JPS6112391B2 - - Google Patents

Info

Publication number
JPS6112391B2
JPS6112391B2 JP51048152A JP4815276A JPS6112391B2 JP S6112391 B2 JPS6112391 B2 JP S6112391B2 JP 51048152 A JP51048152 A JP 51048152A JP 4815276 A JP4815276 A JP 4815276A JP S6112391 B2 JPS6112391 B2 JP S6112391B2
Authority
JP
Japan
Prior art keywords
channel
gate
constant current
voltage
reference voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51048152A
Other languages
English (en)
Japanese (ja)
Other versions
JPS52130573A (en
Inventor
Tatsuji Asakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Suwa Seikosha KK
Original Assignee
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suwa Seikosha KK filed Critical Suwa Seikosha KK
Priority to JP4815276A priority Critical patent/JPS52130573A/ja
Publication of JPS52130573A publication Critical patent/JPS52130573A/ja
Publication of JPS6112391B2 publication Critical patent/JPS6112391B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/8311Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET] the IGFETs characterised by having different channel structures

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Non-Volatile Memory (AREA)
  • Amplifiers (AREA)
JP4815276A 1976-04-27 1976-04-27 Amplifier Granted JPS52130573A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4815276A JPS52130573A (en) 1976-04-27 1976-04-27 Amplifier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4815276A JPS52130573A (en) 1976-04-27 1976-04-27 Amplifier

Publications (2)

Publication Number Publication Date
JPS52130573A JPS52130573A (en) 1977-11-01
JPS6112391B2 true JPS6112391B2 (enrdf_load_stackoverflow) 1986-04-08

Family

ID=12795381

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4815276A Granted JPS52130573A (en) 1976-04-27 1976-04-27 Amplifier

Country Status (1)

Country Link
JP (1) JPS52130573A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2545374B2 (ja) * 1986-11-29 1996-10-16 富士通株式会社 定電流源回路を有する差動増幅回路
JP4764234B2 (ja) * 2006-04-07 2011-08-31 株式会社東芝 インピーダンス変換回路及び電子機器

Also Published As

Publication number Publication date
JPS52130573A (en) 1977-11-01

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