版ケ用
いてソーダガラス基板上に印刷する。Each stiff paste? 250 meshes and a screen plate made of stainless steel net with a resist thickness of 10 μm was used to print on a soda glass substrate.
そ[−で150℃で15分間予備乾燥し、引き続き50
0℃で30分間焼成してそJ7ぞ牙7這明金属酸化物被
膜な形成する。Pre-dry at 150°C for 15 minutes, then dry at 50°C.
After firing at 0° C. for 30 minutes, a clear metal oxide film was formed on the J7 teeth.
この各透明被膜の膜特性な調べた結果な次の表に示す。The film characteristics of each transparent film were investigated and the results are shown in the following table.
なお表中のO印はR好、△印はやや悪い。Note that in the table, O marks indicate good R, and △ marks indicate somewhat poor results.
X印は悪いと判断したものな示す。また膜強度はペンシ
ル型ひっかき試駆を用いて調べ、光透過率は可視部での
最小光透過率を示す。An X mark indicates something that has been judged to be bad. The film strength was examined using a pencil-type scratch test, and the light transmittance indicates the minimum light transmittance in the visible region.
表
この表から明らかなように、本発明のように有機溶剤に
可溶な有機セリウム化合物と有機ケイ素化合物とな含む
ペーストを用いて形成された透明金属酸化物被膜は、膜
厚が比較的厚くても可視部のた一小光透過率が高く、し
かも高い軍、包絶縁性?有していて)。また本発明のペ
ーストな用いたものは、スクリーン印刷性が良好で、印
刷表面が非常にぎわいである。Table As is clear from this table, the transparent metal oxide film formed using the paste containing an organic cerium compound and an organosilicon compound soluble in an organic solvent as in the present invention has a relatively thick film thickness. Even if the visible part has only a small amount of light transmittance, it also has high military insulation. ). Furthermore, the paste used in the present invention has good screen printability and the printed surface is very sharp.
ペースト中におけろ有機セリウム化合物と有機ケイ素化
合物とのトータル含有率と形成された被膜のクラック発
生の有無について検討した結果、前記トータル含有率が
30重量俤な越えるとクラックの発生がある。一方、ト
ータル含有率が2重量−未満では少量過ぎて被膜の形成
がほとんど不可能である。従ってペースト中における有
機セリウム化合物と有機ケイ素化合物とのトータル含有
率な約2〜30重量%の範囲に規制すわば、膜厚500
°A〜2000°への美しい透明金属酸化物被膜が形成
される。As a result of examining the total content of organic cerium compounds and organic silicon compounds in the paste and the occurrence of cracks in the formed film, it was found that cracks occur when the total content exceeds 30% by weight. On the other hand, if the total content is less than 2% by weight, the amount is too small and it is almost impossible to form a film. Therefore, the total content of organocerium compounds and organosilicon compounds in the paste is regulated to a range of about 2 to 30% by weight, which means that the film thickness is 500%.
Beautiful transparent metal oxide coatings are formed from °A to 2000°.
本発明は前述のような構成になっており、り産に適した
スクリーン印刷が可能で、パターン化が容易な透明被膜
形成用ペーストならびに膜厚が比較的厚くても光透過率
ならびに絶縁性の高い透明被膜を形成することができる
。The present invention has the above-mentioned structure, and can be screen printed suitable for production, and has a transparent film forming paste that can be easily patterned, as well as a paste that has good light transmittance and insulation properties even if the film is relatively thick. A highly transparent film can be formed.
Claims (1)
な形成する化合物で有機溶剤に可溶な有機セリウム化合
物ならびに有機ケイ素化合物と、増粘剤と、前記有機セ
リウム化合物、有機ケイ素化合物ならびに増粘剤を溶解
する有機溶剤とからなることを特徴とする透明被膜形成
用ペースト。 (2、特許請求の範囲第(1)項記載において、前記有
機セリウム化合物が、トリアセチルアセトナートセリウ
ムであることな特徴とする透明被膜形成用ペースト。 (3)、特許請求の範囲第(1)項記載において、前記
有機ケイ素化合物が、ビニルトリス(2−メトキシエト
キシ)シランであることに%徴とする透明被膜形成用ペ
ースト。 (4)、特許請求の範囲第(1)項記載において、前記
増粘剤がセルロース化合物であることを特徴とする透明
被膜形成用ペースト。 (5)、特許請求の範囲第(1)項記載において、前記
有機セリウム化合物および有機ケイ素化合物のペースト
中におけるトータル含有率が約2〜30重景チの範囲に
規制さねていることを特徴とする透明被膜形成用ペース
ト。 (6)、焼成によって酸化セリウム−酸化ケイ素の被膜
な形成する化合物で有機溶剤に可溶な有機セリウム化合
物な、らびに有機ケイ素化合物と、増粘剤と、前記有機
セリウム化合物、有機ケイ素化合物ならびに増粘剤な溶
解する有機溶剤とを混練したペーストな基板上に塗布し
、焼成して酸化セリウム−酸化ケイ素の被膜を形成した
ことケ特徴とする透明被膜。 (7)、特許請求の範囲第(6)項記載において、前記
有機セリウム化合物および有機ケイ素化合物のペースト
中におけるトータル含有率が約2〜30重月チの範囲に
規制されていることな特徴とする透明被膜。[Scope of Claims] (1) An organic cerium compound and an organic silicon compound which are compounds that form a cerium oxide-silicon oxide film by firing, a thickener, the organic cerium compound, an organic A paste for forming a transparent film characterized by comprising a silicon compound and an organic solvent that dissolves a thickener. (2) A paste for forming a transparent film according to claim (1), characterized in that the organic cerium compound is cerium triacetylacetonate. (3) Claim (1) ), wherein the organosilicon compound is vinyltris(2-methoxyethoxy)silane. (4) In claim (1), the paste A paste for forming a transparent film, characterized in that the thickener is a cellulose compound. (5) In claim (1), the total content of the organic cerium compound and the organic silicon compound in the paste. A paste for forming a transparent film, characterized in that the particle size is regulated to a range of about 2 to 30 times. An organic cerium compound, an organic silicon compound, a thickener, and an organic solvent that dissolves the organic cerium compound, the organic silicon compound, and the thickener are kneaded together and then applied onto a paste substrate and fired. A transparent coating characterized by forming a cerium oxide-silicon oxide coating. (7) In claim (6), the total content of the organic cerium compound and the organic silicon compound in the paste is A transparent film characterized by being regulated within a range of approximately 2 to 30 times.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13789682A JPS5927964A (en) | 1982-08-10 | 1982-08-10 | Paste for forming transparent film and transparent film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13789682A JPS5927964A (en) | 1982-08-10 | 1982-08-10 | Paste for forming transparent film and transparent film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5927964A true JPS5927964A (en) | 1984-02-14 |
JPH0144788B2 JPH0144788B2 (en) | 1989-09-29 |
Family
ID=15209203
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13789682A Granted JPS5927964A (en) | 1982-08-10 | 1982-08-10 | Paste for forming transparent film and transparent film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5927964A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62278147A (en) * | 1986-05-26 | 1987-12-03 | Dainippon Printing Co Ltd | Production of decorated tempered glass public phone booth |
JPH03126642A (en) * | 1989-10-09 | 1991-05-29 | Asahi Glass Co Ltd | Production of glass with functional thin film |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5774366A (en) * | 1980-10-28 | 1982-05-10 | Tokyo Denshi Kagaku Kabushiki | Cerium oxide film-forming coating solution and method of forming film thereof |
-
1982
- 1982-08-10 JP JP13789682A patent/JPS5927964A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5774366A (en) * | 1980-10-28 | 1982-05-10 | Tokyo Denshi Kagaku Kabushiki | Cerium oxide film-forming coating solution and method of forming film thereof |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62278147A (en) * | 1986-05-26 | 1987-12-03 | Dainippon Printing Co Ltd | Production of decorated tempered glass public phone booth |
JPH03126642A (en) * | 1989-10-09 | 1991-05-29 | Asahi Glass Co Ltd | Production of glass with functional thin film |
Also Published As
Publication number | Publication date |
---|---|
JPH0144788B2 (en) | 1989-09-29 |
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