JPS61124588A - Spray type etching device - Google Patents

Spray type etching device

Info

Publication number
JPS61124588A
JPS61124588A JP24375884A JP24375884A JPS61124588A JP S61124588 A JPS61124588 A JP S61124588A JP 24375884 A JP24375884 A JP 24375884A JP 24375884 A JP24375884 A JP 24375884A JP S61124588 A JPS61124588 A JP S61124588A
Authority
JP
Japan
Prior art keywords
etching
diffusion
etching liquid
nozzles
workpiece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24375884A
Other languages
Japanese (ja)
Inventor
Kazuyoshi Senma
千間 和義
Hideo Matsumoto
英雄 松本
Katsu Kishimoto
岸本 克
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP24375884A priority Critical patent/JPS61124588A/en
Publication of JPS61124588A publication Critical patent/JPS61124588A/en
Pending legal-status Critical Current

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  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE:To equalize the etching depth of a work piece, and to improve the roughness of an etching surface by enlarging a diffusion angle from plural diffusion nozzles, and forming an atmosphere in which a jetted etching liquid interferes with each other. CONSTITUTION:An etching liquid 10 which has been transferred under pressure from a pump 11 passes through a pressure transfer pipe 12, and goes into plural diffusion nozzles. A spray of a state diffused to a diffusion angle forms an atmospheric range of a stabilized and equalized state, in the center of a work 17 by an interference of diffusion nozzles 13 which have been opposed to each other adjacently. According to this mechanism, the contact way of the etching liquid becomes uniform and the etching working accuracy is improved.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、湿式エツチングでノズルよシ拡散されたエツ
チング液によりワークをエツチングするスプレー式エツ
チング装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a spray etching apparatus for etching a workpiece using an etching liquid diffused through a nozzle in wet etching.

従来例の構成とその問題点 従来のスプレー式エツチング装置は第1図にその具体構
成を示すように、タンク1内のエツチング液2を圧送パ
イプ3を通じて拡散ノズル4へ圧送するポンプ6と前記
拡散ノズル4の中心位置にエツチングされるワーク6を
設置しこれら全てを内蔵した筐体7により構成されてい
た。
Structure of the conventional example and its problems As shown in FIG. 1, the conventional spray type etching apparatus has a specific structure, as shown in FIG. The workpiece 6 to be etched was placed at the center of the nozzle 4, and the workpiece 6 was constructed of a casing 7 containing all of the workpieces.

このような構成では、拡散ノズル4から射出されたエツ
チング液8がワーク6に直接当たることによりワーク6
には、直接的にエツチングされる部分と間接的にエツチ
ングされる部分が発生することにより、1エツチング深
さが不均一になる2エツチング面粗さが悪化するという
問題点があった。
In such a configuration, the etching liquid 8 injected from the diffusion nozzle 4 directly hits the workpiece 6 and
This method has the problem that the first etching depth becomes uneven and the second etching surface roughness worsens because some parts are directly etched and others are indirectly etched.

発明の目的 本発明は、上記従来の欠点を解消するものであり、拡散
ノズルの拡散角度を変えてワークに対するエツチング液
の′当り方を均一化したものである。
OBJECTS OF THE INVENTION The present invention solves the above-mentioned conventional drawbacks by changing the diffusion angle of the diffusion nozzle so that the etching liquid hits the workpiece uniformly.

発明の構成 本発明は、ノズルが複数個設けられ、ワークを中心に拡
散されたエツチング液が互いに干渉し合い安定した一定
の雰囲気をつくりだすよう各々所定の間隙を有して設け
られ、安定したエツチング深さとエツチング面粗さの良
化がはかれ二ノチング加工精度上きわめて有利である。
Structure of the Invention The present invention provides a stable etching method in which a plurality of nozzles are provided, and each nozzle is provided with a predetermined gap so that the etching liquid diffused around the workpiece interferes with each other and creates a stable and constant atmosphere. This improves the depth and roughness of the etched surface, which is extremely advantageous in terms of notching accuracy.

実施例の説明 以下に本発明の一実施例を第2〜3図にもとづいて説明
する。図において、9はエツチング液10を溜めておく
タンク、11は圧送パイプ12を通じて拡散ノズル13
ヘエツチング液10を圧送するポンプ、14は拡散ノズ
ル13の中心位置に設定されたワーク、15は前記各構
成物を内蔵した筐体である。
DESCRIPTION OF THE EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS. 2 and 3. In the figure, 9 is a tank for storing the etching liquid 10, and 11 is a diffusion nozzle 13 through a pressure pipe 12.
A pump pumps the etching liquid 10, 14 is a workpiece set at the center of the diffusion nozzle 13, and 15 is a housing containing the above components.

次に動作を説明すると、ポンプ11から圧送されたエツ
チング液10が圧送パイプ12を通って拡散ノズル13
から鉱内に拡散された噴霧状態15が隣接・対向した拡
散ノズル13の干渉により安定均一化した雰囲気範囲1
6をワーク中心に形成することによりエッチング加工精
度を向上することができるものである。
Next, the operation will be explained. The etching liquid 10 is pumped from the pump 11 through the pressure pipe 12 and then to the diffusion nozzle 13.
An atmosphere range 1 in which the spray state 15 diffused into the ore from
By forming 6 at the center of the workpiece, etching accuracy can be improved.

発明の効果 このように本発明は2個以上設けられた拡散ノズルから
の拡散角度を太きぐして簀射したエツチング液が干渉し
合い安定均一化した雰囲気を形成することで、ワークの
エツチング深さの均一化とエツチング面粗さの良化がは
かれることからエツチング加工精度向上と安定化が容易
であり部品加工上きわめて有利である。
Effects of the Invention As described above, the present invention increases the etching depth of a workpiece by increasing the diffusion angle from two or more diffusion nozzles and forming a stable and uniform atmosphere where the etching liquid is reflected and interferes with each other. Since it is possible to make the etching surface uniform and improve the roughness of the etched surface, it is easy to improve and stabilize the etching processing accuracy, which is extremely advantageous in the processing of parts.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来のスプレー式エツチング装置の断面図、第
2図は本発明の一実施例におけるスプレー式エツチング
装置の断面図である。 4・13・・・・・・拡散ノズル、8@16・・・・・
・噴射されたエツチング液、6・14・・・・・・ワー
ク。 代理人の氏名 弁理士 中 尾 敏 男 ほか1名IE
I図 第2図
FIG. 1 is a sectional view of a conventional spray etching apparatus, and FIG. 2 is a sectional view of a spray etching apparatus according to an embodiment of the present invention. 4.13...Diffusion nozzle, 8@16...
・Sprayed etching liquid, 6.14...work. Name of agent: Patent attorney Toshio Nakao and one other IE
Figure I Figure 2

Claims (1)

【特許請求の範囲】[Claims] (1)エッチング液を圧送するポンプと、このポンプに
より圧送されたエッチング液を拡散してワークに射出す
る膜数のノズルとからなり、前記ノズルはワークを中心
に拡散されたエッチング液が互いに干渉し合い安定した
一定の雰囲気をつくりだすよう各々所定の間隙を有して
設けられたスプレー式エッチング装置。
(1) Consists of a pump that pumps the etching solution, and a number of nozzles that diffuse the etching solution pumped by the pump and inject it onto the workpiece, and the nozzles allow the etching solution spread around the workpiece to interfere with each other. Spray etching devices are installed with a predetermined gap between each other to create a stable and constant atmosphere.
JP24375884A 1984-11-19 1984-11-19 Spray type etching device Pending JPS61124588A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24375884A JPS61124588A (en) 1984-11-19 1984-11-19 Spray type etching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24375884A JPS61124588A (en) 1984-11-19 1984-11-19 Spray type etching device

Publications (1)

Publication Number Publication Date
JPS61124588A true JPS61124588A (en) 1986-06-12

Family

ID=17108544

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24375884A Pending JPS61124588A (en) 1984-11-19 1984-11-19 Spray type etching device

Country Status (1)

Country Link
JP (1) JPS61124588A (en)

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