JPS61147876A - ジルコニウム系層状化合物薄膜の製造方法 - Google Patents
ジルコニウム系層状化合物薄膜の製造方法Info
- Publication number
- JPS61147876A JPS61147876A JP26880584A JP26880584A JPS61147876A JP S61147876 A JPS61147876 A JP S61147876A JP 26880584 A JP26880584 A JP 26880584A JP 26880584 A JP26880584 A JP 26880584A JP S61147876 A JPS61147876 A JP S61147876A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- zrnx
- ammonia
- zirconium
- halide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 47
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 150000003755 zirconium compounds Chemical class 0.000 title abstract 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 36
- -1 zirconium halide Chemical class 0.000 claims abstract description 15
- 229910021529 ammonia Inorganic materials 0.000 claims abstract description 11
- 239000013078 crystal Substances 0.000 claims abstract description 11
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 11
- 239000000203 mixture Substances 0.000 claims abstract description 9
- 239000011261 inert gas Substances 0.000 claims abstract description 6
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 4
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims abstract description 4
- 239000000758 substrate Substances 0.000 claims description 6
- 238000010574 gas phase reaction Methods 0.000 claims description 3
- 150000002367 halogens Chemical class 0.000 claims description 3
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical class [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 21
- 239000010408 film Substances 0.000 abstract description 19
- 238000006243 chemical reaction Methods 0.000 abstract description 15
- 229910000069 nitrogen hydride Inorganic materials 0.000 abstract description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 6
- 239000010453 quartz Substances 0.000 abstract description 4
- 230000009466 transformation Effects 0.000 abstract description 3
- 239000007787 solid Substances 0.000 abstract description 2
- 239000012808 vapor phase Substances 0.000 abstract 2
- 239000007789 gas Substances 0.000 description 11
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 7
- 238000002441 X-ray diffraction Methods 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 5
- 239000006104 solid solution Substances 0.000 description 5
- 230000002194 synthesizing effect Effects 0.000 description 5
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 230000002687 intercalation Effects 0.000 description 4
- 238000009830 intercalation Methods 0.000 description 4
- LSWWNKUULMMMIL-UHFFFAOYSA-J zirconium(iv) bromide Chemical compound Br[Zr](Br)(Br)Br LSWWNKUULMMMIL-UHFFFAOYSA-J 0.000 description 4
- 235000019270 ammonium chloride Nutrition 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 229910007932 ZrCl4 Inorganic materials 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000009776 industrial production Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910007938 ZrBr4 Inorganic materials 0.000 description 1
- LPOWNNVYVAXLTD-UHFFFAOYSA-M [Br-].[Zr+] Chemical compound [Br-].[Zr+] LPOWNNVYVAXLTD-UHFFFAOYSA-M 0.000 description 1
- 150000003868 ammonium compounds Chemical class 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
- 239000012433 hydrogen halide Substances 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 239000007784 solid electrolyte Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000002211 ultraviolet spectrum Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
- QSGNKXDSTRDWKA-UHFFFAOYSA-N zirconium dihydride Chemical compound [ZrH2] QSGNKXDSTRDWKA-UHFFFAOYSA-N 0.000 description 1
- 229910000568 zirconium hydride Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/225—Nitrides
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26880584A JPS61147876A (ja) | 1984-12-20 | 1984-12-20 | ジルコニウム系層状化合物薄膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26880584A JPS61147876A (ja) | 1984-12-20 | 1984-12-20 | ジルコニウム系層状化合物薄膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61147876A true JPS61147876A (ja) | 1986-07-05 |
| JPH0535222B2 JPH0535222B2 (enExample) | 1993-05-26 |
Family
ID=17463509
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26880584A Granted JPS61147876A (ja) | 1984-12-20 | 1984-12-20 | ジルコニウム系層状化合物薄膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61147876A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU230878U1 (ru) * | 2024-03-04 | 2024-12-23 | Общество с ограниченной ответственностью "НПО "Защитные покрытия" (ООО "НПО "Защитные покрытия") | Устройство для осаждения нитрида циркония |
-
1984
- 1984-12-20 JP JP26880584A patent/JPS61147876A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU230878U1 (ru) * | 2024-03-04 | 2024-12-23 | Общество с ограниченной ответственностью "НПО "Защитные покрытия" (ООО "НПО "Защитные покрытия") | Устройство для осаждения нитрида циркония |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0535222B2 (enExample) | 1993-05-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS61223183A (ja) | 菱面体晶系窒化ホウ素の製造方法 | |
| US3650815A (en) | Chemical vapor deposition of dielectric thin films of rutile | |
| JPS6283306A (ja) | 透明なbn系セラミックス材料 | |
| EP0967008B1 (en) | Process for preparing a film of titanium dioxide and silicon dioxide | |
| KR930010711B1 (ko) | 박막 형성 방법 | |
| JPS61147876A (ja) | ジルコニウム系層状化合物薄膜の製造方法 | |
| US5232868A (en) | Method for forming a thin semiconductor film | |
| JPH04180566A (ja) | 薄膜形成装置 | |
| DE1621358A1 (de) | Verfahren zur Aufbringung duenner Filme aus dielektrischem Material auf ein Substrat | |
| JPH064520B2 (ja) | 酸化物薄膜の製造法 | |
| JPH04362017A (ja) | 配向性Ta2O5薄膜の作製方法 | |
| JPS61149477A (ja) | 窒化ホウ素膜の形成方法 | |
| JPH06340422A (ja) | チタン酸化物薄膜の製造方法 | |
| JPH0582963B2 (enExample) | ||
| JPS6355197A (ja) | 高純度ダイヤモンドの製造方法 | |
| JPS6240377A (ja) | 窒化アンチモンの作製方法 | |
| JPS6140755B2 (enExample) | ||
| JPS6240378A (ja) | 窒化スズの作製方法 | |
| JPH01104763A (ja) | 金属化合物薄膜の製造方法 | |
| JPH0420982B2 (enExample) | ||
| JPH0244022A (ja) | 多結晶シリコンの製法 | |
| JPH04136173A (ja) | 合成膜の析出方法 | |
| JPH01312073A (ja) | Bn膜形成方法 | |
| RU1775491C (ru) | Способ получени пленок окиси цинка | |
| JPS63128180A (ja) | 機能性酸化すず薄膜の形成方法 |