JPS6310844B2 - - Google Patents

Info

Publication number
JPS6310844B2
JPS6310844B2 JP55162776A JP16277680A JPS6310844B2 JP S6310844 B2 JPS6310844 B2 JP S6310844B2 JP 55162776 A JP55162776 A JP 55162776A JP 16277680 A JP16277680 A JP 16277680A JP S6310844 B2 JPS6310844 B2 JP S6310844B2
Authority
JP
Japan
Prior art keywords
organic
film
paste
compound
insulating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55162776A
Other languages
Japanese (ja)
Other versions
JPS5787469A (en
Inventor
Yoshimi Kamijo
Mitsuru Kano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alps Alpine Co Ltd
Original Assignee
Alps Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alps Electric Co Ltd filed Critical Alps Electric Co Ltd
Priority to JP55162776A priority Critical patent/JPS5787469A/en
Publication of JPS5787469A publication Critical patent/JPS5787469A/en
Publication of JPS6310844B2 publication Critical patent/JPS6310844B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Liquid Crystal (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Paints Or Removers (AREA)
  • Inorganic Insulating Materials (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は、液晶セル等の透明絶縁被膜に係り、
特に液晶セルの下部基板等よりのアルカリイオン
溶出防止膜、基板上に形成された電極層と、液晶
層とを分離する絶縁膜、TN型液晶表示装置等に
おける液晶配向膜、などとして用いられる透明絶
縁被膜を形成するための透明絶縁被膜形成用ペー
ストに関する。 従来、この種の透明絶縁被膜は、SiO2を主成
分とした膜で、真空蒸着法、浸漬法などにより形
成していた。しかし、真空蒸着法は、生産性が悪
るく、設備も大型になりがちであつた。又、浸漬
法は、不必要な箇所にも被膜が形成され、パター
ンの微細化に対応できない欠点があつた。 これらの欠点を解消するため、スクリーン印刷
法により基板上等にペーストを所望形状に印刷
し、焼成して透明絶縁被膜を形成する方法が試み
られているが、形成された被膜は、もろく、ポー
ラスであることが多く、被膜自体の特性は、真空
蒸着法、浸漬法により形成された被膜より劣つて
いた。 又、液晶セルなどに使用されている透明電極材
料に、In−Sn系酸化物被膜を用いた場合、外部
からの光が電極部分で反射し、表示装置が非点燈
時にでも、見る角度により電極が見えてしまう欠
点があつた。 本発明は、従来の欠点を解消し、緻密で、被膜
強度大、電気絶縁性良好、さらに外部光の電極反
射防止効果大であるスクリーン印刷法にて形成可
能な絶縁被膜を提供する目的でなされたものであ
る。 本発明の特徴は有機チタン化合物と有機ジルコ
ニウム化合物と有機シリコン化合物との混合物を
有機溶媒に溶解し、粘性剤を添加混合し、ペース
ト化し、スクリーン印刷法により絶縁被膜を形成
可能ならしめたことにある。 即ち、SiO2に、被膜に外部光の電極反射防止
効果をもたらすTiO2と、ペーストの成膜性を良
くし、印刷性を良くする効果のあるZrO2とを添
加することにより被膜特性の向上を計つたことに
ある。 透明絶縁被膜をスクリーン印刷法にて形成可能
ならしめるためには、チタン化合物、シリコン化
合物、ジルコニウム化合物が、高沸点(180゜以
上)有機溶媒に安定する溶解する必要があり、か
つ、ペーストの焼成温度450〜700℃で完全に酸化
物となるものでなければならず、テトラオクチレ
ングリコールチタネート(TOG)等の有機チタ
ン化合物、ビニルトリス(2−メトキシエトキ
シ)シラン(V−5000)等の有機シリコン化合
物、テトラアセチルアセトナートジルコニウム
(Zr(acac)4)等の有機ジルコニウム化合物が該
当する。 ペースト作成に、必要な有機溶媒としては、こ
れら有機金属化合物の混合物に反応性が乏しく、
沸点が180〜350℃である必要があり、ベンジルア
ルコール、ジプロピレングリコール、2エチルヘ
キサノール等の高沸点アルコール類、ベンジルア
セテート、カルビトールアセテート等の高沸点エ
ステル類、プチルセロソルブなどの高沸点エーテ
ル類、などの高沸点有機溶媒が適用でき、二種以
上の溶媒を混合使用してよい。又粘性剤として
は、前記有機溶媒に対する溶解能がよく、焼成温
度である450〜700℃で完全に熱分解するものでな
くてはならない。この条件を満たすものとして、
エチルセルローズ、ニトロセルローズ等のセルロ
ーズ系粘性剤が適用できる。 本発明ペーストを、スクリーン印刷により、ガ
ラス基板等の絶縁基板上に塗布し、焼成して得ら
れる絶縁被膜は、緻密で、被膜強度大、電気絶縁
性良好、さらに外部光の電極反射防止効果大であ
つた。 以上実施例をもとに、本発明をさらに詳しく説
明する。 実施例 有機チタン化合物として、テトラオクチレング
リコールチタネート(TOG)、有機シリコン化合
物として、ビニルトリス(2−メトキシエトキ
シ)シラン(V−5000)、有機ジルコニウム化合
物として、テトラアセチルアセトナートジルコニ
ウム(Zr(acac)4)を用い、これら有機金属化合
物の混合比を変え、下記の組成によりペーストを
作成した。 金属部(TOG+V−5000+Zr(acac)4) 5wt% 溶媒部(ブチルセロソルブ) 83wt% 粘性剤(エチルセルローズ) 12wt% 又、金属部として、有機シリコン化合物V−
5000のみを用いてペーストを作成し、比較例とし
た。作成したペーストを、ステン250メツシユ、
レジスト厚10μmのスクリーン版を用いてソーダ
ガラス絶縁基板上に印刷し、150℃で15分間予備
乾燥し、500℃で30分間焼成し、被膜を形成した。 第1表は、これら被膜の特性比較結果である。
The present invention relates to a transparent insulating coating for liquid crystal cells, etc.
In particular, a transparent film used as a film to prevent alkali ion elution from the lower substrate of a liquid crystal cell, an insulating film that separates an electrode layer formed on a substrate from a liquid crystal layer, a liquid crystal alignment film in a TN type liquid crystal display device, etc. The present invention relates to a paste for forming a transparent insulating film for forming an insulating film. Conventionally, this type of transparent insulating film is a film mainly composed of SiO 2 and has been formed by vacuum evaporation, dipping, or the like. However, the vacuum deposition method has poor productivity and tends to require large equipment. In addition, the dipping method has the disadvantage that a film is formed in unnecessary locations and cannot correspond to finer patterns. In order to overcome these drawbacks, attempts have been made to print a paste into a desired shape onto a substrate using screen printing and bake it to form a transparent insulating film, but the formed film is brittle and porous. In many cases, the properties of the film itself were inferior to those formed by vacuum evaporation or immersion methods. Furthermore, when an In-Sn-based oxide film is used as the transparent electrode material used in liquid crystal cells, external light is reflected at the electrode part, and even when the display device is not lit, depending on the viewing angle, There was a drawback that the electrodes were visible. The present invention has been made for the purpose of solving the conventional drawbacks and providing an insulating coating that can be formed by screen printing, which is dense, has high coating strength, has good electrical insulation, and has a great effect of preventing electrode reflection of external light. It is something that The feature of the present invention is that an insulating film can be formed by dissolving a mixture of an organic titanium compound, an organic zirconium compound, and an organic silicon compound in an organic solvent, adding and mixing a viscous agent, making a paste, and using a screen printing method. be. In other words, the film properties are improved by adding TiO 2 to SiO 2 , which has the effect of preventing external light from reflecting on the electrode, and ZrO 2 , which has the effect of improving paste film formation and printability. This is because we measured the In order to be able to form a transparent insulating film by screen printing, the titanium compound, silicon compound, and zirconium compound must be stably dissolved in an organic solvent with a high boiling point (180° or higher), and the paste must be baked. It must completely become an oxide at a temperature of 450 to 700°C, and organic titanium compounds such as tetraoctylene glycol titanate (TOG) and organic silicones such as vinyltris(2-methoxyethoxy)silane (V-5000) This includes organic zirconium compounds such as zirconium tetraacetylacetonate (Zr(acac) 4 ). The organic solvent required for paste preparation is a mixture of these organometallic compounds, which has poor reactivity.
The boiling point must be 180 to 350℃, and high-boiling point alcohols such as benzyl alcohol, dipropylene glycol, and 2-ethylhexanol, high-boiling point esters such as benzyl acetate and carbitol acetate, and high-boiling point ethers such as butyl cellosolve are required. , etc. can be applied, and two or more types of solvents may be used in combination. The viscosity agent must also have good solubility in the organic solvent and be completely thermally decomposed at the firing temperature of 450 to 700°C. As long as this condition is met,
Cellulose-based viscosity agents such as ethylcellulose and nitrocellulose can be used. The insulating coating obtained by applying the paste of the present invention onto an insulating substrate such as a glass substrate by screen printing and baking it is dense, has high coating strength, has good electrical insulation, and has a high effect of preventing electrode reflection of external light. It was hot. The present invention will be explained in more detail based on the above embodiments. Examples Tetraoctylene glycol titanate (TOG) is used as an organic titanium compound, vinyltris(2-methoxyethoxy)silane (V-5000) is used as an organic silicon compound, and tetraacetylacetonate zirconium (Zr(acac) is used as an organic zirconium compound. 4 ), pastes were prepared with the following compositions by changing the mixing ratio of these organometallic compounds. Metal part (TOG + V-5000 + Zr (acac) 4 ) 5wt% Solvent part (butyl cellosolve) 83wt% Viscous agent (ethyl cellulose) 12wt% In addition, as the metal part, organic silicon compound V-
A paste was prepared using only 5000 and used as a comparative example. Add the paste you created to 250 meters of stainless steel,
A screen plate with a resist thickness of 10 μm was used to print on a soda glass insulating substrate, pre-dried at 150° C. for 15 minutes, and baked at 500° C. for 30 minutes to form a film. Table 1 shows the results of comparing the characteristics of these films.

【表】 ×:不良 ○:良好
本発明ペーストは、成膜性良く、さらに、第1
表よりわかるように、得られる被膜は、密着強度
良好、絶縁性良く、又、銀白色透明であるので、
外部光の電極反射防止効果大で、液晶表示素子用
透明絶縁膜として好適なものである。
[Table] ×: Bad ○: Good
The paste of the present invention has good film forming properties, and also has a first
As can be seen from the table, the resulting coating has good adhesion strength, good insulation properties, and is silvery white and transparent.
It has a great effect of preventing electrode reflection of external light and is suitable as a transparent insulating film for liquid crystal display devices.

Claims (1)

【特許請求の範囲】[Claims] 1 酸素の直接結合した有機チタン化合物と、有
機シリコン化合物と、有機ジルコニウム化合物と
の混合物を有機溶媒に溶解し、さらに粘性剤を添
加混合して得られる透明絶縁被膜形成用ペース
ト。
1. A paste for forming a transparent insulating film obtained by dissolving a mixture of an organic titanium compound to which oxygen is directly bonded, an organic silicon compound, and an organic zirconium compound in an organic solvent, and further adding and mixing a viscosity agent.
JP55162776A 1980-11-19 1980-11-19 Transparent insulating film and paste for forming the same Granted JPS5787469A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55162776A JPS5787469A (en) 1980-11-19 1980-11-19 Transparent insulating film and paste for forming the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55162776A JPS5787469A (en) 1980-11-19 1980-11-19 Transparent insulating film and paste for forming the same

Publications (2)

Publication Number Publication Date
JPS5787469A JPS5787469A (en) 1982-05-31
JPS6310844B2 true JPS6310844B2 (en) 1988-03-09

Family

ID=15760997

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55162776A Granted JPS5787469A (en) 1980-11-19 1980-11-19 Transparent insulating film and paste for forming the same

Country Status (1)

Country Link
JP (1) JPS5787469A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6290621A (en) * 1985-10-17 1987-04-25 Alps Electric Co Ltd Transparent insulating coating film and solution for forming the same
JPH0253001U (en) * 1988-10-06 1990-04-17

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5240354A (en) * 1975-09-26 1977-03-29 Nippon Kogaku Kk <Nikon> Display unit in which electrooptical fluid is filled

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5240354A (en) * 1975-09-26 1977-03-29 Nippon Kogaku Kk <Nikon> Display unit in which electrooptical fluid is filled

Also Published As

Publication number Publication date
JPS5787469A (en) 1982-05-31

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