JPS61160742A - レジストの現像液 - Google Patents

レジストの現像液

Info

Publication number
JPS61160742A
JPS61160742A JP60001640A JP164085A JPS61160742A JP S61160742 A JPS61160742 A JP S61160742A JP 60001640 A JP60001640 A JP 60001640A JP 164085 A JP164085 A JP 164085A JP S61160742 A JPS61160742 A JP S61160742A
Authority
JP
Japan
Prior art keywords
resist
acetone
methyl ethyl
ethyl ketone
developer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60001640A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0562734B2 (cg-RX-API-DMAC10.html
Inventor
Katsumi Tanigaki
勝己 谷垣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP60001640A priority Critical patent/JPS61160742A/ja
Publication of JPS61160742A publication Critical patent/JPS61160742A/ja
Publication of JPH0562734B2 publication Critical patent/JPH0562734B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/18—Diazo-type processes, e.g. thermal development, or agents therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60001640A 1985-01-09 1985-01-09 レジストの現像液 Granted JPS61160742A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60001640A JPS61160742A (ja) 1985-01-09 1985-01-09 レジストの現像液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60001640A JPS61160742A (ja) 1985-01-09 1985-01-09 レジストの現像液

Publications (2)

Publication Number Publication Date
JPS61160742A true JPS61160742A (ja) 1986-07-21
JPH0562734B2 JPH0562734B2 (cg-RX-API-DMAC10.html) 1993-09-09

Family

ID=11507121

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60001640A Granted JPS61160742A (ja) 1985-01-09 1985-01-09 レジストの現像液

Country Status (1)

Country Link
JP (1) JPS61160742A (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08262738A (ja) * 1995-03-27 1996-10-11 Agency Of Ind Science & Technol 微細パターン形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08262738A (ja) * 1995-03-27 1996-10-11 Agency Of Ind Science & Technol 微細パターン形成方法

Also Published As

Publication number Publication date
JPH0562734B2 (cg-RX-API-DMAC10.html) 1993-09-09

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