JPS61139670A - 表面処理装置 - Google Patents

表面処理装置

Info

Publication number
JPS61139670A
JPS61139670A JP26149284A JP26149284A JPS61139670A JP S61139670 A JPS61139670 A JP S61139670A JP 26149284 A JP26149284 A JP 26149284A JP 26149284 A JP26149284 A JP 26149284A JP S61139670 A JPS61139670 A JP S61139670A
Authority
JP
Japan
Prior art keywords
electrodes
grounded
plasma
magnetic field
pseudo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP26149284A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0557356B2 (enrdf_load_stackoverflow
Inventor
Kiyoushiyoku Kin
金　京植
Uirukinson Ooen
オーエン　ウイルキンソン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP26149284A priority Critical patent/JPS61139670A/ja
Publication of JPS61139670A publication Critical patent/JPS61139670A/ja
Publication of JPH0557356B2 publication Critical patent/JPH0557356B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP26149284A 1984-12-11 1984-12-11 表面処理装置 Granted JPS61139670A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26149284A JPS61139670A (ja) 1984-12-11 1984-12-11 表面処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26149284A JPS61139670A (ja) 1984-12-11 1984-12-11 表面処理装置

Publications (2)

Publication Number Publication Date
JPS61139670A true JPS61139670A (ja) 1986-06-26
JPH0557356B2 JPH0557356B2 (enrdf_load_stackoverflow) 1993-08-23

Family

ID=17362659

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26149284A Granted JPS61139670A (ja) 1984-12-11 1984-12-11 表面処理装置

Country Status (1)

Country Link
JP (1) JPS61139670A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6389671A (ja) * 1986-10-03 1988-04-20 Ulvac Corp 磁場励起式プラズマｃｖｄ装置
JPH02224239A (ja) * 1988-05-23 1990-09-06 Nippon Telegr & Teleph Corp <Ntt> プラズマエッチング装置
US7378001B2 (en) 2000-07-27 2008-05-27 Aviza Europe Limited Magnetron sputtering

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5812347A (ja) * 1981-07-15 1983-01-24 Toshiba Corp 半導体ウエ−ハ
JPS5927212A (ja) * 1982-08-06 1984-02-13 Hitachi Cable Ltd 水底に布設されたケ−ブルの着地状態調査装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5812347A (ja) * 1981-07-15 1983-01-24 Toshiba Corp 半導体ウエ−ハ
JPS5927212A (ja) * 1982-08-06 1984-02-13 Hitachi Cable Ltd 水底に布設されたケ−ブルの着地状態調査装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6389671A (ja) * 1986-10-03 1988-04-20 Ulvac Corp 磁場励起式プラズマｃｖｄ装置
JPH02224239A (ja) * 1988-05-23 1990-09-06 Nippon Telegr & Teleph Corp <Ntt> プラズマエッチング装置
US7378001B2 (en) 2000-07-27 2008-05-27 Aviza Europe Limited Magnetron sputtering

Also Published As

Publication number Publication date
JPH0557356B2 (enrdf_load_stackoverflow) 1993-08-23

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term